摘要:
PROBLEM TO BE SOLVED: To provide a resist underlayer film applicable not only to a resist pattern formed of a hydrophilic organic compound obtained by negative development but also to a resist pattern formed of a hydrophobic compound obtained by conventional positive development.SOLUTION: Provided is a silicon-containing resist underlayer film-forming composition containing at least a condensation product and/or hydrolysis condensation product of a mixture comprising: one or more kinds of compound (A) selected from the group consisting of an organic boron compound shown by the general formula (1), namely, RB(OH)(OR), and condensation products thereof; and one or more kinds of silicon compound (B) shown by the general formula (2), namely, RRRSi(OR).
摘要:
PROBLEM TO BE SOLVED: To provide: a polymer carrier for utilizing catalytic activity of a gold nanoparticle or cluster; a catalyst for selectively hydrogenating an aromatic nitro compound in which a gold nanoparticle is carried by a polymer carrier; and methods for producing these.SOLUTION: This boronic acid ester type polymer particulate is formed by mixing benzene-1,4-diboronic acid and pentaerythritol in the presence of THF. Also the catalyst for selectively hydrogenating an aromatic nitro compound is obtained by making the boronic acid ester type polymer particulate carry the gold nanoparticle.