公开(公告)号：KR1020090017585A

公开(公告)日：2009-02-18

申请号：KR1020087030144

申请日：2006-06-07

申请人： 브이 테크놀로지 씨오. 엘티디

发明人： 이이노진

IPC分类号： H01L21/027 ,  G02B5/20

CPC分类号： G03F9/70 ,  B29D11/00634 ,  G02B5/201 ,  G03B27/545 ,  G03F7/2002 ,  G03F7/70791 ,  G03F9/7084 ,  G03F9/7088 ,  G03F7/0007 ,  G03F7/2022 ,  G03F7/70733

摘要： In an exposure apparatus, exposure light from a lamp (continuous light source) (9) is applied at an exposure station (exposure section) (2) to a substrate (4), which is being transferred at a fixed speed in a fixed direction by a substrate transfer section (5), through a mask (11) arranged on an optical axis (optical path) (S) of an exposure optical system (3). At the time of exposing an image of an opening section (11a) of the mask (11) on the substrate (4), the front edge and the side edge (pattern edge) of a pixel (reference pattern) (18) previously formed on the substrate (4) are photographed by a linear CCD (20) of an imaging section (6), and a reference position in the transfer direction and a direction vertical to such direction on the substrate (4) is detected. When the pixel (18) imaged by the imaging section (6) is shifted to an exposure position (E) form an imaging position (F), the exposure station (2) continuously exposes an exposure region along the transfer direction of the substrate (4) while adjusting the position of the mask (11) so that the position of the mask (11) matches with the reference position on the substrate (4).

摘要翻译： 在曝光装置中，来自灯（连续光源）（9）的曝光光在曝光站（曝光部）（2）被施加到基板（4），基板（4）以固定方向 通过布置在曝光光学系统（3）的光轴（S）上的掩模（11）的衬底传送部分（5）。 在将掩模（11）的开口部（11a）的图像曝光在基板（4）上时，预先形成的像素（参考图案）（18）的前边缘和侧边缘（图案边缘） 检测在基板（4）上的由成像部（6）的线性CCD（20）拍摄的基板（4），并且检测基板（4）的传送方向和垂直于该方向的方向的基准位置。 当由成像部分（6）成像的像素（18）移动到曝光位置（E）时，形成成像位置（F），曝光站（2）沿着基板的传送方向连续曝光曝光区域 4），同时调整掩模（11）的位置，使得掩模（11）的位置与基板（4）上的基准位置相匹配。

公开(公告)号：KR1020090004826A

公开(公告)日：2009-01-12

申请号：KR1020080127111

申请日：2008-12-15

申请人： 우시오덴키 가부시키가이샤

发明人： 스기타니아키히코

IPC分类号： G03F7/20 ,  G02B6/00

CPC分类号： G03F7/2002 ,  B41J11/002 ,  G03F7/2004 ,  G03F7/70033 ,  G03F7/70175 ,  G03F7/70575 ,  G03F7/70866

摘要： An apparatus for irradiating UV rays is provided to irradiate the UV rays of 300-400 nm to the UV curing body effectively without using a cut filter for cutting the harmful UV rays less than 300 nm. An apparatus for irradiating UV rays(100) comprises a high pressure mercury lamp(1) which comprises a discharge container made of quartz glass and containing mercury of 0.08-0.13 mg/mm^3, an inert gas and halogen gas of 2x10^-4 - 7x10^-3 mumol/mm^3, and a pair of tungsten electrodes arranged with a distance of 0.5-1.5 mm in the discharge container so as to face each other and irradiates UV rays of 300-400 nm; and a light collection unit which collects the light from the high pressure mercury lamp, wherein the UV rays of 300-400 nm are collected into the region of Phi5mm or less by the light collection unit so as to be irradiated to the target body.

