公开(公告)号：KR1020170102162A

公开(公告)日：2017-09-07

申请号：KR1020170109516

申请日：2017-08-29

申请人： 가부시키가이샤 스크린 홀딩스

发明人： 다나카유지 ,  미야기다다시 ,  하루모토마사히코 ,  가네야마고지

IPC分类号： G03F7/00 ,  G03F7/32 ,  G03F7/06 ,  H01L21/027

CPC分类号： G03F7/3021 ,  H01L21/6715 ,  G03F7/0025 ,  G03F7/063 ,  G03F7/32 ,  H01L21/0273

摘要： 현상방법에있어서, 중심부둘레로회전하는기판상이며, 중심부로부터벗어난미리설정된위치에, 현상노즐에의해현상액의토출을개시한다. 이것에의해, 토출개시직후부터원심력이작은중심부에현상액의흐름을일으킬수 있다. 그때문에, 중심부에현상액의토출을개시한경우에비해, 레지스트의용해생성물을효율적으로기판밖으로배출할수 있다. 또, 토출개시직후부터현상노즐에의해직접토출되는현상액의도착위치가분산되어, 특히기판의중심부에서레지스트패턴이가늘어지는것이억제되어, 처리편차를억제할수 있다.

摘要翻译： 在显影方法中，显影液开始通过显影喷嘴在偏离中心部分的中心部分偏离中心部分的预定位置排出。 这使得可以在开始排出之后立即使显影剂流向离心力小的中心部分。 因此，与显影剂在中心排出的情况相比，抗蚀剂的溶解产物可以被有效地排出到基板的外部。 另外，在开始排出之后立即由显影喷嘴直接排出的显影剂的到达位置被分散，特别是，抗蚀剂图案不会在基板的中央部分倾斜，并且可以抑制处理偏差。

公开(公告)号：KR1020140051646A

公开(公告)日：2014-05-02

申请号：KR1020120117932

申请日：2012-10-23

申请人： 세메스 주식회사

发明人： 김수혁 ,  김효진 ,  류승수

IPC分类号： H01L21/027 ,  H01L21/02

CPC分类号： H01L21/0273 ,  G03F7/0025 ,  H01L21/31055

摘要： A developing device for manufacturing an integrated circuit element for making photoresist coated on a substrate into a photoresist pattern comprises a developing chamber in which a process of spraying a developing solution on the photoresist is performed; a cleaning chamber which is connected to the developing chamber and in which a process of cleaning the substrate transferred to the developing chamber is performed; and a blade which is disposed at an exit of the developing chamber based on a transfer path of the substrate transferred from the developing chamber to the cleaning chamber and is spaced from the substrate to partially remove the developing solution sprayed on the photoresist.

摘要翻译： 用于制造用于将涂覆在基板上的光致抗蚀剂图案的光致抗蚀剂图案制造的集成电路元件的显影装置包括显影室，其中执行在光致抗蚀剂上喷涂显影液的过程; 清洁室，其连接到显影室，并且其中执行清洁转印到显影室的基板的过程; 以及叶片，其基于从显影室转移到清洁室的基板的转移路径设置在显影室的出口处，并且与基板间隔开以部分地去除喷涂在光致抗蚀剂上的显影溶液。

公开(公告)号：KR1020120112005A

公开(公告)日：2012-10-11

申请号：KR1020120020179

申请日：2012-02-28

申请人： 가부시키가이샤 아도테크 엔지니어링

发明人： 키쿠치히로아키

IPC分类号： G03F7/00 ,  H05K3/10 ,  H01L21/027

CPC分类号： G03F7/0025 ,  B05C9/10 ,  B05D7/24 ,  G03F7/0032 ,  H01L21/0274 ,  H05K3/101 ,  H05K3/106

摘要： PURPOSE: A pattern forming apparatus and a pattern forming method are provided to finely form pre-determined patterns on a substrate by forming alignment marks on a film made of a liquid repellent agent and using the alignment marks. CONSTITUTION: A pattern forming method includes the following: mark patterns to become alignment marks(M) is exposed on a film(80) made of a liquid repellent agent which is formed on a substrate(Z); visualizing ink is printed on the exposure regions of the mark patterns to form the alignment marks; the position information of the alignment marks is obtained; the positions of patterns and the substrate are changed to adjust a position at which the patterns are formed; and the patterns are formed.

