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1.发明专利Metal sheet for filling and metal filling method using metal sheet for filling 有权用于填充和金属填充方法的金属板使用金属板填充
公开(公告)号：JP2013197351A
公开(公告)日：2013-09-30
申请号：JP2012063581
申请日：2012-03-21
发明人： IMAI OSAMU , KIKUCHI TATSUO
IPC分类号： H01L21/288 , H01L21/3205 , H01L21/768
摘要： PROBLEM TO BE SOLVED: To provide a metal filling method which can uniformly and reliably fill molten metal into a minute space; and provide a metal sheet used for the metal filling method.SOLUTION: A method of filling molten metal into a minute space formed so as to open on a surface of a substrate comprises: a process of creating a metal sheet M for filling composed of a filling layer M1 and an alteration layer M2; a process of placing the metal sheet M for filling on the surface of the substrate in a state where the filling layer M1 and the surface of the substrate are opposed to each other; a process of melting the metal sheet M for filling by application of heat; and a process of filling molten metal into the minute space.
摘要翻译： 要解决的问题：提供能够均匀可靠地将熔融金属填充到微小空间的金属填充方法; 并提供用于金属填充方法的金属片。解决方案：将熔融金属填充到形成为在基板的表面上开口的微小空间的方法包括：制造用于填充的金属片M的工艺， 填充层M1和改质层M2; 在填充层M1和基板的表面彼此相对的状态下将用于填充的金属板M放置在基板的表面上的处理; 熔化用于通过加热填充的金属片M的过程; 以及将熔融金属填充到微小空间中的过程。
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公开(公告)号：JP2008046158A
公开(公告)日：2008-02-28
申请号：JP2006218808
申请日：2006-08-10
发明人： IMAI OSAMU
摘要： PROBLEM TO BE SOLVED: To provide a laser beam scanner that can prevent various problems due to the use of micro mirrors.
SOLUTION: To provide the laser beam scanner 100 provided with: a holder 21A; a rocking member 211 held in a rockable manner to the holder 21A; a pair of electrodes 215, 216 for rockingly driving the rocking member 211 by using an electrostatic power; and surface emitting lasers 23a, 23b, 23c set in the rocking member 211.
COPYRIGHT: (C)2008,JPO&INPIT摘要翻译： 要解决的问题：提供可以防止由于使用微镜而引起的各种问题的激光束扫描器。 解决方案：提供具有：保持器21A的激光束扫描器100; 摇摆构件211以可摆动的方式保持在保持器21A上; 一对用于通过使用静电力摇摆地驱动摇摆构件211的电极215,216; 和设置在摇摆构件211中的表面发射激光器23a，23b，23c。版权所有（C）2008，JPO＆INPIT
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公开(公告)号：JP2006119198A
公开(公告)日：2006-05-11
申请号：JP2004304392
申请日：2004-10-19
发明人： IMAI OSAMU
摘要： PROBLEM TO BE SOLVED: To provide an optical device which achieves miniaturization of optical scanning mechanism and in which reflected light in a light transmission member furnished for protection in front of a light reflection member does not become disturbance.
SOLUTION: The light transmission member (a second light transmission member) 2 for protection is furnished in front of a micromirror (a first light reflection member) 1 having a yoke 1d which serves as a light reflection face, a laser beam from a laser light source 11 is reflected on the micromirror 1 via the light transmission member 2, and a photoreceptor 13 is scanned with the reflected light beam via the light transmission member 2. The light transmission member 2 has a function of protecting the micromirror 1 and a function as an optical lens. The number of optical members to be provided at the optical scanning mechanism is decreased by the function as the optical lens of the light transmission member 2, and the photoreceptor 13 is not irradiated with the reflected light B of the laser beam from the laser light source 11 in the light transmission plate 2, and the photoreceptor 13 is irradiated only with the reflected light C in the micromirror 1.
COPYRIGHT: (C)2006,JPO&NCIPI摘要翻译： 要解决的问题：提供一种实现光扫描机构的小型化的光学装置，其中在光反射构件前面保护的透光构件中的反射光不会变得干扰。 解决方案：用于保护的光传输构件（第二透光构件）2设置在具有用作光反射面的磁轭1d的微反射镜（第一光反射构件）1的前面，来自 激光源11经由透光部件2反射在微反射镜1上，并且通过透光部件2用反射光束扫描感光体13.透光部件2具有保护微镜1和 作为光学透镜的功能。 通过作为光透射部件2的光学透镜的功能，在光扫描机构上设置的光学部件的数量减少，并且感光体13未被来自激光光源的激光束的反射光B照射 透光板2中的反射光C仅感光体13照射，微镜1中的反射光C仅受光13照射。（C）2006，JPO＆NCIPI
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4.发明专利Micro mirror, micro mirror device, and method for driving micro mirror 审中-公开MICRO MIRROR，MICRO MIRROR DEVICE，AND METHOD FOR DRIVING MICRO MIRROR
公开(公告)号：JP2006011323A
公开(公告)日：2006-01-12
申请号：JP2004192171
申请日：2004-06-29
发明人： SHIMODA KYOJI , IMAI OSAMU
摘要： PROBLEM TO BE SOLVED: To provide a micro mirror capable of driving a plurality of micro mirrors in synchronization, a micro mirror device, and a method for driving the micro mirror.
