公开(公告)号：JP2014144391A

公开(公告)日：2014-08-14

申请号：JP2013013030

申请日：2013-01-28

Applicant: Sharp Corp ,  シャープ株式会社

Inventor： OKADA TOSHINORI ,  HIGUCHI KAORU ,  YOSHII MOTOYASU ,  DOI KO

IPC: B05B17/06 ,  A61H33/12

Abstract: PROBLEM TO BE SOLVED: To provide a liquid spray device which stabilizes spraying by a simple structure at low costs.SOLUTION: In a tank (3), an air passage which circulates air in an external space into the tank (3) is formed. In the air passage, an external space opening (36) located at the external space side, an air circulation hole (30) located at the tank (3) interior side, and a resistance channel (34) which connects the external space opening (36) with the air circulation hole (30) are formed. A hole diameter of the air circulation hole (30) is formed so as to be larger than a hole diameter of a micropore of an elastic diaphragm (4).

Abstract translation: 要解决的问题：提供一种液体喷雾装置，其以低成本的简单结构稳定喷涂。解决方案：在罐（3）中，形成将外部空间中的空气循环进入罐（3）的空气通道。 在空气通道中，位于外部空间侧的外部空间开口（36），位于罐（3）内侧的空气循环孔（30）和连接外部空间开口（36）的阻力通道（34） 36）与空气循环孔（30）形成。 空气循环孔（30）的孔径形成为大于弹性膜（4）的微孔的孔径。

公开(公告)号：JP2014108367A

公开(公告)日：2014-06-12

申请号：JP2012262301

申请日：2012-11-30

Applicant: Sharp Corp ,  シャープ株式会社

Inventor： YOSHII MOTOYASU ,  OKADA TOSHINORI ,  DOI KO ,  HIGUCHI KAORU

IPC: B05B17/06 ,  A45D34/04 ,  A61H33/12

Abstract: PROBLEM TO BE SOLVED: To provide a liquid spray device capable of stabilizing spraying with a simple structure at low costs, and to provide a cosmetic liquid spray device.SOLUTION: A cosmetic liquid spray device (1) includes: a tank (3) composed of a cylindrical protruding part (31) which has a liquid supply port (33) and is formed protruding and a liquid holding part (32) which holds the liquid (7); a case (2); an elastic diaphragm (4) which is supported by the case (2), is attached to the liquid supply port (33), and has a number of micropores; and an ultrasonic vibrator (5). The ultrasonic vibrator (5) causes ultrasonic vibrations in the elastic diaphragm (4) and a liquid (7) stored in the tank (3) is sprayed from the liquid supply port (33) through the number of micropores of the elastic diaphragm (4). An air circulation hole (30) which allows the interior of the tank to communicate with the exterior is formed at the cylindrical protruding part (31) of the tank (3). A bore diameter of the air circulation hole (30) is formed so as to be larger than a bore diameter of each micropore of the elastic diaphragm (4).

Abstract translation: 要解决的问题：提供一种液体喷雾装置，其能够以低成本以简单的结构稳定喷洒，并提供化妆品液体喷射装置。解决方案：一种化妆品液体喷洒装置（1）包括：罐（3），其组成 具有液体供给口（33）并形成突出的圆筒状的突出部（31）和保持液体（7）的液体保持部（32）。 情况（2）; 由所述壳体（2）支撑的弹性隔膜（4）附接到所述液体供给口（33），并具有多个微孔; 和超声波振子（5）。 超声波振动器（5）在弹性隔膜（4）中引起超声波振动，并且从液体供给口（33）喷射储存在储液罐（3）中的液体（7）通过弹性隔膜（4）的微孔数 ）。 在罐（3）的圆筒状的突出部（31）形成有允许罐内部与外部连通的空气循环孔（30）。 空气循环孔（30）的孔径形成为大于弹性隔膜（4）的每个微孔的孔径。

公开(公告)号：JP2010205481A

公开(公告)日：2010-09-16

申请号：JP2009047881

申请日：2009-03-02

Applicant: Sharp Corp ,  シャープ株式会社

Inventor： YOSHII MOTOYASU ,  SHIROYAMA YASUHISA ,  KOYANAGI TOMOHIRO

IPC: F21S2/00 ,  F21Y101/02

Abstract: PROBLEM TO BE SOLVED: To provide a plane light source device with downsizing aimed at by heightening a ratio of an effective region, and with light more evenly emitted through reduction of luminance unevenness in the effective region.
SOLUTION: The plane light source device is provided with a light-emitting portion 1 containing at least one point light source, and a light guide plate 2 equipped with an incident side face 2A into which light from the point light source is incident in opposition to the light-emitting portion 1 and a main emission face 2B from which the incident light is emitted. It is further provided with a reflecting member 3 arranged from an above portion of an end part of the main emission face 2B at an incident face side over to an above part of the light-emitting portion 1 and a reflecting member 4 arranged from a lower part of the face opposite to the main emission face 2B over to a lower portion of the light-emitting portion 1, and a non-diffusive, light-transmitting members 5, 6 arranged between the reflecting members 3, 4 and the light guide plate 2.
COPYRIGHT: (C)2010,JPO&INPIT

