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公开(公告)号:US20100120176A1
公开(公告)日:2010-05-13
申请号:US12525999
申请日:2008-02-21
IPC分类号: H01L21/00
CPC分类号: H01L43/12 , H01L23/552 , H01L24/32 , H01L24/45 , H01L24/48 , H01L24/73 , H01L27/228 , H01L2224/05553 , H01L2224/32225 , H01L2224/32245 , H01L2224/45144 , H01L2224/48091 , H01L2224/48227 , H01L2224/48247 , H01L2224/73265 , H01L2924/00014 , H01L2924/01006 , H01L2924/01021 , H01L2924/01029 , H01L2924/01033 , H01L2924/01046 , H01L2924/01078 , H01L2924/01079 , H01L2924/01082 , H01L2924/014 , H01L2924/10253 , H01L2924/15311 , H01L2924/181 , H01L2924/3025 , H01L2924/00 , H01L2924/00012 , H01L2224/05599
摘要: A method for manufacturing a magnetic memory chip device is provided with a step of writing information on a plurality of magnetic memory chips formed on a silicon wafer; a step of adhering a high permeability plate, which is composed of a material having permeability higher than that of silicon and has a thickness of 50 μm or more, on the rear surface of a silicon wafer after writing the information; and a step of dicing the silicon wafer into magnetic memory chips after adhering the high permeability plate.
摘要翻译: 一种用于制造磁存储器芯片器件的方法,具有在形成于硅晶片上的多个磁存储器芯片上写入信息的步骤; 在写入信息之后,在硅晶片的后表面上粘附由具有高于硅的磁导率并且具有50μm以上的厚度的材料构成的高透光性板的步骤; 以及在粘附高磁导率板之后将硅晶片切割成磁存储芯片的步骤。