SOLUTION: When an AC voltage is applied by a first AC power source 6 to a first electrode, electrostatic forces in the directions opposite to each other are generated between the first electrode 1 (comb tooth section 1d) and second electrode 2 (comb tooth section 2d) and moment is generated in a direction orthogonal to the first electrode 1 and the second electrode 2, and a disk-shaped rotating section 1b rotates around a hinge section 1c as an axis. At this time, the rotating operation of the micro mirror 10 (the rotating section 1b) is controlled by applying the AC voltage of a desired frequency and phase by a second AC power source 8.
COPYRIGHT: (C)2006,JPO&NCIPI摘要翻译： 要解决的问题：提供能够同步驱动多个微反射镜的微反射镜，微反射镜装置和用于驱动微反射镜的方法。 解决方案：当第一AC电源6向第一电极施加AC电压时，在第一电极1（梳齿部1d）和第二电极2之间产生彼此相反的方向的静电力（ 梳齿部2d），并且在与第一电极1和第二电极2正交的方向上产生力矩，盘状旋转部1b围绕作为轴的铰链部1c旋转。 此时，通过用第二AC电源8施加所需频率和相位的交流电压来控制微反射镜10（旋转部分1b）的旋转操作。版权所有（C）2006，JPO＆NCIPI
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公开(公告)号：JP2014236030A
公开(公告)日：2014-12-15
申请号：JP2013114907
申请日：2013-05-31
发明人： IMAI OSAMU
IPC分类号： H01L21/3205 , H01L21/768 , H01L23/522
摘要： 【課題】被処理物上の溶融金属の膜厚を厚くすることなく、残留気体成分からなる空隙を被処理面上から遠ざけ、被処理面全体を溶融金属で覆うことができ、被処理面全体の微小空間内に溶融金属を充填することができる金属充填装置を提供する。【解決手段】金属充填装置1は、半導体ウェハKを、その処理面が水平方向に対して90?傾いた状態で保持する保持台H、筒状のハウジングC、進退自在に設けられたピストンPなどを備えており、保持台Hに保持された半導体ウェハK、ハウジングC及びピストンPによって気密状の処理室2が形成される。また、この金属充填装置1は、処理室2内を減圧する減圧機構10、処理室2内に溶融金属Mを供給する溶融金属供給機構15及び溶融金属Mの脱気を行う脱気機構20を備えている。【選択図】図1
摘要翻译： 要解决的问题：提供一种金属填充装置，其能够通过保持由残留气体成分构成的空隙远离待处理表面覆盖整个待处理表面，而不会使汽车金属的膜变厚 因此，待处理的整个表面中的微小空间可以被熔融金属填充。溶液：金属填充装置1包括用于保持半导体晶片K的保持基体H，同时使被处理表面倾斜90° 对于水平方向，设置有圆筒形壳体C，可自由移动地设置的活塞P等，并且由保持在保持基座H上的半导体晶片K，壳体C和壳体C形成气密处理室2 此外，金属填充装置1包括减压机构10，用于将熔融金属M供给到处理室2中的熔融金属供给机构15和用于脱气的脱气机构20 熔融金属M.
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公开(公告)号：JP2013075330A
公开(公告)日：2013-04-25
申请号：JP2012167761
申请日：2012-07-27
IPC分类号： B22D19/00 , B22D23/00 , B22D27/13 , H01L21/28 , H01L21/3205 , H01L21/768 , H01L23/522
CPC分类号： B22D18/02 , B22D19/00 , B22D19/08 , B22D39/02 , C23C6/00 , H01L21/67092 , H01L21/76898
摘要： PROBLEM TO BE SOLVED: To provide a metal filling apparatus capable of minimizing the thickness of a layer consisting of excess metal formed on a processed workpiece, and filling very small space (a via hole or a through-hole) formed to be opened on the workpiece with a molten metal.SOLUTION: The metal filling apparatus 1 includes: a holding table H for holding a semiconductor wafer; a piston P which is provided oppositely to the holding table H and has a pressing unit made of a metal formed on the side opposite to the holding table H; and a pressing mechanism 5 which can press the piston P against the semiconductor wafer K held on the holding table H, etc. An airtight processing chamber 2 is formed by the semiconductor wafer K held on the holding table H, a housing C and the piston P. The metal filling apparatus further includes: a decompression mechanism 3 which discharges gas in the processing chamber 2 to decompress the inside of the processing chamber 2; a molten metal supply mechanism 4 for supplying the molten metal M in the processing chamber 2; and a pressurized gas supply mechanism 7 for supplying inert gas in the processing chamber 2, etc.
