公开(公告)号：US07113262B2

公开(公告)日：2006-09-26

申请号：US10872774

申请日：2004-06-22

申请人： Tjarko Adriaan Rudolf Van Empel ,  Aschwin Lodewijk Hendricus Johannes Van Meer ,  Koen Jacobus Johannes Maria Zaal ,  Ton Aantjes

发明人： Tjarko Adriaan Rudolf Van Empel ,  Aschwin Lodewijk Hendricus Johannes Van Meer ,  Koen Jacobus Johannes Maria Zaal ,  Ton Aantjes

IPC分类号： G03B27/58 ,  G03B27/42

CPC分类号： G03F7/707

摘要： A lithographic projection apparatus is disclosed. The apparatus includes a radiation system for providing a beam of radiation and a substrate holder for supporting a substrate to be placed in a beam path of the beam of radiation. The substrate holder includes a plurality of first protrusions, the distal ends thereof defining a first contact surface for contacting the substrate, and a plurality of second protrusions, the distal ends thereof defining a second contact surface for supporting the substrate. The second protrusions are arranged for preventing sticking of the substrate to the first contact surface during release of a clamping pressure so that (1) the substrate contacts the first and second contact surfaces when the substrate is clamped against the substrate holder, and (2) the substrate is supported by the second contact surface and distanced from the first contact surface when the substrate is not clamped.

摘要翻译： 公开了一种光刻投影装置。 该装置包括用于提供辐射束的辐射系统和用于支撑放置在辐射束的光束路径中的衬底的衬底保持器。 衬底保持器包括多个第一突起，其远端限定用于接触衬底的第一接触表面和多个第二突起，其远端限定用于支撑衬底的第二接触表面。 第二突起被布置成用于在释放夹持压力期间防止基板粘附到第一接触表面，使得（1）当基板被夹持在基板保持器上时，基板接触第一和第二接触表面，以及（2） 当基板未被夹紧时，基板由第二接触表面支撑并与第一接触表面分开。

公开(公告)号：US20050024620A1

公开(公告)日：2005-02-03

申请号：US10872774

申请日：2004-06-22

申请人： Tjarko Van Empel ,  Aschwin Lodewijk Van Meer ,  Koen Jacobus Zaal ,  Ton Aantjes

发明人： Tjarko Van Empel ,  Aschwin Lodewijk Van Meer ,  Koen Jacobus Zaal ,  Ton Aantjes

IPC分类号： G03F7/20 ,  H01L21/027 ,  H01L21/683 ,  G03B27/58

CPC分类号： G03F7/707

摘要： A lithographic projection apparatus is disclosed. The apparatus includes a radiation system for providing a beam of radiation and a substrate holder for supporting a substrate to be placed in a beam path of the beam of radiation. The substrate holder includes a plurality of first protrusions, the distal ends thereof defining a first contact surface for contacting the substrate, and a plurality of second protrusions, the distal ends thereof defining a second contact surface for supporting the substrate. The second protrusions are arranged for preventing sticking of the substrate to the first contact surface during release of a clamping pressure so that (1) the substrate contacts the first and second contact surfaces when the substrate is clamped against the substrate holder, and (2) the substrate is supported by the second contact surface and distanced from the first contact surface when the substrate is not clamped.

摘要翻译： 公开了一种光刻投影装置。 该装置包括用于提供辐射束的辐射系统和用于支撑放置在辐射束的光束路径中的衬底的衬底保持器。 衬底保持器包括多个第一突起，其远端限定用于接触衬底的第一接触表面和多个第二突起，其远端限定用于支撑衬底的第二接触表面。 第二突起被布置成用于在释放夹持压力期间防止基板粘附到第一接触表面，使得（1）当基板被夹持在基板保持器上时，基板接触第一和第二接触表面，以及（2） 当基板未被夹紧时，基板由第二接触表面支撑并与第一接触表面分开。