公开(公告)号：US4983495A

公开(公告)日：1991-01-08

申请号：US456624

申请日：1989-12-29

申请人： Yoshitaka Tsutsumi ,  Toru Seita ,  Kousaburou Matsumura ,  Kyoko Nagaoka ,  Toshimitsu Yanagihara

发明人： Yoshitaka Tsutsumi ,  Toru Seita ,  Kousaburou Matsumura ,  Kyoko Nagaoka ,  Toshimitsu Yanagihara

IPC分类号： G03F7/039

CPC分类号： G03F7/039

摘要： Positive resist patterns prepared by using a derivative of polyacrylic acid esters containing halogen expressed by the following general formula for the resist material; ##STR1## (where A is a structural unit which is derived from monomers having a copolymerable double bond, and X is either a halogen atom or a methyl group. m is a positive integer, n is 0 or a positive integer, n/m is 0 to 2 and m+n are 20 to 20,000. Y.sub.1 to Y.sub.5 are a fluorine or hydrogen atom and at least one of them is a fluorine atom).

公开(公告)号：US4822721A

公开(公告)日：1989-04-18

申请号：US123799

申请日：1987-11-23

申请人： Yoshitaka Tsutsumi ,  Toru Seita ,  Hideo Shuyama ,  Kousaburou Matsumura ,  Kyoko Nakazawa

发明人： Yoshitaka Tsutsumi ,  Toru Seita ,  Hideo Shuyama ,  Kousaburou Matsumura ,  Kyoko Nakazawa

IPC分类号： C08F20/22 ,  G03F7/039 ,  G03C5/00

CPC分类号： G03F7/039 ,  C08F20/22

摘要： Halogen-containing polyacrylate derivatives having the formula: ##STR1## wherein A is a structural unit derived from a copolymeriazable monomer having a double bond; R is ##STR2## wherein each of R.sub.1 and R.sub.2 is a hydrogen atom or a fluorinated methyl group, provided R.sub.1 and R.sub.2 are not hydrogen atoms at the same time, and R.sub.3 is a hydrogen atom or a lower alkyl group; X is a halogen atom or a methyl group; and m is a positive integer, n is 0 or a positive integer, and n/m from 0 to 2, preferably from 0 to 1 are disclosed.Also disclosed are methods for forming a resist pattern by using the halogen-containing polyacrylate derivatives as a resist material.

公开(公告)号：US4752635A

公开(公告)日：1988-06-21

申请号：US946055

申请日：1986-12-24

申请人： Yoshitaka Tsutsumi ,  Toru Seita ,  Hideo Shuyama ,  Kousaburou Matsumura ,  Kyoko Nakazawa

发明人： Yoshitaka Tsutsumi ,  Toru Seita ,  Hideo Shuyama ,  Kousaburou Matsumura ,  Kyoko Nakazawa

IPC分类号： C08F20/22 ,  G03F7/039 ,  C08L27/12 ,  C08F18/00 ,  C08F18/20

CPC分类号： G03F7/039 ,  C08F20/22

摘要： A halogen-containing polyacrylate derivative having the formula: ##STR1## wherein A is a structural unit derived from a copolymerizable monomer having a double bond; R is ##STR2## wherein each of R.sub.1 and R.sub.2 is a hydrogen atom or a fluorinated methyl group, provided R.sub.1 and R.sub.2 are not hydrogen atoms at the same time, and R.sub.3 is a hydrogen atom or a lower alkyl group; X is a halogen atom or a methyl group; and m is a positive integer, n is 0 or a positive integer, and n/m is from 0 to 2, preferably from 0 to 1.

摘要翻译： 具有下式的含卤素聚丙烯酸酯衍生物：其中A是衍生自具有双键的可共聚单体的结构单元; R为，其中R1和R2各自为氢原子或氟化甲基，其中R1和R2不同时为氢原子，R3为氢原子或低级烷基; X是卤素原子或甲基; m为正整数，n为0或正整数，n / m为0〜2，优选为0〜1。