公开(公告)号：JP2010205864A

公开(公告)日：2010-09-16

申请号：JP2009048719

申请日：2009-03-03

Applicant: Hitachi High-Technologies Corp ,  株式会社日立ハイテクノロジーズ

Inventor： YOKOSUKA TOSHIYUKI ,  TSUCHIYA TSUGUTOSHI ,  TAGO KAZUATSU ,  RI AKIRA ,  KOBAYASHI KINYA

IPC: H01L21/66 ,  G01N23/225 ,  H01J37/22

Abstract: PROBLEM TO BE SOLVED: To provide an image forming apparatus that forms an image which is reflected of the influence due to electrostatic charging, or the like, without having to irradiate a charged particle beam on a sample.
SOLUTION: The image forming apparatus acquires information of an area including the irradiation range of a charged particle beam from the design data of a semiconductor device and calculates the quantity of electrons that are detected at a pixel section, when the charge particle beam is applied to the sample, in pixel units for the irradiation range of the charged particle beam on the basis of the information; and arranges the luminance information that is obtained, based on the quantity of electron so as to form an image.
COPYRIGHT: (C)2010,JPO&INPIT

Abstract translation: 要解决的问题：提供一种形成图像的图像形成装置，其形成由于静电充电等引起的影响的图像，而不必将样品上的带电粒子束照射。 解决方案：图像形成装置从半导体装置的设计数据获取包括带电粒子束的照射范围的区域的信息，并计算在像素部分处检测的电子量，当电荷粒子束 基于该信息，以像素为单位对带电粒子束的照射范围施加于样本; 并且基于电子量排列获得的亮度信息，以形成图像。 版权所有（C）2010，JPO＆INPIT

公开(公告)号：JP2010211973A

公开(公告)日：2010-09-24

申请号：JP2009054369

申请日：2009-03-09

Applicant: Hitachi High-Technologies Corp ,  株式会社日立ハイテクノロジーズ

Inventor： TSUCHIYA TSUGUTOSHI ,  YOKOSUKA TOSHIYUKI ,  TAGO KAZUATSU ,  RI AKIRA ,  KOBAYASHI KINYA

IPC: H01J37/21

Abstract: PROBLEM TO BE SOLVED: To provide a charged particle beam device for measuring correct sample surface potential or adjusting a focus in accordance with the potential of the sample surface without the irradiation of charged particle beams on the sample. SOLUTION: The charged particle beam device includes a charged particle source, an objective lens which focuses the charged particle beams emitted from the charged particle source and irradiates the beams on the sample, a negative potential applying power source which forms an electric field for decelerating charged particle beams reaching the sample by the application of a negative voltage, and a control device which achieves the focus adjustment of the charged particle beams by controlling the negative potential applying power source. The control device determines the sample potential on the basis of solid state property data and the scanning state of the charged particle beams of the sample, and controls the negative potential applying power source on the basis of the surface potential. COPYRIGHT: (C)2010,JPO&INPIT

Abstract translation: 要解决的问题：提供一种用于根据样品表面的电位测量正确的样品表面电位或调整焦点的带电粒子束装置，而不对样品上的带电粒子束进行照射。 解决方案：带电粒子束装置包括带电粒子源，对从带电粒子源发射的带电粒子束进行聚焦并将样品上的束照射的物镜，形成电场的负电位施加电源 用于通过施加负电压减速到达样品的带电粒子束;以及控制装置，其通过控制负电位施加电源来实现带电粒子束的聚焦调节。 控制装置基于固体特性数据和样品的带电粒子束的扫描状态来确定样品电位，并且基于表面电位来控制负电位施加电源。 版权所有（C）2010，JPO＆INPIT