公开(公告)号：JP6400763B2

公开(公告)日：2018-10-03

申请号：JP2017051032

申请日：2017-03-16

Applicant: HOYA株式会社

Inventor： 谷口 和丈 ,  宍戸 博明

IPC: G03F1/56 ,  G03F7/11 ,  G03F7/20 ,  G03F1/54

CPC classification number: G03F1/54 ,  G03F1/56 ,  G03F7/11 ,  G03F7/20

公开(公告)号：JP4929708B2

公开(公告)日：2012-05-09

申请号：JP2005365959

申请日：2005-12-20

Applicant: 凸版印刷株式会社

Inventor： 龍士 河本 ,  港　　浩一

IPC: G03F1/54 ,  G02B5/20 ,  G03F1/56 ,  G03F7/20

公开(公告)号：JP2011027836A

公开(公告)日：2011-02-10

申请号：JP2009171177

申请日：2009-07-22

Applicant: Fujifilm Corp ,  富士フイルム株式会社

Inventor： MATSUMOTO YOSUKE

IPC: G03F1/50 ,  G03F1/56

Abstract: PROBLEM TO BE SOLVED: To provide photomask blanks which has a superior storage stability and a high sensitivity even when containing a large quantity of a light shielding material, and to provide a photomask which allows image formation with high resolution and ensures high linearity of an image edge. SOLUTION: The photomask blanks have, on a substrate, a photosensitive composition layer containing a sensitizing dye (A), a polymerization initiator (B), a multifunctional thiol compound (C) having 2 to 4 mercapto groups in a molecule, a polymerizable compound (D) having at least two ethylenically unsaturated bonds in a molecule, a binder polymer (E), and a light shielding material (F). COPYRIGHT: (C)2011,JPO&INPIT

Abstract translation: 要解决的问题：提供即使在含有大量遮光材料时也具有优异的储存稳定性和高灵敏度的光掩模坯料，并且提供允许以高分辨率进行成像并确保高线性的光掩模 的图像边缘。 光掩模坯料在基材上具有含有敏化染料（A），聚合引发剂（B），分子中具有2-4个巯基的多官能硫醇化合物（C）的感光性组合物层， 在分子中具有至少两个烯键式不饱和键的可聚合化合物（D），粘合剂聚合物（E）和遮光材料（F）。 版权所有（C）2011，JPO＆INPIT

公开(公告)号：JP2010237542A

公开(公告)日：2010-10-21

申请号：JP2009086739

申请日：2009-03-31

Applicant: Lintec Corp ,  リンテック株式会社

Inventor： IKEDA TAKESHI ,  TSUTSUI TOSHIHIRO ,  MIHASHI MASABUMI

IPC: G03F1/00 ,  G03F1/56 ,  G03F7/00 ,  G03F7/20

CPC classification number: G03F7/202 ,  G03F1/68 ,  G03F7/20

Abstract: PROBLEM TO BE SOLVED: To provide a member for mask films that has the following features: finely and accurately removing an ultraviolet-shielding resin layer by means of low-energy laser light gives areas having uniform light transmission; the ultraviolet-shielding resin layer is less likely to be damaged; and positioning is easy during production of a large-sized printing plate and when the member is brought into close contact with the plate, then air inclusion rarely occurs and the whole surface is easy to bring into close contact with the printing material.
SOLUTION: The member for masking films which includes a base film transparent to ultraviolet rays and, disposed on one surface thereof, the ultraviolet-shielding resin layer capable of being removed by irradiation with laser light beams and having an average thickness of 0.1 to 30 μm, wherein the ultraviolet-shielding resin layer is a multilayer structure composed of two or more layers including a resin layer (A) having a high carbon black content and a resin layer (B) having a low carbon black content, the layer (A) being located on the base film side and the layer (B) being located on the printing plate side, respectively, and the ultraviolet-shielding resin layer has specific optical properties.
COPYRIGHT: (C)2011,JPO&INPIT

Abstract translation: 要解决的问题：为了提供具有以下特征的掩模膜构件：通过低能量激光精细地并且精确地除去紫外线屏蔽树脂层，从而产生具有均匀透光性的区域; 紫外线屏蔽树脂层不太可能被损坏; 并且在制造大尺寸印版时的定位容易，并且当构件与板紧密接触时，则很少发生空气夹杂，整个表面容易与印刷材料紧密接触。 解决方案：用于掩蔽膜的构件，其包括对紫外线透明的基膜，并且在其一个表面上设置能够通过照射激光而被去除的平均厚度为0.1的紫外线屏蔽树脂层 至30μm，其中所述紫外线屏蔽树脂层是包括具有高炭黑含量的树脂层（A）和具有低炭黑含量的树脂层（B）的两层或更多层的多层结构，所述层 （A）分别位于基膜侧，层（B）分别位于印版侧，紫外线屏蔽树脂层具有特定的光学性质。 版权所有（C）2011，JPO＆INPIT

