公开(公告)号：US08869879B2

公开(公告)日：2014-10-28

申请号：US12375829

申请日：2007-02-28

Applicant: Toshinari Nakanishi ,  Kazumasa Aso ,  Kensuke Iuchi ,  Kinpei Horiuchi ,  Masaru Nakaiwa

Inventor： Toshinari Nakanishi ,  Kazumasa Aso ,  Kensuke Iuchi ,  Kinpei Horiuchi ,  Masaru Nakaiwa

IPC: F28D5/02 ,  B21D53/02 ,  B01D3/32 ,  F28D3/02 ,  F28F13/00 ,  F28D7/16 ,  B01D3/28

CPC classification number: F28D7/16 ,  B01D3/28 ,  F28D3/02 ,  F28F13/003 ,  F28F2280/02 ,  Y10T29/49377 ,  Y10T29/49396

Abstract: An inside regular filler layer is disposed inside a pipe where heat is exchanged between an inside and an outside of a pipe wall so as to abut an inner peripheral surface of the pipe, and an outside regular filler layer is disposed outside the pipe so as to surround the pipe and closely contact an outer peripheral surface of the pipe. The outer peripheral surface of the pipe is subjected to close contact-promoting processing in order to enhance close contacting feature between the outer peripheral surface and the outside regular filler layer. The pipe/filler unit is used for the distillation section of an internal heat exchanging type distillation column.

Abstract translation: 内部正常填充层设置在管道内部，在管道内部和外部之间交换热量以便邻接管道的内周表面，并且将外部常规填充层设置在管道外部，以便 围绕管道并紧密接触管道的外周表面。 对管的外周面进行紧密的接触促进处理，以增强外周表面和外部正常填充层之间的紧密接触特征。 管/填料单元用于内部热交换型蒸馏塔的蒸馏段。

公开(公告)号：US5240613A

公开(公告)日：1993-08-31

申请号：US926816

申请日：1992-08-07

Applicant: Masatoshi Tsuchitani ,  Sakae Naito ,  Ryoichi Nakajima ,  Kensuke Iuchi ,  Shintaro Hasebe

Inventor： Masatoshi Tsuchitani ,  Sakae Naito ,  Ryoichi Nakajima ,  Kensuke Iuchi ,  Shintaro Hasebe

IPC: B01D41/04

CPC classification number: B01D41/04 ,  B01D2201/085

Abstract: When preparing carbon artefacts from heavy oils of petroleum or coal origin, removal of undesirable components or recovery of desirable components from raw materials or intermediates is usually required so as to improve the quality of the final products. Such removal or recovery operation is conventionally done by filtration. In the past, regeneration of filters clogged with solid carbonaceous materials inevitably formed by the filtration operations is difficult and troublesome procedures. Herein disclosed is a simple and effective process for regenerating filters clogged with solid carboneceous materials, characterized by treating the filter medium in an aqueous solution of hydrogen peroxide with heating and then optionally conducting ultrasonic washing in water or a solvent. By this simple process, clogged filters can be regenerated completely to show the same filtration performance as new filters.

公开(公告)号：US20090260791A1

公开(公告)日：2009-10-22

申请号：US12375829

申请日：2007-02-28

Applicant: Toshinari Nakanishi ,  Kazumasa Aso ,  Kensuke Iuchi ,  Kinpei Horiuchi ,  Masaru Nakaiwa

Inventor： Toshinari Nakanishi ,  Kazumasa Aso ,  Kensuke Iuchi ,  Kinpei Horiuchi ,  Masaru Nakaiwa

IPC: F28F21/00 ,  B23P15/26

CPC classification number: F28D7/16 ,  B01D3/28 ,  F28D3/02 ,  F28F13/003 ,  F28F2280/02 ,  Y10T29/49377 ,  Y10T29/49396

Abstract: An inside regular filler layer is disposed inside a pipe where heat is exchanged between an inside and an outside of a pipe wall so as to abut an inner peripheral surface of the pipe, and an outside regular filler layer is disposed outside the pipe so as to surround the pipe and closely contact an outer peripheral surface of the pipe. The outer peripheral surface of the pipe is subjected to close contact-promoting processing in order to enhance close contacting feature between the outer peripheral surface and the outside regular filler layer. The pipe/filler unit is used for the distillation section of an internal heat exchanging type distillation column.

