公开(公告)号：US20070076218A1

公开(公告)日：2007-04-05

申请号：US11242130

申请日：2005-10-04

申请人： Tjarko Van Empel ,  Marcel Beems ,  Emiel Eussen

发明人： Tjarko Van Empel ,  Marcel Beems ,  Emiel Eussen

IPC分类号： G01B11/02

CPC分类号： G03F7/70891

摘要： A lithographic apparatus includes a position measurement system to determine along a measurement path a position of a first part of the lithographic apparatus with respect to a position of a second part of the lithographic apparatus. The position determination system comprises a plurality of temperature sensors to measure a temperature of a medium along the measurement path. The position measurement system corrects the determined position making use of the temperature as measured by the temperature sensors.

摘要翻译： 光刻设备包括位置测量系统，用于沿着测量路径确定光刻设备的第一部分相对于光刻设备的第二部分的位置的位置。 位置确定系统包括多个温度传感器，用于测量沿着测量路径的介质的温度。 位置测量系统使用由温度传感器测量的温度校正确定的位置。

公开(公告)号：US20070071889A1

公开(公告)日：2007-03-29

申请号：US11238156

申请日：2005-09-29

申请人： Tjarko Van Empel ,  Ronald Van Der Ham ,  Niek Roset

发明人： Tjarko Van Empel ,  Ronald Van Der Ham ,  Niek Roset

IPC分类号： B05D7/22 ,  C23C16/00

CPC分类号： G03F7/70933 ,  G03F7/70775 ,  G03F7/70883

摘要： A lithographic apparatus is disclosed that includes a first gas shower configured to supply a first gas flow to an interior space of the apparatus, and a second gas shower configured to supply a second gas flow to the interior space of the apparatus, the gas showers configured to direct the first gas flow and the second gas flow at least partly towards each other. Also, a method for conditioning an interior space of a device manufacturing apparatus is provided that includes supplying a first conditioned gas flow and a second conditioned gas flow to the interior space, such that the first conditioned gas flow and the second conditioned gas flow are at least partly directed to each other.

摘要翻译： 公开了一种光刻设备，其包括构造成将第一气流提供给设备的内部空间的第一气体淋浴器和被配置为向设备的内部空间供应第二气流的第二气体淋浴器， 以引导第一气流和第二气流至少部分地朝向彼此。 此外，还提供了一种用于调节装置制造装置的内部空间的方法，其包括向所述内部空间供应第一调节气体流和第二调节气体流，使得所述第一调节气体流和所述第二调节气体流处于 最少部分指向彼此。

公开(公告)号：US20060072089A1

公开(公告)日：2006-04-06

申请号：US10957755

申请日：2004-10-05

申请人： Emiel Eussen ,  Tjarko Van-Empel ,  Wouter Pril

发明人： Emiel Eussen ,  Tjarko Van-Empel ,  Wouter Pril

IPC分类号： G03B27/42

CPC分类号： G03F7/70775 ,  G03F7/70858

摘要： In a lithographic apparatus, a measurement of the position of an object in an ambient space by an object position measuring system which is influenced by pressure variations in the ambient space, is corrected by an accurate measurement of the pressure in the ambient space. A reference pressure volume may be provided, having a fluid connection with predetermined flow characteristics to the ambient space. A pressure difference is measured between a pressure in the reference pressure volume and an ambient pressure in the ambient space. The absolute pressure in the reference pressure volume is added to the pressure difference to determine a change of pressure in the ambient space. Alternatively, the pressure difference is integrated over time for determining a change of pressure in the reference pressure volume, and this change of pressure in the reference pressure volume is added to the pressure difference to determine a change of pressure in the ambient space. The fluid connection may also be a valve which can be opened and closed.