公开(公告)号：JP2010204203A

公开(公告)日：2010-09-16

申请号：JP2009047115

申请日：2009-02-27

Applicant: Fujifilm Corp ,  富士フイルム株式会社

Inventor： NAGASE HIROYUKI

IPC: G03F1/54 ,  G03F1/56 ,  G03F1/68 ,  G03F7/004 ,  G03F7/031 ,  G03F7/11 ,  G03F7/38

Abstract: PROBLEM TO BE SOLVED: To provide a method for manufacturing a photomask, by which a light shielding layer having high film strength and superior adhesiveness to a glass substrate can be formed while suppressing deformation or breakage in the glass substrate. SOLUTION: The method for manufacturing the photomask includes: an exposure step of imagewisely exposing a photomask blank including a photosensitive layer that contains a light-shielding material, a polymerization initiator, an ethylenically unsaturated compound and a binder polymer, and an oxygen shielding layer, successively formed on a transparent glass substrate; a developing step of removing an unexposed region on the transparent substrate by using a developing solution to form an imagewise light-shielding layer on the transparent glass substrate; and a heating step of heating the light shielding layer by an IR heater radiating IR light having a maximum wavelength in the range from 3 μm to 7 μm. COPYRIGHT: (C)2010,JPO&INPIT

Abstract translation: 要解决的问题：提供一种制造光掩模的方法，通过该方法可以在抑制玻璃基板中的变形或断裂的同时形成具有高的膜强度和与玻璃基板的粘合性优异的遮光层。 解决方案：制造光掩模的方法包括：成像曝光包括含有遮光材料的感光层，聚合引发剂，烯键式不饱和化合物和粘合剂聚合物的光掩模坯料和氧气的曝光步骤 屏蔽层，依次形成在透明玻璃基板上; 显影步骤，通过使用显影液在透明玻璃基板上形成图像遮光层，去除透明基板上的未曝光区域; 以及加热步骤，通过辐射最大波长在3μm至7μm范围内的IR光的IR加热器来加热遮光层。 版权所有（C）2010，JPO＆INPIT

公开(公告)号：JP2010085633A

公开(公告)日：2010-04-15

申请号：JP2008253621

申请日：2008-09-30

Applicant: Fujifilm Corp ,  富士フイルム株式会社

Inventor： MATSUMOTO YOSUKE

IPC: G03F1/50 ,  G03F1/56 ,  G03F7/004 ,  G03F7/029 ,  G03F7/031

Abstract: PROBLEM TO BE SOLVED: To provide photomask blanks having high sensitivity and excellent storage stability, and to provide a photomask which is produced using the photomask blanks and ensures high resolution and high linearity of an image edge part. SOLUTION: The photomask blanks have on a transparent substrate a photosensitive composition layer containing a sensitizing dye, a polymerization initiator, a compound having an ethylenically unsaturated group, a binder polymer, and a light blocking material, wherein the sensitizing dye is at least one selected from the group consisting of specific compounds represented by general formulae (S1) to (S5). COPYRIGHT: (C)2010,JPO&INPIT

Abstract translation: 要解决的问题：提供具有高灵敏度和优异的储存稳定性的光掩模坯料，并提供使用光掩模坯料制造的光掩模，并确保图像边缘部分的高分辨率和高线性度。 光掩模坯料在透明基材上具有包含敏化染料，聚合引发剂，具有烯属不饱和基团的化合物，粘合剂聚合物和遮光材料的光敏组合物层，其中敏化染料在 至少一种选自由通式（S1）至（S5）表示的具体化合物组成的组。 版权所有（C）2010，JPO＆INPIT