摘要翻译： 目的：提供图案形成装置和图案形成方法，通过在由防液剂制成的膜上形成对准标记并使用对准标记，在基板上精细地形成预定图案。 构成：图案形成方法包括以下步骤：将形成对准标记（M）的标记图案暴露在由形成在基板（Z）上的防液剂制成的膜（80）上; 将可视化油墨印刷在标记图案的曝光区域上以形成对准标记; 获得对准标记的位置信息; 改变图形和基板的位置以调整形成图案的位置; 并形成图案。

公开(公告)号：KR1020020061185A

公开(公告)日：2002-07-24

申请号：KR1020010002093

申请日：2001-01-15

申请人： 김영백 ,  심상철 ,  이영하

发明人： 김영백 ,  이영하 ,  심상철 ,  김상년

IPC分类号： G03F7/26

CPC分类号： G03F7/26 ,  G03F7/0002 ,  G03F7/0025 ,  H01L21/0273

摘要： PURPOSE: Provided is a process for forming photoresist patterns by using a photochemical crosslinking and an enzyme decomposition of polyhydroxy alkanoate(PHA) being a biodegradable polymer. CONSTITUTION: The process comprises the steps of: forming a pattern of the PHA by using a decomposing enzyme; mixing the PHA with a photo-sensitizer such as diphenyl(2,4,6-trimethylbenzoylphosphine oxide) and coating on a silicone wafer; covering the PHA(2) coated on the silicone wafer(3) with a semipermeable mask(1) and irradiating deep ultraviolet(4); preparing a solution for decomposing the PHA; decomposing the PHA by soaking in the solution of the decomposing enzyme; washing the PHA with distilled water; leaving the PHA under the vacuum to remove residual moisture.

摘要翻译： 目的：提供通过使用作为可生物降解的聚合物的聚羟基链烷酸酯（PHA）的光化学交联和酶分解来形成光致抗蚀剂图案的方法。 构成：该方法包括以下步骤：通过使用分解酶形成PHA的图案; 将PHA与光敏剂如二苯基（2,4,6-三甲基苯甲酰氧基氧化物）混合并在硅晶片上涂布; 用半透膜（1）覆盖涂覆在硅胶晶片（3）上的PHA（2）并照射深紫外线（4）; 准备分解PHA的解决方案; 通过浸泡在分解酶的溶液中分解PHA; 用蒸馏水洗涤PHA; 将PHA置于真空下以除去残留的水分。

公开(公告)号：KR1020000073503A

公开(公告)日：2000-12-05

申请号：KR1019990016821

申请日：1999-05-11

申请人： 동부일렉트로닉스 주식회사

发明人： 이병철

IPC分类号： G03F7/16

CPC分类号： G03F7/162 ,  G03F7/0025 ,  G03F7/091 ,  G03F7/16 ,  G03F7/26

摘要： PURPOSE: A coating method of photosensitive film is provided, which forms the photosensitive film to drop photosensitive solution for antireflective coating on the wafer in the condition of stopping the wafer. Therefore, it prevents damage of board at the etching plasma by minimizing the formation of bubble that is generated by mixing photosensitive solution and air by the change of the air current. CONSTITUTION: The coating method contains the steps of; (1) dropping photosensitive solution for antireflective coating on the wafer in the condition of stopping the wafer; and (2) rotating the wafer after spraying the photosensitive solution for antireflective coating on the surface of the wafer.

摘要翻译： 目的：提供一种感光膜的涂布方法，其形成感光膜，以在晶片停止的状态下将晶片上的抗反射涂层的感光溶液落下。 因此，通过使气流的变化使感光性溶液和空气混合而产生的气泡的形成最小化，防止蚀刻等离子体的板损伤。 规定：涂布方法包括以下步骤： （1）在晶片停止的状态下，在晶片上滴下抗反射涂层的感光性溶液; 和（2）在晶片的表面上喷涂用于抗反射涂层的光敏溶液之后旋转晶片。

公开(公告)号：KR1020140051604A

公开(公告)日：2014-05-02

申请号：KR1020120117835

申请日：2012-10-23

申请人： 세메스 주식회사

发明人： 김주용

IPC分类号： H01L21/027 ,  H01L21/02

CPC分类号： H01L21/0273 ,  G03F7/0025

摘要： A developing apparatus for fabricating an integrated circuit for forming photoresist coated on a substrate as a photoresist pattern, may include a chamber which provides a space for forming photoresist coated on the substrate as a photoresist pattern; an inlet part for inputting the substrate to the chamber; a discharge part which is formed in one side of the chamber to discharge fluid generated in the chamber from the inside of the chamber to the outside of the chamber; and an air current controlling part which is formed in the chamber near the inlet part to control the air current to the flow of the fluid which is generated in the chamber.