摘要翻译： 在光刻设备中，通过对环境空间中的压力变化影响的物体位置测量系统对环境空间中的物体的位置的测量通过对环境空间中的压力的​​精确测量来校正。 可以提供参考压力体积，其具有与环境空间的预定流动特性的流体连接。 在参考压力体积中的压力和环境空间中的环境压力之间测量压力差。 将参考压力体积中的绝对压力加到压差上以确定环境空间中的压力变化。 或者，压力差随时间积分以确定参考压力体积中的压力变化，并且将参考压力体积中的压力变化加到压差上以确定环境空间中的压力变化。 流体连接也可以是可以打开和关闭的阀。

公开(公告)号：US20070146656A1

公开(公告)日：2007-06-28

申请号：US11314156

申请日：2005-12-22

申请人： Tjarko Van Empel

发明人： Tjarko Van Empel

IPC分类号： G03B27/52

CPC分类号： G03F7/709 ,  G03F7/70058 ,  G03F7/70858

摘要： A lithographic apparatus is disclosed that has a movable article support configured to hold and move an article, a radiation control system configured to control a beam of radiation to be targeted onto the article, the article support, or both, the article to be moved relatively to the radiation control system by the movable article support for measurement, exposure, or both purposes, and a pressure shield that is mechanically uncoupled from the radiation control system to shield against pressure waves induced by the article support so as to help prevent displacement of the radiation control system caused by the pressure waves.

摘要翻译： 公开了一种光刻设备，其具有被配置为保持和移动物品的可移动物品支撑件，辐射控制系统，被配置成将待辐射束控制在物品上，物品支撑件或两者上，以相对于待移动的物品 通过用于测量，曝光或两者目的的可移动物品支撑件到辐射控制系统，以及与辐射控制系统机械地分离以防止由物品支撑件引起的压力波的压力屏蔽，以帮助防止 辐射控制系统由压力波引起。

公开(公告)号：US20060114436A1

公开(公告)日：2006-06-01

申请号：US10998179

申请日：2004-11-29

申请人： Rene Oesterholt ,  Ralph Brinkhof ,  Tjarko Van Empel ,  Leon Levasier ,  Joost Ottens ,  Koen Jacobus Zaal ,  Koenraad Stephan Salden

发明人： Rene Oesterholt ,  Ralph Brinkhof ,  Tjarko Van Empel ,  Leon Levasier ,  Joost Ottens ,  Koen Jacobus Zaal ,  Koenraad Stephan Salden

IPC分类号： G03B27/52

CPC分类号： G03F7/70783 ,  G03F7/707

摘要： The invention relates to a lithographic system that includes an illumination system for providing a projection beam of radiation, a mask table for supporting a mask, the mask serving to impart the projection beam with a pattern in its cross-section, a substrate table for holding a substrate, and a projection system for projecting the patterned beam onto a target portion of the substrate. The system also comprises a processor arranged to calculate overlay corrections using a reference height map representing a surface of the substrate table or the mask table. The invention allows feed forward correction of non-flatness induced wafer grid distortion during alignment and during exposure, thereby reducing overlay errors caused by differences in flatness characteristics. It provides an indirect qualification method for overlay accuracy related to exposure chuck flatness based on height map information.

摘要翻译： 本发明涉及一种光刻系统，其包括用于提供投影辐射束的照明系统，用于支撑掩模的掩模台，用于使投影光束在其横截面上具有图案的掩模，用于保持 基板和用于将图案化的光束投影到基板的目标部分上的投影系统。 该系统还包括处理器，其被布置为使用表示衬底台或掩模台的表面的参考高度图计算覆盖校正。 本发明允许在对准和曝光期间非平坦度引起的晶片格栅失真的前馈校正，从而减少由平坦度特性的差异引起的重叠误差。 它提供了基于高度图信息的与曝光卡盘平坦度相关的覆盖精度的间接鉴定方法。

公开(公告)号：US06232615B1

公开(公告)日：2001-05-15

申请号：US09280064

申请日：1999-03-29

申请人： Tjarko Van Empel

发明人： Tjarko Van Empel

IPC分类号： G01N2186

CPC分类号： G03F7/707

摘要： A lithographic projection apparatus comprising: a radiation system (7) for supplying a projection beam (25) of radiation; a mask table (5) provided with a mask holder (27) for holding a mask (29); a substrate table (1) provided with a substrate holder (17) for holding a substrate (19); a projection system (3) for imaging an irradiated portion of the mask (29) onto a target portion (35) of the substrate (19), the substrate holder (17) comprising a plate (2) having a face (4) which is provided with a matrix arrangement of protrusions (6), each protrusion (6) having an extremity (6′) remote from the face (4) and being thus embodied that the said extremities (6′) all lie within a single substantially flat plane (6″) at a height H above the face (4), the substrate holder (17) further comprising a wall (8) which protrudes from the face (4), substantially encloses the matrix arrangement, and has a substantially uniform height h above the face (4), whereby h