公开(公告)号：JP2010085597A

公开(公告)日：2010-04-15

申请号：JP2008253094

申请日：2008-09-30

Applicant: Kimoto & Co Ltd ,  株式会社きもと

Inventor： NEGISHI TOMOKO ,  HASEGAWA TAKESHI

IPC: C09D4/02 ,  C09D5/00 ,  C09D133/04 ,  C09D157/00 ,  G03F1/48 ,  G03F1/56

Abstract: PROBLEM TO BE SOLVED: To provide a protective liquid for emulsion mask capable of forming a protective film in a short time and achieving superior adhesion and surface hardness of an emulsion mask on which the protective film is formed, and to provide the emulsion mask using the same. SOLUTION: The ionizing radiation curing protective liquid for emulsion mask includes: an (meth)acrylate oligomer and/or (meth)acrylic monomer; and a reactive hydrophilic substance copolymerizable with the oligomer and/or the monomer. The reactive hydrophilic substance is (meth)acrylic modified hydrophilic substance, particularly an (meth)acrylic modified phosphate ester and/or (meth)acrylic modified quaternary ammonium salt. COPYRIGHT: (C)2010,JPO&INPIT

Abstract translation: 要解决的问题：提供一种能够在短时间内形成保护膜的乳液掩模保护液，并且能够实现其上形成有保护膜的乳剂掩模的优异的粘附性和表面硬度，并提供乳液 面具使用相同。 解决方案：乳剂用电离辐射固化保护液包括：（甲基）丙烯酸酯低聚物和/或（甲基）丙烯酸单体; 和可与低聚物和/或单体共聚的反应性亲水性物质。 反应性亲水性物质是（甲基）丙烯酸改性亲水性物质，特别是（甲基）丙烯酸改性磷酸酯和/或（甲基）丙烯酸改性季铵盐。 版权所有（C）2010，JPO＆INPIT

公开(公告)号：JP2010054966A

公开(公告)日：2010-03-11

申请号：JP2008221771

申请日：2008-08-29

Applicant: Fujifilm Corp ,  富士フイルム株式会社

Inventor： NAGASE HIROYUKI

IPC: G03F1/54 ,  G03F1/56 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide a method for manufacturing a photomask by which the photomask with a high resolution and excellent in the linearity of an image edge portion is formed. SOLUTION: The method for manufacturing the photomask has: an exposure step to image-expose a photomask blank sequentially having a photosensitive layer including a light shielding material, a photo-polymerization initiator, an ethylenically unsaturated compound, and a binder polymer, and an oxygen shielding layer on a transparent substrate; a development step to remove unexposed regions of the photosensitive layer and the oxygen shielding layer; and a rinsing step wherein the ultrasonic treatment of 50 to 1,000 kHz is conducted on at least one step of a development step and a rinsing step after development. COPYRIGHT: (C)2010,JPO&INPIT

Abstract translation: 要解决的问题：提供一种制造光掩模的方法，通过该方法，形成了具有高分辨率和优异的图像边缘部分的线性的光掩模。 解决方案：制造光掩模的方法具有：曝光步骤，对依次具有包含遮光材料的感光层，光聚合引发剂，烯属不饱和化合物和粘合剂聚合物的光掩模坯料进行成像曝光， 和透明基板上的氧气屏蔽层; 用于去除感光层和氧气屏蔽层的未曝光区域的显影步骤; 以及冲洗步骤，其中对显影步骤和显影后的漂洗步骤的至少一个步骤进行50-1,000kHz的超声波处理。 版权所有（C）2010，JPO＆INPIT

公开(公告)号：JP4372308B2

公开(公告)日：2009-11-25

申请号：JP2000089057

申请日：2000-03-28

Applicant: Okiセミコンダクタ株式会社

Inventor： 博幸 舟津

IPC: G03F1/56 ,  H01L21/027

CPC classification number: G03F1/84

公开(公告)号：JP2009519594A

公开(公告)日：2009-05-14

申请号：JP2008544953

申请日：2006-12-04

Applicant: コミシリア ア レネルジ アトミック

Inventor： シャルパン−ニコル、クリステル

IPC: H01L21/027 ,  G03F1/22 ,  G03F1/24 ,  G03F1/56

CPC classification number: G03F1/56 ,  B82Y10/00 ,  B82Y40/00 ,  G03F1/22 ,  G03F1/24 ,  G03F7/0042

Abstract: 本発明は、反射方式で動作する極紫外フォトリソグラフィーマスクの作製方法に関する。 このマスクは、基材（４０）と、基材上に均一に堆積されたミラー構造体（４２）と、ミラー構造体上に堆積されてパターンを形成する吸収要素（５０）と、を含み、吸収要素が、ミラー構造体上に堆積された有機金属レジスト層の照射およびその後の現像により得られることを特徴とする。
【選択図】 図２ｄ