摘要翻译： 提供一种用于照射紫外线的装置，以有效地将紫外线照射300-400nm，而不使用切割过滤器来切割小于300nm的有害紫外线。 用于照射紫外线的装置（100）包括高压汞灯（1），其包括由石英玻璃制成的包含0.08-0.13mg / mm 3的汞的惰性气体和2×10 ^ 4〜7×10 -3 -3 mumol / mm 3，以及在放电容器中以0.5-1.5mm的距离排列的一对钨电极彼此面对并照射300-400nm的紫外线; 以及收集来自高压汞灯的光的光收集单元，其中通过光收集单元将300-400nm的紫外线收集到Phi5mm以下的区域中以照射到目标体。

公开(公告)号：KR100835605B1

公开(公告)日：2008-06-09

申请号：KR1020070059842

申请日：2007-06-19

申请人： 제일모직주식회사

发明人： 권오범 ,  이길성 ,  김재현 ,  김정현

IPC分类号： G03F7/004 ,  C08L23/00 ,  C08L31/00

CPC分类号： G03F7/0045 ,  C08L23/00 ,  C08L31/00 ,  G03F7/004 ,  G03F7/20 ,  G03F7/2002

摘要： A thermosetting resin composition, a color filter containing a transparent layer prepared by using the composition, and a CMOS image sensor containing the color filter are provided to improve chemical resistance, smoothness, adhesion, transmissivity, strength and heat resistance and to reduce defective pattern. A thermosetting resin composition comprises a self-curing copolymer comprising the units represented by the formulas 1, 2, 3 and 4; and an organic solvent, wherein R1 is H or a methyl group; n is an integer of 1-10; R2 is H or a methyl group; m is an integer of 1-10; R3 is H or a methyl group; R4 is H or a methyl group; and Z is a group represented by the formula 5. Preferably the self-curing copolymer has a weight average molecular weight of 1,000-1,000,000.

摘要翻译： 提供热固性树脂组合物，含有通过使用该组合物制备的透明层的滤色器和含有滤色器的CMOS图像传感器，以提高耐化学性，平滑性，粘附性，透射率，强度和耐热性，并且减少不良图案。 热固性树脂组合物包含含有由式1,2,3和4表示的单元的自固化共聚物; 和有机溶剂，其中R1是H或甲基; n为1-10的整数; R2是H或甲基; m为1-10的整数; R3是H或甲基; R4是H或甲基; Z为式5所示的基团。优选自固化共聚物的重均分子量为1,000〜1,000,000。

公开(公告)号：KR1020070112959A

公开(公告)日：2007-11-28

申请号：KR1020060046560

申请日：2006-05-24

申请人： 엘지디스플레이 주식회사

发明人： 김진욱

IPC分类号： G03F7/004

CPC分类号： G03F7/2002 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0002 ,  G03F7/004 ,  G03F7/0046 ,  G03F7/027 ,  H01L21/3127 ,  B29C59/02

摘要： A resin composition for forming a pattern and a method for printing by in-plane method by using the composition are provided to improve the lifetime of a mold plate by reducing the stress generated in the separation of a mold plate and a substrate at in-plane printing process. A resin composition for forming a pattern comprises a liquid phase polymer precursor in an amount less than 10 %; 40-60 % of a hydrophilic acrylate; 10-20 % of a viscosity modifier; 1-5 % of a photoinitiator; and other additives in an amount less than 6 %. Preferably the liquid phase polymer precursor is octafluoropentyl acrylate or octafluoropentyl methacrylate; the hydrophilic acrylate is diethylene glycol diacrylate or diethylene glycol dimethacrylate; and the viscosity modifier is butyl acrylate or butyl methacrylate.

摘要翻译： 提供一种用于形成图案的树脂组合物和通过使用该组合物的平面内方法进行印刷的方法，以通过降低模具板和基板在平面内的分离中产生的应力来提高模具的使用寿命 打印过程。 用于形成图案的树脂组合物包含小于10％的液相聚合物前体; 40-60％亲水丙烯酸酯; 10-20％的粘度调节剂; 1-5％的光引发剂; 和其他添加剂的含量小于6％。 优选地，液相聚合物前体是丙烯酸八氟戊酯或甲基丙烯酸八氟戊酯; 亲水性丙烯酸酯是二甘醇二丙烯酸酯或二甘醇二甲基丙烯酸酯; 粘度调节剂为丙烯酸丁酯或甲基丙烯酸丁酯。

