公开(公告)号：US06274058B1

公开(公告)日：2001-08-14

申请号：US09347236

申请日：1999-07-02

Applicant: Ravi Rajagopalan ,  Patricia M. Liu ,  Pravin K. Narwankar ,  Huyen Tran ,  Padmanabhan Krishnaraj ,  Alan Ablao ,  Tim Casper

Inventor： Ravi Rajagopalan ,  Patricia M. Liu ,  Pravin K. Narwankar ,  Huyen Tran ,  Padmanabhan Krishnaraj ,  Alan Ablao ,  Tim Casper

IPC: H05H100

CPC classification number: H01J37/32862 ,  C23C16/4405 ,  C23C16/511 ,  C23C16/52 ,  H01J9/38 ,  H01J37/32192 ,  H01J37/32357 ,  Y10S438/905

Abstract: A processing chamber cleaning method is described which utilizes microwave energy to remotely generate a reactive species to be used alone or in combination with an inert gas to remove deposits from a processing chamber. The reactive species can remove deposits from a first processing region at a first pressure and then remove deposits from a second processing region at a second pressure. Also described is a cleaning process utilizing remotely generated reactive species in a single processing region at two different pressures. Additionally, different ratios of reactive gas and inert gas may be utilized to improve the uniformity of the cleaning process, increase the cleaning rate, reduce recombination of reactive species and increase the residence time of reactive species provided to the processing chamber.

Abstract translation: 描述了一种处理室清​​洁方法，其利用微波能量远程产生要单独使用或与惰性气体组合使用的反应物质以从处理室去除沉积物。 反应性物质可以在第一压力下从第一处理区域去除沉积物，然后在第二压力下从第二处理区域去除沉积物。 还描述了在两个不同压力下在单个处理区域中利用远程产生的活性物质的清洁方法。 此外，可以使用不同比例的反应气体和惰性气体来改善清洁过程的均匀性，提高清洗速率，减少活性物质的复合并增加提供给处理室的反应物种的停留时间。