Abstract translation: 要解决的问题：提供一种通过提高有效区域的比例以及通过降低有效区域中的亮度不均匀性而更均匀地发射的光的小型化的平面光源装置。 解决方案：平面光源装置设置有包含至少一个点光源的发光部分1和配备有入射侧面2A的导光板2，来自点光源的光入射到入射侧面2A 与发光部分1相对，并且发射入射光的主发射面2B。 还设置有反射构件3，其从入射面侧的主发射面2B的端部的上方部分配置到发光部1的上方，反射构件4从下部 与主发射面2B相对的发光部分1的下部的一部分面以及设置在反射部件3,4之间的非扩散的透光部件5,6与导光板 2.版权所有（C）2010，JPO＆INPIT

公开(公告)号：JP2006175416A

公开(公告)日：2006-07-06

申请号：JP2004374349

申请日：2004-12-24

Applicant: Yuzo Mori ,  Sharp Corp ,  シャープ株式会社 ,  森 勇蔵

Inventor： MAKIOKA HIROSHIGE ,  ARIKAWA KAZUHIKO ,  MORITA KENICHI ,  ISHIDA JUNICHI ,  KANDA HIROFUMI ,  YOSHII MOTOYASU ,  YAMAMOTO YUICHI ,  MORI YUZO

IPC: B08B3/02 ,  B08B3/08 ,  H01L21/304

Abstract: PROBLEM TO BE SOLVED: To provide a wetting device having a high capacity of peeling and removing a removal object matter deposited on a cleaning object regardless of the electrical characteristics of the cleaning object, i.e., a high cleaning power and a high cleaning speed, which device requires reduced equipment cost and has a low environmental load. SOLUTION: The wetting device 1 includes a nozzle 2 comprising a nozzle main body 4 having a slit-shaped opening part 17 and a radical generating means 5, a substrate transfer means 3, a first pure water supply means 7, and a second pure water supply means 8. The radical generating means 5 is installed at the outside of the nozzle main body 4, a cleaning liquid 10 is prepared by mixing the water flow of pure water discharged from the slit-shaped opening part 17 with the pure water containing active species such as radicals generated in the radical generating means 5, and the cleaning liquid 10 is supplied onto a surface 9a to to be cleaned of the substrate 9. COPYRIGHT: (C)2006,JPO&NCIPI

Abstract translation: 要解决的问题：提供一种润湿装置，其具有高的剥离能力和除去清洁物体上沉积的清除物体，而与清洁对象的电气特性无关，即高清洁力和高清洁度 速度，哪个装置需要降低设备成本并且具有低的环境负荷。 润湿装置1包括喷嘴2，喷嘴2包括具有狭缝状开口部17和自由基发生装置5的喷嘴主体4，基板输送装置3，第一纯水供给装置7和 第二纯水供给装置8.自由基产生装置5安装在喷嘴主体4的外侧，通过将从狭缝状开口部17排出的纯水的水流与纯水 含有活性物质的水，例如在自由基产生装置5中产生的自由基，以及清洗液10被供给到要被清洁的基材9的表面9a上。（C）2006，JPO＆NCIPI

公开(公告)号：JP2014049569A

公开(公告)日：2014-03-17

申请号：JP2012190522

申请日：2012-08-30

Applicant: Sharp Corp ,  シャープ株式会社

Inventor： YOSHII MOTOYASU

IPC: H01L21/304 ,  B24B1/00 ,  B24C1/00

Abstract: PROBLEM TO BE SOLVED: To provide a sapphire substrate having a large diameter of 4 inch or more, in which the degree of undulation can be reduced and manufacturing method therefor.SOLUTION: One side of a substrate having undulation is subjected to undulation reduction processing for reducing the degree of undulation until the one side becomes convex, and then at least the surface of the substrate subjected to undulation reduction processing is ground or polished while fixing the substrate to a substrate holding member.