公开(公告)号：KR1020050082372A

公开(公告)日：2005-08-23

申请号：KR1020040010813

申请日：2004-02-18

申请人： 학교법인 한양학원

发明人： 안일신 ,  오혜근 ,  이학준

IPC分类号： H01L21/30

CPC分类号： G03F7/2002 ,  G03F7/7055 ,  H01L21/67069

摘要： 본 발명은 광 조사를 이용한 금 식각 방법에 관한 것으로서, 간단한 장치와 인체나 환경에 유해성이 없는 화학 물질을 사용하고 공정을 단순화한 금 식각 방법과 그에 사용되는 장치를 제공하는 것을 목적으로 한다. 이러한 목적을 달성하기 위한 금 식각용 장치는 일 벽면에 광 투과창이 형성되고 염소 함유 유체가 충전된 용기와, 상기 용기 내에 시편을 장착하기 위한 시편 장착부와, 상기 용기의 외부에 마련되고 상기 광 투과창을 향하여 광을 조사하는 광원을 포함한다. 이와 같은 장치에서 금 또는 금 박막이 표면에 형성된 기판과 같은 시편에 광을 조사하여 금 식각을 행하게 된다.

公开(公告)号：KR1020050028793A

公开(公告)日：2005-03-23

申请号：KR1020040074099

申请日：2004-09-16

申请人： 캐논 가부시끼가이샤

发明人： 쯔지도시히코

IPC分类号： H01L21/027

CPC分类号： G03F7/70075 ,  G03F7/70083 ,  G03F7/702 ,  G21K2201/06 ,  G03F7/2002

摘要： An illumination optical system is provided to improve capability of an illumination optical system by uniformly distributing the angle of the light that illuminates a mask as compared with a conventional technique. The surface of an object to be process is illuminated by an illumination optical system. The illumination optical system includes an optical system that converts the light from a light source into approximately parallel light, and the optical system has the first and second mirrors. The first mirror has an opening through which the light reflected by the second mirror passes.

摘要翻译： 照明光学系统被提供以通过与传统技术相比均匀分布照射掩模的光的角度来提高照明光学系统的能力。 要处理的物体的表面被照明光学系统照亮。 照明光学系统包括将来自光源的光转换成大致平行的光的光学系统，并且光学系统具有第一和第二反射镜。 第一反射镜具有通过第二反射镜反射的光通过的开口。

公开(公告)号：KR1020040004433A

公开(公告)日：2004-01-13

申请号：KR1020037006349

申请日：2000-11-10

申请人： 고쿠리츠켄큐카이하츠호진 상교기쥬츠 소고켄큐쇼 ,  가부시키가이샤 나노시스템 솔루션즈

发明人： 요코야마히로시 ,  하가가즈미

IPC分类号： G03F7/20

CPC分类号： G03F7/70291 ,  G03F7/2002

摘要： 본 발명은, 반사형 또는 투과형의 표시부를 가지고, 해당 표시부에 노광해야 할 소정 화상을 표시하는 표시 장치와, 노광의 대상이 되는 기판을 지지하는 스테이지와, 상기 표시부 상에 표시된 상기 소정 화상을 상기 스테이지 상에 상기 기기판의 표면에 투영하는 텔리센트릭 타입의 투영 렌즈를 포함하는 투영 노광 장치이다.

摘要翻译： 一种投影曝光装置，包括：具有反射型或透射型显示部分的显示装置，在其上显示要曝光的预定图像; 用于保持要暴露的基板的阶段; 以及远心型投影透镜，用于将显示在显示部上的预定图像投影到保持在平台上的基板的表面上。

公开(公告)号：KR1020010017899A

公开(公告)日：2001-03-05

申请号：KR1019990033645

申请日：1999-08-16

申请人： 삼성전자주식회사

发明人： 오성태

IPC分类号： G03F1/68 ,  G03F7/20

CPC分类号： G03F7/039 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0382 ,  G03F7/0392 ,  G03F7/0397 ,  G03F7/2002

摘要： PURPOSE: A pattern formation method is provided to prevent the formation of footing or undercut on a resist pattern made up of a chemical amplification resist formed on a semiconductor substrate. CONSTITUTION: A surface of a semiconductor substrate is treated by using a surface treatment. A resist film is formed by spreading a chemical amplification type resist on the surface of the semiconductor substrate. The resist film is exposed by projecting DUV(deep ultraviolet). A resist pattern is formed by developing the exposed resist film. Herein, as the surface of the semiconductor substrate is pre-treated by the non-basic surface treatment, a basic element does not exist on the surface of the semiconductor substrate. Accordingly, upon the exposure process of the resist film, the neutralization of acid caused from PAG(photo acid generator) is avoided. Further, the resist pattern of a desired shape is obtained without footing or undercut between the semiconductor substrate and the resist pattern.