摘要翻译： 一种用于制造用于形成涂覆在基板上的光致抗蚀剂图案的光致抗蚀剂图案的集成电路的显影装置可以包括：提供用于形成涂覆在基板上的光致抗蚀剂图案的空间的室; 用于将所述基板输入到所述室的入口部分; 排出部，其形成在所述室的一侧，以将从所述室的内部产生的流体排出到所述室的外部; 以及气流控制部，其形成在入口附近的室中，以控制与在室中产生的流体的流动的气流。

公开(公告)号：KR1020130138932A

公开(公告)日：2013-12-20

申请号：KR1020120062477

申请日：2012-06-12

申请人： 한국생산기술연구원

发明人： 강정진 ,  홍석관

IPC分类号： H01L21/027 ,  G03F7/00

CPC分类号： B81C1/00047 ,  B01D67/00 ,  B01D67/0034 ,  B01L3/502707 ,  B01L2300/0681 ,  B81B2201/051 ,  B81C2201/019 ,  H01L21/0273 ,  G03F7/0025 ,  G03F7/0035

摘要： The present invention relates to a method for manufacturing a plastic chamber plate including a polymer membrane with arranged micro-holes. The purpose of the present invention is to improve productivity and reduce a failure rate by enabling the manufacture of a membrane in which micro-holes are arranged and simultaneously performing a membrane manufacturing work and a work for attaching the membrane to a plastic chamber plate. The method for manufacturing a plastic chamber plate including a polymer membrane with arranged micro-holes comprises: a step of forming a sacrificial layer by coating the upper part of a wafer with polymer (S110); a step of forming a photoresist layer by coating the upper part of the sacrificial layer with photoresist (S120); a step of arranging a mask with micro-holes on the upper part of the photoresist layer formed by the step S120 and irradiating the upper part of the arranged mask with ultraviolet rays (S130); a step of removing a portion irradiated by ultraviolet rays by using a development solution after the step S130 and manufacturing the membrane with micro-holes by drying and hardening a part by applying heat (S140); a step of bonding the plastic chamber plate to the upper part of the manufactured membrane (S150); and a step of separating the membrane from the wafer by removing the sacrificial layer by using a solvent after the step S150 (S160).

摘要翻译： 本发明涉及一种包括具有布置的微孔的聚合物膜的塑料室板的制造方法。 本发明的目的是通过制造其中布置有微孔的膜并且同时进行膜制造工作和将膜附着到塑料室板上的工作来提高生产率并降低故障率。 包括具有布置的微孔的聚合物膜的塑料室板的制造方法包括：通过用聚合物涂覆晶片的上部来形成牺牲层的步骤（S110）; 通过用光致抗蚀剂涂覆牺牲层的上部来形成光致抗蚀剂层的步骤（S120）; 在由步骤S120形成的光致抗蚀剂层的上部设置具有微孔的掩模的步骤，并用紫外线照射布置的掩模的上部（S130）; 通过在步骤S130之后使用显影液除去紫外线照射的部分，并且通过加热来干燥和硬化部件来制造具有微孔的膜的步骤（S140）; 将塑料室板接合到制膜的上部的步骤（S150）; 以及在步骤S150之后通过使用溶剂去除牺牲层，从而将膜与晶片分离的步骤（S160）。

公开(公告)号：KR1020120009655A

公开(公告)日：2012-02-02

申请号：KR1020100069851

申请日：2010-07-20

申请人： 엘지이노텍 주식회사

发明人： 홍범선 ,  강현욱 ,  신준식 ,  구찬규 ,  이용인

IPC分类号： G03F7/20 ,  B41C1/00

CPC分类号： G03F7/0007 ,  G03F7/0025 ,  G03F7/004 ,  G03F7/161 ,  G03F7/2018 ,  G03F7/2022 ,  G03F7/26

摘要： PURPOSE: A printing plate and a method for manufacturing the same are provided to improve the depth ratio of patterns according to the line widths of the patterns by forming the patterns through a photosensitive region patterning process. CONSTITUTION: A first photosensitive resin is applied on a substrate(110) and is exposed to form the lower pattern(121) of a first pattern(123). A second photosensitive resin is applied on the photosensitive resin and is exposed to form the upper pattern(122) of the first pattern and a second pattern(132). The first and the second photosensitive resins are simultaneously developed to form the first pattern and the second pattern. A functional layer(140) is formed on the upper side of the first pattern and the second patterns.

