액정표시장치용 플라즈마 강화 화학기상증착 장치
    1.
    发明公开
    액정표시장치용 플라즈마 강화 화학기상증착 장치 无效
    用于液晶显示装置的等离子体增强化学气相沉积

    公开(公告)号:KR1020120049065A

    公开(公告)日:2012-05-16

    申请号:KR1020100110634

    申请日:2010-11-08

    发明人: 김지훈

    IPC分类号: G02F1/13 H01L21/205

    摘要: PURPOSE: A plasma enhanced chemical vapor deposition device for a liquid crystal display device is provided to have strong features against thermal deformation and form a good film. CONSTITUTION: An edge of a backing plate(234) has a stepped structure. A shower head(230) is arranged in a lower part of the backing plate. A susceptor(160) is separated from the shower head. The susceptor supports a substrate. A coupling unit is formed in an edge of the shower head. The coupling unit is vertically coupled with a side of the backing plate.

    摘要翻译: 目的:提供一种用于液晶显示装置的等离子体增强化学气相沉积装置,以具有抵抗热变形的强大特征并形成良好的膜。 构成:背板(234)的边缘具有阶梯状结构。 淋浴头(230)布置在背板的下部。 感受器(160)与淋浴头分离。 基座支撑基板。 联接单元形成在淋浴喷头的边缘。 联接单元与背板的一侧垂直联接。

    고온 초전도체 전선의 제조 방법
    3.
    发明公开
    고온 초전도체 전선의 제조 방법 审中-实审
    制造高温超导体线材的方法

    公开(公告)号:KR1020170130489A

    公开(公告)日:2017-11-28

    申请号:KR1020177030120

    申请日:2016-03-16

    IPC分类号: H01L39/24 H01B12/00 H01B13/00

    摘要: 본발명은고온초전도체전선의제조방법에관한것이다. 특히, 본발명은이트륨또는희토류금속, 알칼리토금속, 및전이금속을포함하는박막을 700℃이상까지가열하고, 상기박막을 300℃이하까지냉각시킴을포함하되, 가열및 냉각이 2회이상수행되는, 고온초전도체의제조방법에관한것이다.

    摘要翻译: 本发明涉及一种制造高温超导体线材的方法。 特别地,本发明是钇或加热稀土类金属,薄膜包括碱土金属和过渡金属,以700℃以上,并且其包括,但薄膜锡金冷却至不高于300℃时,加热和冷却进行两次或更多次, 一种制造高温超导体的方法。

    테이프 기판 위에 초전도체 재료를 형성하기 위한 방법 및 장치
    4.
    发明公开
    테이프 기판 위에 초전도체 재료를 형성하기 위한 방법 및 장치 有权
    超导体材料在带状基材上的方法和装置

    公开(公告)号:KR1020050048590A

    公开(公告)日:2005-05-24

    申请号:KR1020057001408

    申请日:2003-07-23

    IPC分类号: H01L39/00

    摘要: The invention continuously deposits materials used to grow a superconductor layer onto a moving tape. The invention preferably uses a pay-out reel (401) and take-up reel (406) to respectively dispense and spool the tape substrate at a constant rate. The invention preferably uses a series of stages to form the superconductor layer on the tape, and includes at least one reactor or reaction chamber (601c) to deposit one or more materials onto the tape substrate that is used to form the superconductor layer, and one or more chambers (601a, 601b) to deposit buffer layers between the superconductor and the metal tape substrate or between layers of superconductor, as well as for the deposition of coating layers. The invention also preferably uses transition chambers (701) between the stages to isolate each stage from the other stages.

    摘要翻译: 本发明将用于生长超导体层的材料连续地沉积到移动的带上。 本发明优选使用发放卷轴(401)和卷取卷轴(406)分别以恒定速率分配和卷绕带基片。 本发明优选使用一系列步骤在带上形成超导体层,并且包括至少一个反应室或反应室(601c),以将一种或多种材料沉积到用于形成超导体层的带基材上,一个 或更多的腔室(601a,601b)以在超导体和金属带衬底之间或超导体层之间沉积缓冲层,以及用于沉积涂层。 本发明还优选地在级之间使用过渡室(701)以将每个级与其它级隔离。

    초전도 MgB₂박막의 제조 방법
    6.
    发明公开
    초전도 MgB₂박막의 제조 방법 无效
    制备超导MgB2掩模的方法

    公开(公告)号:KR1020040014642A

    公开(公告)日:2004-02-14

    申请号:KR1020040005350

    申请日:2004-01-28

    发明人: 이호년 문승현

    IPC分类号: H01L39/12

    摘要: PURPOSE: A method for fabricating a super-conducting MgB2 mask is provided to form the super-conducting MgB2 mask by reacting magnesium of a gas state with a boron layer deposited on a substrate. CONSTITUTION: A substrate including a boron layer is loaded on a heater within a chamber(1). A purging process is performed by using inert gas of a high degree of purity. The substrate is heated by operating the heater. Magnesium is induced into the substrate. The substrate is heated under the temperature of 1000 degrees centigrade. The magnesium is induced as much as 1 to 2000sccm. The temperature of a chiller is o 50 to 500 degrees centigrade. The pressure of the chamber(1) is 0.01 mTorr to 100 Torr.

    摘要翻译: 目的:提供一种制造超导MgB2掩模的方法,通过使气态镁与沉积在基底上的硼层反应形成超导MgB2掩模。 构成:将包含硼层的基板装载在室(1)内的加热器上。 通过使用高纯度的惰性气体进行清洗过程。 通过操作加热器来加热基板。 镁被诱导到底物中。 基板在1000摄氏度的温度下加热。 镁的诱导高达1〜2000sccm。 冷水机的温度为50至500摄氏度。 室(1)的压力为0.01mTorr至100Torr。

    상부 발광방식 유기전계발광소자 및 이의 제조방법
    10.
    发明公开
    상부 발광방식 유기전계발광소자 및 이의 제조방법 无效
    顶部排放型有机电致发光器件及其制造方法

    公开(公告)号:KR1020100063292A

    公开(公告)日:2010-06-11

    申请号:KR1020080121751

    申请日:2008-12-03

    IPC分类号: H05B33/02 H05B33/22 H01L51/50

    摘要: PURPOSE: A top emission type organic electro-luminescence element and a method for manufacturing the same are provided to minimize the reflection of external light and improve contrast. CONSTITUTION: A semiconductor layer(201) is formed on a first substrate(101) which is composed of silicon. A gate insulation layer(203) is formed on the semiconductor layer. A gate electrode(205) and a gate wire are formed on the upper side of the gate insulation layer in response with the semiconductor layer. A first interlayer insulation layer(207a) is formed on the entire surface of the gate electrode and the gate wire.

    摘要翻译: 目的:提供顶部发射型有机电致发光元件及其制造方法,以最小化外部光的反射并改善对比度。 构成:半导体层(201)形成在由硅构成的第一基板(101)上。 在半导体层上形成栅极绝缘层(203)。 响应于半导体层,在栅极绝缘层的上侧形成栅电极(205)和栅极线。 在栅电极和栅极线的整个表面上形成第一层间绝缘层(207a)。