摘要翻译： 要解决的问题：提供一种金属填充装置，其能够使由形成在被加工工件上的多余金属构成的层的厚度最小化，并且填充形成为非常小的空间（通孔或通孔） 用熔融金属在工件上打开。 解决方案：金属填充装置1包括：用于保持半导体晶片的保持台H; 活塞P，其与保持台H相对地设置，并且具有由形成在与保持台H相反的一侧的金属制成的按压单元; 以及可以将活塞P压靠在保持台H上的半导体晶片K等的按压机构5.由保持在保持台H上的半导体晶片K，壳体C和活塞形成气密处理室2 金属填充装置还包括：减压机构3，其在处理室2中排出气体，以减压处理室2的内部; 用于在处理室2中供应熔融金属M的熔融金属供给机构4; 以及用于在处理室2内供给惰性气体的加压气体供给机构7等。（C）2013，JPO＆INPIT
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公开(公告)号：JP2006018250A
公开(公告)日：2006-01-19
申请号：JP2005163283
申请日：2005-06-02
发明人： IMAI OSAMU , KAWAKAMI YOSHIFUMI , SHIMODA KYOJI
摘要： PROBLEM TO BE SOLVED: To provide a MEMS mirror scanner structure that can realize high-speed scanning equal to or more than a polygon mirror scanner, that aims for example to realize high precision scanning in use for laser printing, and that is in particular intended to optimize the shape, dimension, etc., of a scanning mirror itself. SOLUTION: The high precision and miniaturization can be attained by necessarily enlarging the range of an optical path that needs more as an angle of incidence becomes lower (smaller). In other words, with the angle of incidence in the range of 25-90° in the direction orthogonal to the target surface of emission, the scanning mirror needs to have a ratio of the length (b) in the direction of the oscillation axis to the length (a) in the direction orthogonal to the axis as (a≥b, a:b=(1.0 to 2.0):1), or (a COPYRIGHT: (C)2006,JPO&NCIPI
摘要翻译： 要解决的问题：提供可以实现等于或大于多面镜扫描器的高速扫描的MEMS反射镜扫描器结构，其旨在例如实现用于激光打印的高精度扫描，也就是说 特别是旨在优化扫描镜本身的形状，尺寸等。 解决方案：通过必要地扩大作为入射角的更多的光路的范围变得更小（更小），可以实现高精度和小型化。 换句话说，在与发射目标表面正交的方向上的入射角在25-90°的范围内，扫描镜需要具有在振荡轴方向上的长度（b）与 （a≥b，a：b =（1.0〜2.0）：1）或（a
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公开(公告)号：JP2005300892A
公开(公告)日：2005-10-27
申请号：JP2004116744
申请日：2004-04-12
发明人： IMAI OSAMU
摘要： PROBLEM TO BE SOLVED: To provide an optical apparatus with which reflected light in a light transmission member furnished at the front face of a light reflection member does not become an external disturbance.
SOLUTION: A light transmission plate (light transmission member) 2 for protection is furnished on the front face of a micromirror (light reflection member) 1 having a yoke 1d which serves as a light reflection face, a laser beam from a laser light source 11 is reflected on the micromirror 1 via the light transmission plate 2, and a photoreceptor 12 is scanned with the reflected light beam via the light transmission plate 2. A first flat plane defined by the incident optical axis and the reflection optical axis of the micromirror 1 and a second flat plane defined by the incident optical axis and the reflection optical axis of the light transmission plate 2 are not in parallel. The photoreceptor 12 is not irradiated with the reflected light C of the laser beam from the laser light source 11 in the light transmission plate 2.
