摘要:
Low- or atmospheric pressure RF plasma-enhanced thin film deposition methods are provided for the deposition of hydrophobic fluorinated thin films onto various substrates. The methods include at least two steps. In the first step, RF plasma-mediated deposition is used to deposit a fluorinated film onto a substrate surface. In a second step, plasma-generated active sites on the fluorinated film are quenched by reacting them with stable fluorinated gas-phase molecules in situ, in the absence of plasma, to provide a hydrophobic fluorinated thin film having a very low oxygen content. In some instances the hydrophobic fluorinated thin films have an atomic oxygen concentration of no more than about 3%.
摘要:
Bactericidal substrates and methods of functionalizing the surface of substrates with quaternary ammonium and quaternary phosphonium groups using non-equilibrium RF plasmas are provided. The methods include the step of treating the surface of a substrate with a plasma to create surface active sites. Some methods include the step of reacting the surface active sites with linker molecules, which are then reacted with quaternary ammonium precursor molecules to provide a substrate surface functionalized with quaternary ammonium precursor groups. Other methods react the surface active sites with polymer precursor molecules under plasma conditions to form a covalently-bound polymer layer having reactive sites. The polymer reactive sites are reacted with quaternary phosphonium precursor molecules to provide a substrate surface functionalized with quaternary phosphonium groups. Also provided are bactericidal substrates having immobilized, covalently-bound quaternary ammonium or quaternary phosphonium groups.
摘要:
Low- or atmospheric pressure RF plasma-enhanced thin film deposition methods are provided for the deposition of hydrophobic fluorinated thin films onto various substrates. The methods include at least two steps. In the first step, RF plasma-mediated deposition is used to deposit a fluorinated film onto a substrate surface. In a second step, plasma-generated active sites on the fluorinated film are quenched by reacting them with stable fluorinated gas-phase molecules in situ, in the absence of plasma, to provide a hydrophobic fluorinated thin film having a very low oxygen content. In some instances the hydrophobic fluorinated thin films have an atomic oxygen concentration of no more than about 3%.
摘要:
Methods for producing plasma-treated, functionalized carbon-containing surfaces are provided. The methods include the steps of subjecting a carbon-containing substrate to a plasma to create surface active sites on the surface of the substrate and reacting the surface active sites with stable spacer molecules in the absence of plasma. Biomolecules may be immobilized on the resulting functionalized surfaces. The methods may be used to treat a variety of carbon-containing substrates, including polymeric surfaces, diamond-like carbon films and carbon nanotubes and nanoparticles.
摘要:
Bactericidal substrates and methods of functionalizing the surface of substrates with quaternary ammonium and quaternary phosphonium groups using non-equilibrium RF plasmas are provided. The methods include the step of treating the surface of a substrate with a plasma to create surface active sites. Some methods include the step of reacting the surface active sites with linker molecules, which are then reacted with quaternary ammonium precursor molecules to provide a substrate surface functionalized with quaternary ammonium precursor groups. Other methods react the surface active sites with polymer precursor molecules under plasma conditions to form a covalently-bound polymer layer having reactive sites. The polymer reactive sites are reacted with quaternary phosphonium precursor molecules to provide a substrate surface functionalized with quaternary phosphonium groups. Also provided are bactericidal substrates having immobilized, covalently-bound quaternary ammonium or quaternary phosphonium groups.