摘要翻译： 目的：提供图案形成方法，以防止在由形成在半导体衬底上的化学放大抗蚀剂构成的抗蚀剂图案上形成底脚或底切。 构成：通过使用表面处理来处理半导体衬底的表面。 通过在半导体衬底的表面上扩散化学放大型抗蚀剂来形成抗蚀剂膜。 通过投影DUV（深紫外）来曝光抗蚀剂膜。 通过显影曝光的抗蚀剂膜形成抗蚀剂图案。 这里，由于通过非碱性表面处理对半导体衬底的表面进行预处理，所以在半导体衬底的表面上不存在碱性元素。 因此，在抗蚀膜的曝光过程中，避免了由PAG（光酸产生剂）引起的酸的中和。 此外，在半导体衬底和抗蚀剂图案之间没有基底或底切获得所需形状的抗蚀剂图案。

公开(公告)号：KR1020010010305A

公开(公告)日：2001-02-05

申请号：KR1019990029111

申请日：1999-07-19

申请人： 삼성전자주식회사

发明人： 곽규환 ,  정규찬

IPC分类号： G03F7/16

CPC分类号： G03F7/168 ,  G03F7/2002 ,  G03F7/40 ,  G03F7/70875 ,  H01L21/0274

摘要： PURPOSE: Provided is ultraviolet bake equipment capable of flowing photoresist which can progress a process that bakes photoresist by UV and flows photoresist in the same equipment. CONSTITUTION: The ultraviolet bake equipment contains i) a hot plate; ii) a heating coil that is installed at the inside to control the temperature of the hot plate; iii) a cooling pass that is installed at the lower side of the heating coil; and iv) a pin for maintaining distance that is able to maintain distance with a wafer that is installed at the upside surface of the hot plate.

摘要翻译： 目的：提供能够流动光刻胶的紫外线烘烤设备，其可以进行通过UV烘烤光致抗蚀剂的工艺，并在同一设备中流动光致抗蚀剂。 规定：紫外线烘烤设备包含i）热板; ii）加热线圈，其安装在内部以控制热板的温度; iii）安装在加热线圈下侧的冷却通道; 以及iv）用于保持距离的销，其能够与安装在热板的上表面上的晶片保持距离。

公开(公告)号：KR100213605B1

公开(公告)日：1999-08-02

申请号：KR1019910016640

申请日：1991-09-25

申请人： 가부시끼가이샤 히다치 세이사꾸쇼

发明人： 후꾸다히로시 ,  데라사와쯔네오

IPC分类号： H01L21/31

CPC分类号： G03F1/30 ,  G03F1/26 ,  G03F1/29 ,  G03F1/36 ,  G03F7/2002 ,  G03F7/70125 ,  G03F7/70191 ,  G03F7/70241 ,  G03F7/70308 ,  G03F7/70333

摘要： 각종 고체소자의 미세패턴형성에 사용되는 패턴형성방법및 미세패턴형성에 사용되는 투영노출장치, 투영노출용 마스크, 마스크의 제조방법 및 마스크패턴의 레이아우트설계방법과 모든 광학기기에 사용되는 광학렌즈및 이들 광학렌즈내에 설치되는 광학필터로서, 복잡한 형상의 패턴에서는 근접효과가 증대하기 때문에 마스크형상과 같은 전사패턴이 얻어지지 않는다는 문제점을 해소하기위해, LSI 패턴형성등에 사용되는 투영노출장치의 투영렌즈의 푸필에 그의 최대반경으로 규격화된 반경방향좌표r의 함수로써, 대략 T(r)=(2πβr
2 -θ/2)로 표시되는 복소진폭 투과율분포를 갖는 광학필터를 마련하던가 또는 LSI상에 그려지는 레이아우트 패턴을 푸리에변환하고, 변환후의 패턴데이타에 cos (2πβf
2 -θ/2)를 곱하고, 이것을 푸리에역변환해서 얻어진 패� �� 또는 그의 근사해를 마스크패턴으로 해서 LSI를 노출제조한다.
이것에 의해 해상한계를 향상하기 위해 고NA화와 단파장화를 진행시킨 경우에도 깊은 초점심도와 높은 화상질을 양립시킬수가 있어 광학노출방식을 사용해서 0.2~0.3㎛의 패턴을 형성할 수 있다.