公开(公告)号：US20220179331A1

公开(公告)日：2022-06-09

申请号：US17600174

申请日：2020-03-25

Applicant: ASML HOLDING N.V.

Inventor： Tamer Mohamed Tawfik Ahmed Mohamed ELAZHARY ,  Justin Lloyd KREUZER ,  Yuxiang LIN ,  Kirill Urievich SOBOLEV

IPC: G03F9/00

Abstract: Apparatus for, and method of, measuring a parameter of an alignment mark on a substrate in which an optical system is arranged to receive at least one diffraction order from the alignment mark and the diffraction order is modulated at a pupil or a wafer conjugate plane of the optical system, a solid state optical device is arranged to receive the modulated diffraction order, and a spectrometer is arranged to receive the modulated diffraction order from the solid state optical device and to determine an intensity of one or more spectral components in the modulated diffraction order.

公开(公告)号：US20220100109A1

公开(公告)日：2022-03-31

申请号：US17415682

申请日：2019-12-12

Applicant: ASML Holding N.V. ,  ASML Netherlands B.V.

Inventor： Tamer Mohamed Tawfik Ahmed Mohamed ELAZHARY ,  Franciscus BIJNEN ,  Alessandro POLO ,  Kirill Urievich SOBOLEV ,  Simon Reinald HUISMAN ,  Justin Lloyd KREUZER

IPC: G03F9/00 ,  G02B26/08

Abstract: An apparatus for and method of determining the alignment of a substrate in which a multiple alignment marks are simultaneously illuminated with spatially coherent radiation and the light from the illuminated marks is collected in parallel to obtain information on the positions of the marks and distortions within the marks.

公开(公告)号：US20230055116A1

公开(公告)日：2023-02-23

申请号：US17794905

申请日：2021-01-21

Applicant: ASML Holding N.V.

Inventor： Peter Conrad KOCHERSPERGER ,  Christopher Michael DOHAN ,  Justin Lloyd KREUZER ,  Michal Emanuel PAWLOWSKI ,  Aage BENDIKSEN ,  Kirill Urievich SOBOLEV ,  James Hamilton WALSH ,  Roberto B. WIENER ,  Arun Mahadevan VENKATARAMAN

IPC: G03F1/84

Abstract: An inspection system includes a radiation source that generates a beam of radiation and irradiates a first surface of an object, defining a region of the first surface of the object. The radiation source also irradiates a second surface of the object, defining a region of the second surface, wherein the second surface is at a different depth level within the object than the first surface. The inspection system may also include a detector that defines a field of view (FOV) of the first surface including the region of the first surface, and receives radiation scattered from the region of the first surface and the region of the second surface. The inspection system may also include a processor that discards image data not received from the region of the first surface, and constructs a composite image comprising the image data from across the region of the first surface.

公开(公告)号：US20180341105A1

公开(公告)日：2018-11-29

申请号：US15777908

申请日：2016-11-21

Applicant: ASML HOLDING N.V.

Inventor： Kirill Urievich SOBOLEV

IPC: G02B27/00 ,  G02B17/02 ,  G03F9/00 ,  G03F7/20 ,  G01B11/27 ,  G01B9/02

CPC classification number: G02B27/0025 ,  G01B9/02058 ,  G01B11/272 ,  G02B17/026 ,  G02B21/02 ,  G03F7/70141 ,  G03F9/7049

Abstract: An alignment system uses a self-referencing interferometer that incorporates an objective lens system having a plurality of lens element groups. In an embodiment, the objective is configured and arranged to provide a large numerical aperture, long working distance, and low wavefront error.