公开(公告)号：US20050024620A1

公开(公告)日：2005-02-03

申请号：US10872774

申请日：2004-06-22

申请人： Tjarko Van Empel ,  Aschwin Lodewijk Van Meer ,  Koen Jacobus Zaal ,  Ton Aantjes

发明人： Tjarko Van Empel ,  Aschwin Lodewijk Van Meer ,  Koen Jacobus Zaal ,  Ton Aantjes

IPC分类号： G03F7/20 ,  H01L21/027 ,  H01L21/683 ,  G03B27/58

CPC分类号： G03F7/707

摘要： A lithographic projection apparatus is disclosed. The apparatus includes a radiation system for providing a beam of radiation and a substrate holder for supporting a substrate to be placed in a beam path of the beam of radiation. The substrate holder includes a plurality of first protrusions, the distal ends thereof defining a first contact surface for contacting the substrate, and a plurality of second protrusions, the distal ends thereof defining a second contact surface for supporting the substrate. The second protrusions are arranged for preventing sticking of the substrate to the first contact surface during release of a clamping pressure so that (1) the substrate contacts the first and second contact surfaces when the substrate is clamped against the substrate holder, and (2) the substrate is supported by the second contact surface and distanced from the first contact surface when the substrate is not clamped.

摘要翻译： 公开了一种光刻投影装置。 该装置包括用于提供辐射束的辐射系统和用于支撑放置在辐射束的光束路径中的衬底的衬底保持器。 衬底保持器包括多个第一突起，其远端限定用于接触衬底的第一接触表面和多个第二突起，其远端限定用于支撑衬底的第二接触表面。 第二突起被布置成用于在释放夹持压力期间防止基板粘附到第一接触表面，使得（1）当基板被夹持在基板保持器上时，基板接触第一和第二接触表面，以及（2） 当基板未被夹紧时，基板由第二接触表面支撑并与第一接触表面分开。

公开(公告)号：US20050248746A1

公开(公告)日：2005-11-10

申请号：US10837914

申请日：2004-05-04

申请人： Koen Jacobus Zaal ,  Aschwin Lodewijk Van Meer ,  Joost Ottens

发明人： Koen Jacobus Zaal ,  Aschwin Lodewijk Van Meer ,  Joost Ottens

IPC分类号： H01L21/683 ,  G03B27/62 ,  G03F7/20 ,  H01L21/027 ,  H01L21/68

CPC分类号： G03F7/707

摘要： A lithographic apparatus having an illumination system for providing a projection beam of radiation; an article support member for supporting an article to be placed in a beam path of the projection beam of radiation on the article support; and a clamp for providing a clamping pressure for clamping the article against the article support during projection. The article support member includes a section that is trimmed for locally adjusting a clamping pressure.

摘要翻译： 一种具有用于提供投影射线束的照明系统的光刻设备; 物品支撑构件，用于支撑将物品放置在所述物品支撑件上的所述投影射束的光束路径中; 以及用于在投影期间提供用于将物品夹紧在物品支撑件上的夹紧压力的夹具。 物品支撑构件包括用于局部调整夹紧压力的部分。

公开(公告)号：US20060033892A1

公开(公告)日：2006-02-16

申请号：US10917535

申请日：2004-08-13

申请人： Theodorus Cadee ,  Joost Ottens ,  Jeroen Johannes Mertens ,  Frederick De Jong ,  Koen Goorman ,  Boris Menchtchikov ,  Marco Stavenga ,  Martin Smeets ,  Aschwin Lodewijk Van Meer ,  Bart Schoondermark ,  Patricius Tinnemans ,  Stoyan Nihtianov

发明人： Theodorus Cadee ,  Joost Ottens ,  Jeroen Johannes Mertens ,  Frederick De Jong ,  Koen Goorman ,  Boris Menchtchikov ,  Marco Stavenga ,  Martin Smeets ,  Aschwin Lodewijk Van Meer ,  Bart Schoondermark ,  Patricius Tinnemans ,  Stoyan Nihtianov

IPC分类号： G03B27/52

CPC分类号： G03F7/70808 ,  G03F7/70341 ,  G03F7/70841 ,  G03F7/70875

摘要： A lithographic apparatus is disclosed. The apparatus includes an illumination system configured to condition a radiation beam, and a support constructed to support a patterning device. The patterning device is capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam. The apparatus also includes a substrate table constructed to hold a substrate, a projection system configured to project the patterned radiation beam onto a target portion of the substrate, a liquid supply system configured to at least partly fill a space between the projection system and the substrate with liquid, a seal member arranged to substantially contain the liquid within the space, and elements to control and/or compensate for evaporation of immersion liquid from the substrate.

摘要翻译： 公开了一种光刻设备。 该装置包括配置成调节辐射束的照明系统和构造成支撑图案形成装置的支撑件。 图案形成装置能够在其横截面中赋予辐射束图案以形成图案化的辐射束。 所述设备还包括被构造成保持基板的基板台，配置成将图案化的辐射束投影到基板的目标部分上的投影系统，配置成至少部分地填充投影系统和基板之间的空间的液体供应系统 具有液体，被布置成基本上容纳空间内的液体的密封构件以及用于控制和/或补偿浸没液体从基底蒸发的元件。