公开(公告)号：USD743513S1

公开(公告)日：2015-11-17

申请号：US29493857

申请日：2014-06-13

Applicant: ASM IP Holding B.V.

Designer： Takayuki Yamagishi ,  Naoto Tsuji ,  Kazuo Sato

公开(公告)号：USD725168S1

公开(公告)日：2015-03-24

申请号：US29493834

申请日：2014-06-13

Applicant: ASM IP Holding B.V.

Designer： Takayuki Yamagishi ,  Naoto Tsuji ,  Kazuo Sato

公开(公告)号：USD732644S1

公开(公告)日：2015-06-23

申请号：US29481315

申请日：2014-02-04

Applicant: ASM IP Holding B.V.

Designer： Takayuki Yamagishi ,  Kazuo Sato ,  Naoto Tsuji

公开(公告)号：USD732145S1

公开(公告)日：2015-06-16

申请号：US29493831

申请日：2014-06-13

Applicant: ASM IP Holding B.V.

Designer： Takayuki Yamagishi ,  Naoto Tsuji ,  Kazuo Sato

公开(公告)号：US09885112B2

公开(公告)日：2018-02-06

申请号：US14557774

申请日：2014-12-02

Applicant: ASM IP Holding B.V.

Inventor： Naoto Tsuji ,  Kazuo Sato ,  Takayuki Yamagishi

IPC: C23F1/00 ,  H01L21/306 ,  C23C16/44 ,  C23C16/455 ,  H01J37/32

CPC classification number: C23C16/4412 ,  C23C16/4408 ,  C23C16/45544 ,  C23C16/45565 ,  H01J37/3244

Abstract: A film forming apparatus includes a susceptor, and a shower head provided above the susceptor and having a first passage and a second passage independent of the first passage formed therein, wherein the first passage is formed through the shower head by being provided with a first cavity surrounded by a first upper wall and a first lower wall, a first thin hole formed in the first upper wall, and a plurality of second thin holes formed in the first lower wall, the height of the first upper wall in the vertical direction is reduced with increase in distance from the first thin hole, and the second passage is formed in the same manner as the first passage.

公开(公告)号：USD735836S1

公开(公告)日：2015-08-04

申请号：US29515929

申请日：2015-01-28

Applicant: ASM IP Holding B.V.

Designer： Takayuki Yamagishi ,  Naoto Tsuji ,  Kazuo Sato

公开(公告)号：USD733843S1

公开(公告)日：2015-07-07

申请号：US29511011

申请日：2014-12-05

Applicant: ASM IP Holding B.V.

Designer： Takayuki Yamagishi ,  Kazuo Sato ,  Naoto Tsuji

公开(公告)号：USD733261S1

公开(公告)日：2015-06-30

申请号：US29514153

申请日：2015-01-08

Applicant: ASM IP Holding B.V.

Designer： Takayuki Yamagishi ,  Kazuo Sato ,  Naoto Tsuji

公开(公告)号：USD726884S1

公开(公告)日：2015-04-14

申请号：US29481308

申请日：2014-02-04

Applicant: ASM IP Holding B.V.

Designer： Takayuki Yamagishi ,  Kazuo Sato ,  Naoto Tsuji

公开(公告)号：US10950449B2

公开(公告)日：2021-03-16

申请号：US15869716

申请日：2018-01-12

Applicant: ASM IP Holding B.V.

Inventor： Wataru Adachi ,  Kazuo Sato

IPC: H01L21/285 ,  C23C16/44 ,  H01J37/32 ,  H01L21/687 ,  H01L21/67 ,  C23C16/505 ,  C23C16/458

Abstract: Examples of a substrate processing apparatus includes a chamber, a susceptor provided in the chamber, a flow control ring of an insulator that is mounted on the chamber and surrounds the susceptor, a shower plate opposed to the susceptor, and a metal film that is formed on a lower surface of the flow control ring while exposing an upper surface of the flow control ring, and is in contact with the chamber.