Abstract:
PROBLEM TO BE SOLVED: To provide a composite convergent ion beam device in which processing can be performed promptly without contaminating a sample such as a silicon wafer and high-resolution observation or precise processing can be performed, a processing observation method and a processing method employing the same.SOLUTION: A composite convergent ion beam device comprises a first ion beam radiation system 10 including a liquid metal ion source which generates first ion, and a second ion beam radiation system 2o including a gas field ion source that generates second ion. A beam diameter of a second ion beam 20A emitted from the second ion beam radiation system 20 is smaller than that of a first ion beam 10A emitted from the first ion beam radiation system 10.
Abstract:
PROBLEM TO BE SOLVED: To provide a composite converging ion beam device capable of performing an observation of high resolution and fine processing, and a processing observation method and a processing method using the same.SOLUTION: A composite converging ion beam device includes a first ion beam irradiation system (10) including a liquid metal ion source generating first ions, and a second ion beam irradiation system (20) including a gas field ion source generating second ions. A second ion beam (20A) emitted by the second ion beam irradiation system (20) has a smaller beam diameter than that of a first ion beam (10A) emitted by the first ion beam irradiation system (10). The second ion beam irradiation system (20) including the gas field ion source can reduce the beam diameter to 1 nm or less, and so an observation of high resolution can be made.