Abstract translation: 内部正常填充层设置在管道内部，在管道内部和外部之间交换热量以便邻接管道的内周表面，并且将外部常规填充层设置在管道外部，以便 围绕管道并紧密接触管道的外周表面。 对管的外周面进行紧密的接触促进处理，以增强外周表面和外部正常填充层之间的紧密接触特征。 管/填料单元用于内部热交换型蒸馏塔的蒸馏段。

公开(公告)号：US08030419B2

公开(公告)日：2011-10-04

申请号：US12519371

申请日：2007-12-20

Applicant: Takanori Yamagishi ,  Ichiro Kato ,  Satoshi Yamaguchi ,  Kouzo Osaki ,  Yasuo Shibata ,  Isao Magara ,  Hideki Omori ,  Kensuke Iuchi

Inventor： Takanori Yamagishi ,  Ichiro Kato ,  Satoshi Yamaguchi ,  Kouzo Osaki ,  Yasuo Shibata ,  Isao Magara ,  Hideki Omori ,  Kensuke Iuchi

IPC: C08F2/06

CPC classification number: C08F2/00 ,  C08F2/01 ,  C08F224/00 ,  G03F7/0046 ,  G03F7/0382 ,  G03F7/0397 ,  G03F7/11 ,  G03F7/2041

Abstract: To provide a method for producing a polymer for semiconductor lithography which can attain high uniformity in the polymer from lot to lot. The method for producing a polymer for semiconductor lithography includes the step (P) of heating a polymerizable monomer and a polymerization initiator in a solvent, to thereby polymerize the monomer, the step (P) having the step of controlling a polymerization pressure by regulating a liquid level in a container (WO) which is disposed between a polymerization tank and the atmospheric air and which provides liquid sealing.

Abstract translation: 提供一种用于半导体光刻的聚合物的制造方法，其可以从多个到多个聚合物中获得高均匀性。 制造半导体光刻用聚合物的方法包括在溶剂中加热聚合性单体和聚合引发剂的步骤（P），从而使单体聚合，通过调节聚合压力的步骤（P） 容器（WO）中的液面位于聚合槽和大气之间并提供液体密封。

公开(公告)号：US20100048848A1

公开(公告)日：2010-02-25

申请号：US12519371

申请日：2007-12-20

Applicant: Takanori Yamagishi ,  Ichiro Kato ,  Satoshi Yamaguchi ,  Kouzo Osaki ,  Yasuo Shibata ,  Isao Magara ,  Hideki Omori ,  Kensuke Iuchi

Inventor： Takanori Yamagishi ,  Ichiro Kato ,  Satoshi Yamaguchi ,  Kouzo Osaki ,  Yasuo Shibata ,  Isao Magara ,  Hideki Omori ,  Kensuke Iuchi

IPC: C08F224/00

CPC classification number: C08F2/00 ,  C08F2/01 ,  C08F224/00 ,  G03F7/0046 ,  G03F7/0382 ,  G03F7/0397 ,  G03F7/11 ,  G03F7/2041

Abstract: To provide a method for producing a polymer for semiconductor lithography which can attain high uniformity in the polymer from lot to lot.The method for producing a polymer for semiconductor lithography includes the step (P) of heating a polymerizable monomer and a polymerization initiator in a solvent, to thereby polymerize the monomer, the step (P) having the step of controlling a polymerization pressure by regulating a liquid level in a container (WO) which is disposed between a polymerization tank and the atmospheric air and which provides liquid sealing.

Abstract translation: 提供一种用于半导体光刻的聚合物的制造方法，其可以从多个到多个聚合物中获得高均匀性。 制造半导体光刻用聚合物的方法包括在溶剂中加热聚合性单体和聚合引发剂的步骤（P），从而使单体聚合，通过调节聚合压力的步骤（P） 容器（WO）中的液面位于聚合槽和大气之间并提供液体密封。