摘要翻译： 一种光刻投影装置，包括：辐射系统（7），用于提供辐射的投影光束（25）;掩模台（5），设有用于保持掩模（29）的掩模支架（27）;基板台（1） ），设置有用于保持基板（19）的基板保持器（17）;用于将所述掩模（29）的照射部分成像到所述基板（19）的目标部分（35）上的投影系统（3） 保持器（17）包括具有面（4）的板（2），所述面（4）设置有突起（6）的矩阵布置，每个突起（6）具有远离所述面（4）的末端（6'），并且是 从而体现出所述末端（6'）都位于面（4）上方高度H处的单个基本上平坦的平面（6“）内，衬底保持器（17）还包括壁（8） 所述面（4）基本上包围所述矩阵布置，并且在所述面（4）上方具有基本均匀的高度h，由此h

公开(公告)号：US20050030512A1

公开(公告)日：2005-02-10

申请号：US10896367

申请日：2004-07-22

申请人： Koen Jacobus Maria Zaal ,  Tjarko Van Empel ,  Joost Ottens ,  Jan Hopman

发明人： Koen Jacobus Maria Zaal ,  Tjarko Van Empel ,  Joost Ottens ,  Jan Hopman

IPC分类号： H01L21/683 ,  G03F7/20 ,  H01L21/027 ,  G03B27/62

CPC分类号： G03F7/707 ,  G03F7/70708 ,  G03F7/70783

摘要： A lithographic projection apparatus is disclosed. The apparatus includes an illuminator for conditioning a beam of radiation, and an article holder. The article holder includes a plurality of protrusions arranged to provide a substantially flat plane of support for supporting an article to be placed in a beam path of the beam of radiation, and at least one clamping electrode for generating an electrostatic clamping force for clamping the article against the article holder. The clamping electrode includes an electric field changer for locally changing the electrostatic clamping force for leveling local height variations of the substrate.

摘要翻译： 公开了一种光刻投影装置。 该装置包括用于调节辐射束的照明器和物品保持器。 物品保持器包括多个突起，其被布置成提供基本平坦的支撑平面，用于支撑待放置在辐射束的光束路径中的物品;以及至少一个夹紧电极，用于产生用于夹紧物品的静电夹紧力 反对文章持有人。 夹持电极包括用于局部地改变静电夹持力的电场改变器，用于调平衬底的局部高度变化。

公开(公告)号：US20050024620A1

公开(公告)日：2005-02-03

申请号：US10872774

申请日：2004-06-22

申请人： Tjarko Van Empel ,  Aschwin Lodewijk Van Meer ,  Koen Jacobus Zaal ,  Ton Aantjes

发明人： Tjarko Van Empel ,  Aschwin Lodewijk Van Meer ,  Koen Jacobus Zaal ,  Ton Aantjes

IPC分类号： G03F7/20 ,  H01L21/027 ,  H01L21/683 ,  G03B27/58

CPC分类号： G03F7/707

摘要： A lithographic projection apparatus is disclosed. The apparatus includes a radiation system for providing a beam of radiation and a substrate holder for supporting a substrate to be placed in a beam path of the beam of radiation. The substrate holder includes a plurality of first protrusions, the distal ends thereof defining a first contact surface for contacting the substrate, and a plurality of second protrusions, the distal ends thereof defining a second contact surface for supporting the substrate. The second protrusions are arranged for preventing sticking of the substrate to the first contact surface during release of a clamping pressure so that (1) the substrate contacts the first and second contact surfaces when the substrate is clamped against the substrate holder, and (2) the substrate is supported by the second contact surface and distanced from the first contact surface when the substrate is not clamped.

