公开(公告)号：US20060082746A1

公开(公告)日：2006-04-20

申请号：US10966108

申请日：2004-10-18

申请人： Jeroen Johannes Mertens ,  Sjoerd Nicolaas Donders ,  Roelof De Graaf ,  Christiaan Hoogendam ,  Antonius Van Der Net ,  Franciscus Johannes Teunissen ,  Patricius Aloysius Tinnemans ,  Martinus Cornelis Verhagen ,  Jacobus Johannus Leonardus Verspay ,  Edwin Van Gompel

发明人： Jeroen Johannes Mertens ,  Sjoerd Nicolaas Donders ,  Roelof De Graaf ,  Christiaan Hoogendam ,  Antonius Van Der Net ,  Franciscus Johannes Teunissen ,  Patricius Aloysius Tinnemans ,  Martinus Cornelis Verhagen ,  Jacobus Johannus Leonardus Verspay ,  Edwin Van Gompel

IPC分类号： G03B27/42

CPC分类号： G03F7/70716 ,  G03F7/70341

摘要： A lithographic apparatus is disclosed including a liquid supply system configured to at least partly fill a space between the projection system and the substrate with a liquid, an outlet configured to remove a mixture of liquid and gas passing through a gap between a liquid confinement structure of the liquid supply system and the substrate, and an evacuation system configured to draw the mixture through the outlet, the evacuation system having a separator tank arranged to separate liquid from gas in the mixture and a separator tank pressure controller, connected to a non-liquid-filled region of the separator tank, configured to maintain a stable pressure within the non-liquid-filled region.

公开(公告)号：US20050036121A1

公开(公告)日：2005-02-17

申请号：US10831370

申请日：2004-04-26

申请人： Christiaan Hoogendam ,  Sjoerd Donders ,  Hans Jansen ,  Jacobus Johannus Leonardus Verspay ,  Antonius Theodorus Derksen ,  Joeri Lof ,  Erik Loopstra ,  Johannes Catharinus Mulkens ,  Alexander Straaijer ,  Bob Streefkerk

发明人： Christiaan Hoogendam ,  Sjoerd Donders ,  Hans Jansen ,  Jacobus Johannus Leonardus Verspay ,  Antonius Theodorus Derksen ,  Joeri Lof ,  Erik Loopstra ,  Johannes Catharinus Mulkens ,  Alexander Straaijer ,  Bob Streefkerk

IPC分类号： G03F7/20 ,  G03F9/00 ,  G03B27/52

CPC分类号： G03F7/70866 ,  G03F7/70341 ,  G03F7/707 ,  G03F7/70716 ,  G03F7/70833 ,  G03F7/7085 ,  G03F7/70916 ,  G03F9/7088

摘要： In a lithographic projection apparatus, there is provided a liquid supply system comprising a container at least partly defining a space between the projection system and the substrate, the container having a selectively openable and closeable aperture therein, and a closure configured to selectively close and open the aperture. In an embodiment, the shutter may comprise a channel in a surface of the shutter facing the aperture and/or the shutter may be displaced from the liquid supply system when connected to the liquid supply system. Further, in a lithographic apparatus, there is provided a liquid supply system configured to provide a liquid, through which the beam is to be projected, in a space between a projection system and a substrate and a controller configured to control application to the projection system of a force related to a weight transfer attributable to a member of the liquid supply system.

摘要翻译： 在光刻投影设备中，提供了一种液体供应系统，其包括至少部分地限定投影系统和基板之间的空间的容器，该容器在其中具有可选择的可开启和关闭的孔，以及关闭构造成选择性地关闭和打开 光圈。 在一个实施例中，快门可以包括位于快门面向孔的表面中的通道和/或当连接到液体供应系统时活门可以从液体供应系统移位。 此外，在光刻设备中，提供了一种液体供应系统，其配置为在投影系统和基板之间的空间中提供待投射的光束的液体，以及被配置为控制对投影系统的应用的控制器 与由液体供给系统的构件产生的重量传递有关的力。

公开(公告)号：US20060186057A1

公开(公告)日：2006-08-24

申请号：US11062764

申请日：2005-02-22

申请人： Martinus Verhagen ,  Roelof De Graaf ,  Johannes Henricus Jacobs ,  Hans Jansen ,  Marco Stavenga ,  Jacobus Johannus Leonardus Verspay

发明人： Martinus Verhagen ,  Roelof De Graaf ,  Johannes Henricus Jacobs ,  Hans Jansen ,  Marco Stavenga ,  Jacobus Johannus Leonardus Verspay

IPC分类号： B01D37/00

CPC分类号： B01D37/04 ,  Y10S210/90

摘要： A method for filtering a fluid to obtain a fluid having a known purity is described. The fluid is filtered with a filtration system, and upstream of a final filtration stage of the filtration system, a purity of the fluid is measured. A purity of the fluid filtered by the filtration system is determined by correcting the measured purity with a filtration behavior of the final filtration stage. In an embodiment, the fluid comprises an ultra pure water for use as an immersion liquid in a lithographic apparatus.

摘要翻译： 描述了用于过滤流体以获得具有已知纯度的流体的方法。 流体用过滤系统过滤，并且在过滤系统的最终过滤阶段的上游，测量流体的纯度。 通过过滤系统过滤的流体的纯度通过用最终过滤阶段的过滤行为校正测量的纯度来确定。 在一个实施例中，流体包括用作光刻设备中的浸没液体的超纯水。