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公开(公告)号:JP4129088B2
公开(公告)日:2008-07-30
申请号:JP29343898
申请日:1998-10-15
Applicant: 株式会社日立ハイテクサイエンスシステムズ , 株式会社日立製作所
IPC: H01J37/22 , H01J37/28 , H01J37/141
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公开(公告)号:JP3748395B2
公开(公告)日:2006-02-22
申请号:JP2001253389
申请日:2001-08-23
Applicant: 株式会社日立サイエンスシステムズ , 株式会社日立製作所 , 独立行政法人産業技術総合研究所
CPC classification number: B25J17/0266 , B25J7/00 , B25J9/0015 , Y10T29/53 , Y10T74/20335 , Y10T74/20341
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公开(公告)号:JP4006165B2
公开(公告)日:2007-11-14
申请号:JP2000120678
申请日:2000-04-21
Applicant: 株式会社日立製作所
IPC: G01N23/04 , H01J37/28 , G01N23/06 , H01J37/22 , H01J37/244
Abstract: PROBLEM TO BE SOLVED: To provide an element analyzing apparatus capable of displaying an element distribution image of an object to be analyzed with a high contrast, and deciding positions of the element distribution with high precision, and also provide a scanning transmission electron microscope using it, and an element analyzing method. SOLUTION: The element analyzing apparatus is provided with a scattered electron beam detector for detecting electron beams scattered by the object to be analyzed; an electron spectroscope for performing energy dispersion of the electron beam transmitted by the object to be analyzed; an electron detector for detecting the dispersed electron beam; and a control device for analyzing elements of the object to be analyzed based on output signals of the electron beam detected by the electron beam detector, and output signals of the electron beam detected by the scattered electron beam detector. The apparatus is also provided with an electron beam source, an electron beam scanning coil, a scattered electron beam detector, an objective lens, an imaging lens, an expanding magnetic field lens, and a magnetic field lens for focus adjustment. And a control device is also provided, which is capable of observing the element distribution image and a Z contrast image simultaneously in real time, and correcting the element distribution image with the Z contrast image.
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