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公开(公告)号:US20220122871A1
公开(公告)日:2022-04-21
申请号:US17072082
申请日:2020-10-16
Applicant: APPLIED MATERIALS, INC.
Inventor: Yuichi WADA , Kok Wei TAN , Chul Nyoung LEE , Siew Kit HOI , Xinxin WANG , Zheng Min Clarence CHONG , Yaoying ZHONG , Kok Seong TEO
IPC: H01L21/683 , C23C4/134 , C23C14/34 , H01J37/32
Abstract: Methods and apparatus for protecting parts of a process chamber from thermal cycling effects of deposited materials. In some embodiments, a method of protecting the part of the process chamber includes wet etching the part with a weak alkali or acid, cleaning the part by bead blasting, coating at least a portion of a surface of the part with a stress relief layer. The stress relief layer forms a continuous layer that is approximately 50 microns to approximately 250 microns thick and is configured to preserve a structural integrity of the part from the thermal cycling of aluminum deposited on the part. The method may also include wet cleaning of the part with a heated deionized water rinse after formation of the stress relief layer.
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公开(公告)号:US20210335582A1
公开(公告)日:2021-10-28
申请号:US16857828
申请日:2020-04-24
Applicant: APPLIED MATERIALS, INC.
Inventor: Yueh Sheng OW , Yuichi WADA , Junqi WEI , Kang ZHANG , Ananthkrishna JUPUDI , Sarath BABU , Kok Seong TEO , Kok Wei TAN
Abstract: Apparatus and methods use a unique process kit to protect a processing volume of a process chamber. The process kit includes a shield with a frame configured to be insertable into a shield and a foil liner composed of a metallic material that is attachable to the frame at specific points. The specific attachment points are spaced apart to produce an amount of flexibility based on a malleability of the metallic material. The amount of flexibility ranges from approximately 2.5 to approximately 4.5.
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