公开(公告)号：US20220307139A1

公开(公告)日：2022-09-29

申请号：US17840960

申请日：2022-06-15

Applicant: ASM IP Holding B.V.

Inventor： Hyeongeu Kim ,  Tom Kirschenheiter ,  Eric Hill ,  Mark Hawkins ,  Loren Jacobs

IPC: C23C16/52 ,  C23C16/24 ,  C23C16/44 ,  C23C16/458

Abstract: A system and method for depositing a film within a reaction chamber are disclosed. An exemplary system includes a temperature measurement device, such as a pyrometer, to measure an exterior wall surface of the reaction chamber. A temperature of the exterior wall surface can be controlled to mitigate cleaning or etching of an interior wall surface of the reaction chamber.

公开(公告)号：US20180195174A1

公开(公告)日：2018-07-12

申请号：US15402993

申请日：2017-01-10

Applicant: ASM IP Holding B.V.

Inventor： Hyeongeu Kim ,  Tom Kirschenheiter ,  Eric Hill ,  Mark Hawkins ,  Loren Jacobs

IPC: C23C16/52 ,  C23C16/24 ,  C23C16/458

CPC classification number: C23C16/52 ,  C23C16/24 ,  C23C16/4401 ,  C23C16/4411 ,  C23C16/4586

Abstract: A system and method for depositing a film within a reaction chamber are disclosed. An exemplary system includes a temperature measurement device, such as a pyrometer, to measure an exterior wall surface of the reaction chamber. A temperature of the exterior wall surface can be controlled to mitigate cleaning or etching of an interior wall surface of the reaction chamber.

公开(公告)号：US10943771B2

公开(公告)日：2021-03-09

申请号：US16833279

申请日：2020-03-27

Applicant: ASM IP Holding B.V.

Inventor： Hyeongeu Kim ,  Loren Jacobs ,  Peter Westrom

IPC: H01J37/32 ,  C23C16/46 ,  G01J5/00 ,  C23C16/52 ,  G01K15/00

Abstract: Methods for thermally calibrating reaction chambers are provided. In some embodiments, methods may include calculating a first correction factor of a first contact type temperature sensor within a first reaction chamber utilizing a first temperature sensor and applying the first correction factor to a first temperature controller to provide a first calibrated contact type temperature sensor. Embodiments may also include calculating a first calibration factor of a first non-contact type temperature sensor within the first reaction chamber utilizing the first calibrated contact type temperature sensor and applying the first calibration factor to the first non-contact type temperature sensor to provide a first calibrated non-contact type temperature sensor.

公开(公告)号：US12043899B2

公开(公告)日：2024-07-23

申请号：US17840960

申请日：2022-06-15

Applicant: ASM IP Holding B.V.

Inventor： Hyeongeu Kim ,  Tom Kirschenheiter ,  Eric Hill ,  Mark Hawkins ,  Loren Jacobs

IPC: C23C16/52 ,  C23C16/24 ,  C23C16/44 ,  C23C16/458

CPC classification number: C23C16/52 ,  C23C16/24 ,  C23C16/4401 ,  C23C16/4411 ,  C23C16/4586

Abstract: A system and method for depositing a film within a reaction chamber are disclosed. An exemplary system includes a temperature measurement device, such as a pyrometer, to measure an exterior wall surface of the reaction chamber. A temperature of the exterior wall surface can be controlled to mitigate cleaning or etching of an interior wall surface of the reaction chamber.

公开(公告)号：US20200227243A1

公开(公告)日：2020-07-16

申请号：US16833279

申请日：2020-03-27

Applicant: ASM IP Holding B.V.

Inventor： Hyeongeu Kim ,  Loren Jacobs ,  Peter Westrom

IPC: H01J37/32 ,  C23C16/46 ,  G01J5/00 ,  C23C16/52 ,  G01K15/00

Abstract: Methods for thermally calibrating reaction chambers are provided. In some embodiments, methods may include calculating a first correction factor of a first contact type temperature sensor within a first reaction chamber utilizing a first temperature sensor and applying the first correction factor to a first temperature controller to provide a first calibrated contact type temperature sensor. Embodiments may also include calculating a first calibration factor of a first non-contact type temperature sensor within the first reaction chamber utilizing the first calibrated contact type temperature sensor and applying the first calibration factor to the first non-contact type temperature sensor to provide a first calibrated non-contact type temperature sensor.

公开(公告)号：US20180114680A1

公开(公告)日：2018-04-26

申请号：US15727432

申请日：2017-10-06

Applicant: ASM IP Holding B.V.

Inventor： Hyeongeu Kim ,  Loren Jacobs ,  Peter Westrom

IPC: H01J37/32 ,  G01K15/00

CPC classification number: H01J37/32954 ,  C23C16/46 ,  C23C16/52 ,  G01J5/0044 ,  G01J2005/0048 ,  G01K15/005

Abstract: Methods for thermally calibrating reaction chambers are provided. In some embodiments, methods may include calculating a first correction factor of a first contact type temperature sensor within a first reaction chamber utilizing a first temperature sensor and applying the first correction factor to a first temperature controller to provide a first calibrated contact type temperature sensor. Embodiments may also include calculating a first calibration factor of a first non-contact type temperature sensor within the first reaction chamber utilizing the first calibrated contact type temperature sensor and applying the first calibration factor to the first non-contact type temperature sensor to provide a first calibrated non-contact type temperature sensor.