Abstract translation: 要解决的问题：提供具有4英寸以上的大直径的蓝宝石基板，其中起伏度可以减小，并且其制造方法可以解决。解决方案：具有起伏的基板的一侧经受起伏减小处理 减少起伏的程度直到一侧变得凸起，然后在将衬底固定到衬底保持构件上的同时研磨或抛光至少经受起伏减小处理的衬底的表面。

公开(公告)号：JP2013179145A

公开(公告)日：2013-09-09

申请号：JP2012041667

申请日：2012-02-28

Applicant: Sharp Corp ,  シャープ株式会社

Inventor： YOSHII MOTOYASU

IPC: H01L21/304 ,  B24B1/00

Abstract: PROBLEM TO BE SOLVED: To provide a method for manufacturing a sapphire substrate capable of shortening a manufacturing step and reducing a manufacturing cost by easily and quickly reducing unevenness of thickness of the sapphire substrate and a processing amount, and to provide the sapphire substrate.SOLUTION: A method for manufacturing a sapphire substrate by applying processing covering a plurality of steps to a substrate obtained by slicing a sapphire ingot includes the steps of: grinding one or both sides of a substrate 10; processing the one or both sides of the ground substrate 10 by wet blasting after the grinding step; lapping the one or both sides of the substrate 10 processed by wet blasting after the wet blasting step; and polishing the one or both sides of the lapped substrate 10 by CMP after the lapping step.

Abstract translation: 要解决的问题：提供一种能够通过容易且快速地减少蓝宝石衬底的厚度不均匀性和处理量来缩短制造步骤并降低制造成本的蓝宝石衬底的制造方法，并提供蓝宝石衬底。 ：通过对通过切割蓝宝石锭获得的基板施加多个步骤的处理来制造蓝宝石基板的方法包括以下步骤：研磨基板10的一侧或两侧; 在研磨步骤之后通过湿式喷砂处理接地基板10的一侧或两侧; 在湿式喷砂步骤之后研磨通过湿式喷砂处理的基材10的一侧或两侧; 并且在研磨步骤之后通过CMP抛光研磨的衬底10的一侧或两侧。

公开(公告)号：JP2013102023A

公开(公告)日：2013-05-23

申请号：JP2011244294

申请日：2011-11-08

Applicant: Sharp Corp ,  シャープ株式会社

Inventor： YOSHII MOTOYASU

IPC: H01L21/304

Abstract: PROBLEM TO BE SOLVED: To provide a sapphire substrate that can be simply polished while restraining polishing unevenness in a substrate face, and a manufacturing method thereof.SOLUTION: The manufacturing method includes: a first polishing step of polishing both principal planes of a sapphire substrate 10; a heating step of heating the sapphire substrate 10; a suction step of pressure-welding a rear face of the sapphire substrate 10 and a top surface of a suction pad 130 having plural holes 131 on its surface via water 20, and adsorbing the sapphire substrate 10 by a negative pressure; a second polishing step of polishing a surface 11 of the sapphire substrate 10; and a removal step for removing the sapphire substrate 10 from the suction pad 130. The suction pad 130 is housed in an opening of a holding member 120 having inner peripheral walls 121 surrounding a peripheral side face of the sapphire substrate 10 while adsorbing the sapphire substrate 10. The inner peripheral wall 121 has a tapered shape such that a distance between the inner peripheral walls 121 opposed to each other gets longer as it is away from the suction pad 130 on a transverse cross section.

Abstract translation: 要解决的问题：提供一种能够简单地抛光的蓝宝石基板，同时抑制基板表面的抛光不均匀性及其制造方法。 解决方案：该制造方法包括：抛光蓝宝石基板10的两个主平面的第一抛光步骤; 加热蓝宝石衬底10的加热步骤; 通过水20对蓝宝石衬底10的背面进行压焊和吸附衬垫130的表面的吸附工序，其表面上具有多个孔131，并通过负压吸附蓝宝石衬底10; 抛光蓝宝石衬底10的表面11的第二抛光步骤; 以及从吸盘130去除蓝宝石衬底10的去除步骤。吸附衬垫130容纳在保持构件120的开口中，该保持构件120具有围绕蓝宝石衬底10的周边侧面的内周壁121，同时吸附蓝宝石衬底 内周壁121具有锥形形状，使得彼此相对的内周壁121之间的距离在横截面上远离吸盘130时变得更长。 版权所有（C）2013，JPO＆INPIT

公开(公告)号：JP2007061714A

公开(公告)日：2007-03-15

申请号：JP2005249981

申请日：2005-08-30

Applicant: Sharp Corp ,  シャープ株式会社

Inventor： YOSHII MOTOYASU

IPC: B08B7/04 ,  B08B3/02 ,  G02F1/13 ,  G02F1/1333

Abstract: PROBLEM TO BE SOLVED: To provide a washing device to discharge a washing liquid on the surface to be washed of a substrate which prevents the generation of retention of the washing liquid on the surface to be washed, expands the range of removability of sticking fine particles on the surface to be washed, enhances the washing power and prevents the secondary contamination.
SOLUTION: In the washing device, a hyperbaric pressure nozzle 2 and a washing liquid sucking means 26 are arranged in face of the surface 4a to be washed and with a distance from the surface 4a to be washed in the upper part of the surface 4a to be washed of the substrate 4 towards the downstream side from the upstream side of the substrate carrying direction 28. The washing device sucks the washing liquid 3 to recover it at the same suction direction as that of fast stream 5 formed on the surface 4a to be washed by discharging the washing liquid 3 from the hyperbaric pressure nozzle 2.
COPYRIGHT: (C)2007,JPO&INPIT