COPYRIGHT: (C)2006,JPO&NCIPI摘要翻译： 解决的问题：提供一种在光反射构件的正面设置的透光构件中的反射光不会变成外部干扰的光学装置。 解决方案：在具有作为光反射面的磁轭1d的微反射镜（光反射部件）1的正面上设置用于保护的透光板（透光部件）2，来自激光的激光束 光源11经由透光板2反射在微反射镜1上，并且通过透光板2用反射光束扫描感光体12.由入射光轴和反射光轴限定的第一平面 微镜1和由入射光轴和透光板2的反射光轴限定的第二平面不平行。 感光体12不被光透射板2中的来自激光光源11的激光束的反射光C照射。（C）2006，JPO＆NCIPI
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公开(公告)号：JP2015051440A
公开(公告)日：2015-03-19
申请号：JP2013183771
申请日：2013-09-05
发明人： IMAI OSAMU
IPC分类号： B22D19/00 , H01L21/288 , H01L21/3205 , H01L21/768 , H01L23/522
摘要： 【課題】溶融金属の流動性を十分に確保し、被処理面上における溶融金属の流動を均一なものにすることにより、被処理面全体を溶融金属で覆うことができるとともに、溶融金属中の溶存気体を極力少なくすることができる金属充填装置及び金属充填方法を提供する。【解決手段】金属充填装置1は、半導体ウェハKを、その処理面が水平方向に対して90?傾いた状態で保持する保持台H、筒状のハウジングC、進退自在に設けられたピストンPなどを備えており、保持台Hに保持された半導体ウェハK、ハウジングC及びピストンPによって気密状の処理室2が形成される。また、この金属充填装置1は、処理室内を減圧する減圧機構10、処理室2内に溶融金属Mを供給する溶融金属供給機構15、溶融金属Mの脱気を行う脱気機構20及び処理室2内に供給される溶融金属Mに高周波振動を付加する加振機構30を備えている。【選択図】図1
摘要翻译： 要解决的问题：提供一种金属填充装置和金属填充方法，其能够通过充分确保熔融金属的流动性并使均匀的金属填充装置和金属填充方法尽可能多地覆盖用熔融金属处理的整个表面并减少熔融金属中的溶解气体 熔融金属在待处理表面上的流动。解决方案：金属填充装置1包括：保持台H，其保持半导体晶片K的处理表面相对于半导体晶片K的处理表面倾斜90度的状态 向水平方向 圆柱形壳体C; 活塞P可前后移动; 等等。 保持在保持台H上的半导体晶片K，壳体C和活塞P形成气密处理室2.该金属填充装置1还包括：减压机构10，其减小处理室2内的压力; 将熔融金属M供给到处理室2内的熔融金属供给机构15; 脱气机构20使熔融金属M脱气; 以及向供给到处理室20的熔融金属M施加高频振动的励磁机构30。
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公开(公告)号：JP2013179350A
公开(公告)日：2013-09-09
申请号：JP2013115832
申请日：2013-05-31
IPC分类号： H01L21/288 , H01L21/3205 , H01L21/768 , H01L23/522 , H05K3/34
摘要： PROBLEM TO BE SOLVED: To provide a metal filling apparatus which can make a surplus metallic layer on a treated article thin, and can fill a minute space with a molten metal without any space therebetween.SOLUTION: The metal filling apparatus comprises: a holding part H for holding an article K to be treated; a cylindrical member C provided so as to face the holding part H; pressing members P and 6 which are fitted in the cylindrical member C so as to be capable of moving back and forth; a pressing mechanism 5 for relatively moving the cylindrical member C, the holding part H and the pressing members P and 6; a moving mechanism 16 for relatively moving the holding part H and the cylindrical member C in a direction separating the holding part H from or bringing the holding part H close to the cylindrical member C; and a treatment chamber 2 in an airtight state formed by the article K to be treated or the holding part H, the cylindrical member C and the pressing members P and 6. Furthermore, the metal filling apparatus comprises: a pressure reducing mechanism 3 for reducing a pressure in the treatment chamber 2; a molten metal supply mechanism 4 for supplying a molten metal M into the treatment chamber 2; a pressurizing mechanism 7 for pressurizing the molten metal M in the treatment chamber 2; and a molten metal sealing part for confining the molten metal M supplied in the treatment chamber 2 in a space between the pressing member 6 and the surface of the article K to be treated, in the pressing members P and 6.
摘要翻译： 要解决的问题：提供一种金属填充装置，其可以使经处理制品上的多余的金属层变薄，并且可以在熔融金属之间填充微小的空间，而不会有间隙。解决方案：金属填充装置包括：保持部 持有待处理物品的H; 设置成面向保持部H的圆筒状构件C; 按压构件P和6，其装配在圆筒构件C中以能够前后移动; 用于相对移动圆柱形构件C，保持部分H和按压构件P和6的按压机构5; 移动机构16，用于使保持部H和圆筒状构件C沿着使保持部H分离或使保持部H靠近圆筒状构件C的方向相对移动; 以及由被处理物K或保持部H，筒状构件C和按压构件P，6形成的气密状态的处理室2.此外，金属填充装置包括：减压机构3， 治疗室2中的压力; 用于将熔融金属M供给到处理室2中的熔融金属供给机构4; 用于对处理室2中的熔融金属M进行加压的加压机构7; 以及熔融金属密封部件，用于将加压处理室2中供应的熔融金属M限制在按压部件6和待处理物品K的表面之间的空间中。
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