公开(公告)号：US20250004360A1

公开(公告)日：2025-01-02

申请号：US18884196

申请日：2024-09-13

Applicant: AGC Inc.

Inventor： Daijiro AKAGI ,  Takuma KATO ,  Keishi TSUKIYAMA ,  Toshiyuki UNO ,  Hiroshi HANEKAWA ,  Ryusuke OISHI ,  Sadatatsu IKEDA ,  Yukihiro IWATA ,  Chikako HANZAWA

IPC: G03F1/24 ,  G03F1/48

Abstract: A reflective mask blank includes a substrate, a multilayered reflection film configured to reflect EUV rays, a protection film configured to protect the multilayered reflection film, and an absorption film configured to absorb the EUV rays in this order. The protection film contains Rh as a main component. The multilayered reflection film includes an uppermost layer that is closest to the protection film in the multilayered reflection film and contains Si and N. In the uppermost layer, an element ratio (N/Si) of N to Si is greater than 0.00 and less than 1.50, and an element ratio (O/Si) of O to Si is 0.00 or greater and less than 0.44.

公开(公告)号：US20240241433A1

公开(公告)日：2024-07-18

申请号：US18621502

申请日：2024-03-29

Applicant: AGC Inc.

Inventor： Daijiro AKAGI ,  Takuma KATO ,  Keishi TSUKIYAMA ,  Toshiyuki UNO ,  Hiroshi HANEKAWA ,  Ryusuke OISHI ,  Sadatatsu IKEDA ,  Yukihiro IWATA ,  Chikako HANZAWA

IPC: G03F1/24 ,  G03F1/48

CPC classification number: G03F1/24 ,  G03F1/48

Abstract: A reflective mask blank includes a substrate, a multilayered reflection film configured to reflect EUV rays, a protection film configured to protect the multilayered reflection film, and an absorption film configured to absorb the EUV rays in this order. The protection film contains Rh as a main component. The multilayered reflection film includes an uppermost layer that is closest to the protection film in the multilayered reflection film and contains Si and N. In the uppermost layer, an element ratio (N/Si) of N to Si is greater than 0.00 and less than 1.50, and an element ratio (O/Si) of O to Si is 0.00 or greater and less than 0.44.

公开(公告)号：US20220373716A1

公开(公告)日：2022-11-24

申请号：US17881559

申请日：2022-08-04

Applicant: AGC Inc.

Inventor： Yukihiro IWATA ,  Masabumi ITO ,  Jun ITO ,  Akihisa ISHINO

IPC: G02B1/11 ,  B60K35/00

Abstract: A glass plate structure includes: a glass plate having first and second major surfaces; an antireflection film; and a print portion. The first major surface includes: a curved surface region that is a region of an end portion of the glass plate, is curved convexly, and has a radius of curvature r that is 50% or more of a thickness t of the glass plate; and a flat surface region that is connected to the curved surface region. The antireflection film is a laminate in which a high refractive index layer and a low refractive index layer are laminated alternately. The number of layers of the antireflection film is 12 or smaller. A total thickness of the antireflection film in the flat surface region is 400 nm or smaller. A thickness of an outermost layer of the antireflection film in the flat surface region is 90 nm or larger.