摘要翻译： 公开了一种光刻投影装置。 该装置包括用于提供辐射束的辐射系统和用于支撑放置在辐射束的光束路径中的衬底的衬底保持器。 衬底保持器包括多个第一突起，其远端限定用于接触衬底的第一接触表面和多个第二突起，其远端限定用于支撑衬底的第二接触表面。 第二突起被布置成用于在释放夹持压力期间防止基板粘附到第一接触表面，使得（1）当基板被夹持在基板保持器上时，基板接触第一和第二接触表面，以及（2） 当基板未被夹紧时，基板由第二接触表面支撑并与第一接触表面分开。

公开(公告)号：US20070222906A1

公开(公告)日：2007-09-27

申请号：US11389493

申请日：2006-03-27

申请人： Ronald Ham ,  Tjarko Van Empel ,  Herman Vogel ,  Niek Roset

发明人： Ronald Ham ,  Tjarko Van Empel ,  Herman Vogel ,  Niek Roset

IPC分类号： G02F1/1335

CPC分类号： G03F7/70933 ,  G03F7/70775 ,  G03F7/70858 ,  G03F7/70866 ,  Y10T137/8593

摘要： An assembly including a conditioning system and an object movable into and/or out of an area to be conditioned is disclosed. The conditioning system has fluid outlet passages to supply conditioning fluid to the area to be conditioned and is configured to adjust outflow of the conditioning fluid from the fluid outlet passages depending on a position of the object.

摘要翻译： 公开了一种组件，其包括调节系统和可移动到待调节区域中和/或之外的物体。 调节系统具有流体出口通道，以将调节流体供应到待调节的区域，并且构造成根据物体的位置调节调节流体与流体出口通道的流出。

公开(公告)号：US20070139629A1

公开(公告)日：2007-06-21

申请号：US11312660

申请日：2005-12-21

申请人： Timotheus Sengers ,  Nicolaas Johannes Van Asten ,  Wilhelmus Box ,  Tjarko Van Empel ,  Leon Levasier ,  Erik Loopstra ,  Marcel Hubertus Muitjens ,  Luberthus Ouwehand ,  Leon Van Den Schoor ,  Marcel Beckers ,  Rob Jansen ,  Elke Van Loenhout

发明人： Timotheus Sengers ,  Nicolaas Johannes Van Asten ,  Wilhelmus Box ,  Tjarko Van Empel ,  Leon Levasier ,  Erik Loopstra ,  Marcel Hubertus Muitjens ,  Luberthus Ouwehand ,  Leon Van Den Schoor ,  Marcel Beckers ,  Rob Jansen ,  Elke Van Loenhout

IPC分类号： G03B27/42

CPC分类号： G03F7/70883 ,  G03F7/7075 ,  G03F7/70858 ,  G03F9/7011 ,  G03F9/7034

摘要： A lithographic apparatus is disclosed. The apparatus includes a substrate table constructed to hold a substrate. The substrate table is moveable to transfer the substrate between a substrate measuring position and a substrate processing position. The apparatus also includes a measuring system configured to measure at least one aspect or characteristic of the substrate when the substrate table holds the substrate in the measuring position. The measuring system is configured to direct at least one measuring beam and/or field towards a surface of the substrate. A projection system is configured to project a patterned radiation beam onto a target portion of the substrate when the substrate table holds the substrate in the substrate processing position, and a conditioning system is configured to supply a conditioning fluid to at least part of a path of the measuring beam and/or field of the measuring system to condition the part of the path.

摘要翻译： 公开了一种光刻设备。 该装置包括构造成保持基板的基板台。 衬底台可移动以在衬底测量位置和衬底处理位置之间传送衬底。 该装置还包括测量系统，其被配置为当衬底台将衬底保持在测量位置时，测量衬底的至少一个方面或特征。 测量系统被配置为将至少一个测量光束和/或场朝向衬底的表面引导。 投影系统被配置为当衬底台将衬底保持在衬底处理位置时将图案化的辐射束投射到衬底的目标部分上，并且调节系统被配置为将调节流体提供给至少部分路径 测量系统的测量光束和/或场来调节路径的一部分。