摘要翻译： 目的：提供一种印版及其制造方法，通过通过感光区域图案化工艺形成图案来提高根据图案的线宽度的图案的深度比。 构成：将第一感光性树脂施加在基板（110）上并暴露以形成第一图案（123）的下图案（121）。 将第二感光性树脂施加在感光性树脂上，露出形成第一图案的上部图案（122）和第二图案（132）。 第一和第二感光性树脂同时显影以形成第一图案和第二图案。 功能层（140）形成在第一图案的上侧和第二图案上。

公开(公告)号：KR1020100103413A

公开(公告)日：2010-09-27

申请号：KR1020100022148

申请日：2010-03-12

申请人： 도쿄엘렉트론가부시키가이샤

发明人： 요시다유우이찌 ,  아리마히로시 ,  야마모또다로오 ,  요시하라고오스께

IPC分类号： H01L21/027

CPC分类号： H01L21/67748 ,  H01L21/67109 ,  H01L21/6715 ,  G03F7/0025 ,  G03F7/405 ,  G03F7/70875

摘要： PURPOSE: A substrate processing apparatus, a substrate processing method, a coating and developing apparatus, a coating and developing method, and a storage media are provided to prevent the generation development defects by uniformly supplying a developing solution on a substrate. CONSTITUTION: A substrate(W) is undergone through an exposure process. A heating plate(31) heats the exposed substrate. A surface processing solution atomization unit(60) atomizes a surface processing solution in order to improve the wettability of the substrate. A cooling unit(15) cools the heat substrate. The surface processing solution supplying unit supplies the atomized surface processing solution to the substrate.

摘要翻译： 目的：提供基板处理装置，基板处理方法，涂覆和显影装置，涂覆和显影方法以及存储介质，以通过将显影液均匀地供应到基板上来防止发生发展缺陷。 构成：基片（W）经过曝光过程。 加热板（31）加热暴露的基板。 表面处理溶液雾化单元（60）使表面处理溶液雾化，以提高基材的润湿性。 冷却单元（15）冷却热衬底。 表面处理液供给部将该雾化表面处理液供给到基板。

公开(公告)号：KR1020090123411A

公开(公告)日：2009-12-02

申请号：KR1020080049471

申请日：2008-05-28

申请人： 연세대학교 산학협력단

发明人： 이명규 ,  신현권

IPC分类号： H01L21/027 ,  B82Y40/00

CPC分类号： G03F7/0025 ,  B82Y40/00 ,  G02F2203/12 ,  H01L21/0275

摘要： PURPOSE: A thin film patterning method is provided to form a nano particle thin film simply without a complex photoresist by selectively removing a particle in the thin film using the pulse laser. CONSTITUTION: A light transmissive source substrate(40) with a thin film(50) including the particle is provided. A receiver substrate(60) is arranged to face the surface of the source substrate with the thin film. A pulse laser beam emitted from a pulse laser beam irradiation unit passes through a spatial light modulator(20) and is irradiated to the source substrate. A parallel patterning process is performed in the source substrate to form the pattern corresponding to the pattern of the spatial light modulator in the particle thin film. A thin film(70) with the pattern corresponding to the pattern formed in the source substrate is formed on the receiver substrate.

摘要翻译： 目的：提供薄膜图案化方法，通过使用脉冲激光器选择性去除薄膜中的颗粒，简单地形成不含复合光致抗蚀剂的纳米颗粒薄膜。 构成：提供了具有包括该颗粒的薄膜（50）的透光源基板（40）。 接收器基板（60）被布置成与薄膜面对源极基板的表面。 从脉冲激光束照射单元发射的脉冲激光束通过空间光调制器（20）并照射到源极基板。 在源极基板中进行平行图案化处理以形成与颗粒薄膜中的空间光调制器的图案对应的图案。 在接收器基板上形成具有与形成在源极基板上的图案对应的图案的薄膜（70）。