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    Method and system for detecting defects in the structure
    3.
    发明专利
    Method and system for detecting defects in the structure 有权

    公开(公告)号：JP5007978B2

    公开(公告)日：2012-08-22

    申请号：JP2008072068

    申请日：2008-03-19

    申请人： 独立行政法人産業技術総合研究所

    发明人： 直広 上野 ,  祐介 今井 ,  超男 徐

    IPC分类号： G01M99/00 ,  G01B11/16 ,  G01L1/24 ,  G01N21/70

    摘要： PROBLEM TO BE SOLVED: To provide a defect detecting method and system capable of easily and accurately detecting the existence of a defect of a structure without destroying the structure. SOLUTION: The defect detecting system 10 detects the existence of a defect by detecting light emission of a light emitting film 1 formed on the surface of the structure 2, i.e., a detection target. The light emitting film 1 contains light emitting particles 1a. When a deformation change is generated in the structure 2 having a defect, the periphery of the defect is deformed due to stress concentration generated at the periphery, and the light emitting film on the surface is also deformed. As strain energy propagates to the light emitting particles and makes the light emitting particles emit light, the defect which cannot be visually inspected can be indicated to the outside of the structure by the emission of light. COPYRIGHT: (C)2009,JPO&INPIT