JUNCTION FIELD EFFECT TRANSISTOR, AND METHOD OF MANUFACTURE THEREOF
    1.
    发明申请
    JUNCTION FIELD EFFECT TRANSISTOR, AND METHOD OF MANUFACTURE THEREOF 有权
    连接场效应晶体管及其制造方法

    公开(公告)号:US20150102391A1

    公开(公告)日:2015-04-16

    申请号:US14055738

    申请日:2013-10-16

    Abstract: A method of forming a junction field effect transistor, the transistor comprising: a back gate; a channel; a top gate; a drain and a source in current flow with the channel; wherein the method comprises selecting a first channel dimension between the top gate and the back gate such that a significant current flow path in the channel occurs in a region of relatively low electric field strength.

    Abstract translation: 一种形成结型场效应晶体管的方法,所述晶体管包括:背栅极; 一个渠道 顶门 电流与通道的漏极和源极; 其中所述方法包括选择所述顶栅极和所述后栅极之间的第一沟道尺寸,使得所述沟道中的有效电流流动路径发生在相对低的电场强度的区域中。

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