Abstract translation: 要解决的问题：提供一种洗涤装置，用于将洗涤液的洗涤液排出到基材上，以防止洗涤液在洗涤表面上产生滞留，从而使洗涤液的可除去的范围扩大 在要洗涤的表面上粘附细颗粒，提高洗涤力并防止二次污染。 解决方案：在洗涤装置中，将高压喷嘴2和洗涤液吸引装置26布置在要被清洗的表面4a的表面上，并且与待洗涤的表面4a距离被清洗的表面4a有一段距离 要从衬底输送方向28的上游侧向下游侧洗涤的表面4a。洗涤装置吸入洗涤液体3，以与形成在表面上的快速流5相同的吸入方向 4a通过从高压喷嘴2排出洗涤液3而被洗涤。版权所有（C）2007，JPO＆INPIT

公开(公告)号：JP2014031291A

公开(公告)日：2014-02-20

申请号：JP2012172295

申请日：2012-08-02

Applicant: Sharp Corp ,  シャープ株式会社 ,  Fujikoshi Mach Corp ,  不二越機械工業株式会社

Inventor： TAKAHASHI DAISUKE ,  OKAZAKI SHINYA ,  YOSHII MOTOYASU ,  KOBAYASHI TAKUMI ,  YANAGISAWA JUN

IPC: C30B29/20 ,  C30B11/00

Abstract: PROBLEM TO BE SOLVED: To provide a sapphire ingot having a large diameter of 4 inches or more with reduced cracks and distortion by providing a crucible of tungsten in which unevenness of a housing part is reduced.SOLUTION: A housing part 2 of a crucible of tungsten formed and processed by processing trace softening process for reducing the processing trace has an arithmetic average roughness Ra of less than 2.7 μm or a ten-point average roughness Rz of less than 12 μm. Raw materials of sapphire are placed in the housing part 2, which are melted by heating the crucible 1 and then crystallized.

Abstract translation: 要解决的问题：提供一种具有4英寸或更大直径的蓝宝石锭，通过提供一种其中壳体部分的不均匀性减小的钨坩埚而减少裂纹和变形。解决方案：将坩埚的壳体部分2 通过加工痕迹软化处理形成和加工的用于减少加工痕迹的钨具有小于2.7μm的算术平均粗糙度Ra或小于12μm的十点平均粗糙度Rz。 蓝宝石的原料放置在壳体部分2中，通过加热坩埚1然后结晶而熔化。

公开(公告)号：JP2013244563A

公开(公告)日：2013-12-09

申请号：JP2012120079

申请日：2012-05-25

Applicant: Sharp Corp ,  シャープ株式会社

Inventor： YOSHII MOTOYASU

IPC: B24C1/04 ,  B24C3/00 ,  C30B25/18 ,  C30B29/38 ,  H01L21/304 ,  H01L33/32

Abstract: PROBLEM TO BE SOLVED: To provide a sapphire substrate provided with projections on its surface side in order to improve the light emission efficiency of a light emitting element while a back side of the substrate is convex, and a method for manufacturing the same.SOLUTION: A sapphire substrate having the diameter of at least 4 inches is processed by executing at least a reactive ion etching process of forming a plurality of projections 11, 11, ... on a surface side 10A of a substrate 10 by executing the reactive ion etching of a surface side 10A of the substrate 10 after executing a plurality of steps for the substrate 10 obtained by slicing a sapphire ingot, and a wet blasting process of executing the wet blasting of a back side 10B of the substrate 10 after the reactive ion etching process. The back side 10B of the substrate 10 after the wet blasting is convex.

Abstract translation: 要解决的问题：为了提供在其表面侧具有突起的蓝宝石衬底及其制造方法，以提高发光元件的发光效率。 通过执行反应离子蚀刻，至少执行在基板10的表面侧10A上形成多个突起11,11，...的至少一个反应离子蚀刻工艺来处理具有至少4英寸直径的蓝宝石基板 在通过对蓝宝石锭进行切片而获得的基板10进行多个台阶后，对基板10的表面侧10A进行湿式喷砂处理，以及进行反应离子蚀刻后的基板10的背面10B的湿式喷砂处理 处理。 在湿式喷砂之后的基板10的背面10B是凸的。