公开(公告)号：US20230142459A1

公开(公告)日：2023-05-11

申请号：US17918426

申请日：2021-04-08

Applicant: ASML Holding N.V.

Inventor： Andrew JUDGE ,  Ravi Chaitanya KALLURI ,  Michal Emanuel PAWLOWSKI ,  James Hamilton WALSH ,  Justin Lloyd KREUZER

IPC: G03F1/84 ,  G01N21/88 ,  G01N21/94 ,  G03F7/20 ,  G01N21/47

CPC classification number: G03F1/84 ,  G01N21/94 ,  G01N21/4795 ,  G01N21/8806 ,  G01N21/8851 ,  G03F7/2004 ,  G01N2021/8896

Abstract: An inspection system (1600), a lithography apparatus, and an inspection method are provided. The inspection system (1600) includes an illumination system (1602), a detection system (1606), and processing circuitry (1622). The illumination system generates a first illumination beam (1610) at a first wavelength and a second illumination beam (1618) at a second wavelength. The first wavelength is different from the second wavelength. The illumination system irradiates an object (1612) simultaneously with the first illumination beam and the second illumination beam. The detection system receives radiation (1620) scattered by a particle (1624) present at a surface (1626) of the object at the first wavelength. The detection system generates a detection signal. The processing circuitry determines a characteristic of the particle based on the detection signal.

公开(公告)号：US20180157181A1

公开(公告)日：2018-06-07

申请号：US15576444

申请日：2016-06-06

Applicant: ASML HOLDING N.V. ,  ASML NETHERLANDS B.V.

Inventor： Joseph Harry LYONS ,  Martinus Cornelis REIJNEN ,  Erik Johan ARLEMARK ,  Nicolae Marian UNGUREANU ,  James Hamilton WALSH

IPC: G03F7/20 ,  G01B13/12

CPC classification number: G03F7/70775 ,  G01B13/12 ,  G03F9/7057

Abstract: An apparatus, such as a lithographic apparatus, has a metrology frame that has a reference frame mounted thereon that includes a reference surface. A gas gauge is movable relative to the reference frame, metrology frame, and a measured surface. A reference nozzle in the gas gauge provides gas to the reference surface and a measurement nozzle provides gas to the measured surface. A microelectromechanical (MEM) sensor may be used with the gas gauge to sense a difference in backpressure from each of the reference nozzle and the measurement nozzle. Optionally, multiple gas gauges are positioned in an array, which may extend in a direction that is substantially parallel to a plane of the measured surface. The gauges may be fluidly connected to a reference nozzle of the gas gauge. A channel may distribute gas across the array.

公开(公告)号：US20230055116A1

公开(公告)日：2023-02-23

申请号：US17794905

申请日：2021-01-21

Applicant: ASML Holding N.V.

Inventor： Peter Conrad KOCHERSPERGER ,  Christopher Michael DOHAN ,  Justin Lloyd KREUZER ,  Michal Emanuel PAWLOWSKI ,  Aage BENDIKSEN ,  Kirill Urievich SOBOLEV ,  James Hamilton WALSH ,  Roberto B. WIENER ,  Arun Mahadevan VENKATARAMAN

IPC: G03F1/84

Abstract: An inspection system includes a radiation source that generates a beam of radiation and irradiates a first surface of an object, defining a region of the first surface of the object. The radiation source also irradiates a second surface of the object, defining a region of the second surface, wherein the second surface is at a different depth level within the object than the first surface. The inspection system may also include a detector that defines a field of view (FOV) of the first surface including the region of the first surface, and receives radiation scattered from the region of the first surface and the region of the second surface. The inspection system may also include a processor that discards image data not received from the region of the first surface, and constructs a composite image comprising the image data from across the region of the first surface.

公开(公告)号：US20230089666A1

公开(公告)日：2023-03-23

申请号：US17797421

申请日：2021-01-21

Applicant: ASML Holding N.V.

Inventor： Christopher Michael DOHAN ,  James Hamilton WALSH ,  Roberto B. WIENER

IPC: G01N21/956 ,  G03F7/20

Abstract: A pattering device inspection apparatus, system and method are described. According to one aspect, an inspection method is disclosed, the method including receiving, at a multi-element detector within an inspection system, radiation scattered at a surface of an object. The method further includes measuring, with processing circuitry, an output of each element of the multi-element detector, the output corresponding to the received scattered radiation. Moreover, the method includes calibrating, with the processing circuitry, the multi-element detector by identifying an active pixel area comprising one or more elements of the multi-element detector with a measured output being above a predetermined threshold. The method also includes identifying an inactive pixel area comprising a remainder of elements of the multi-element detector. Additionally, the method includes setting the active pixel area as a default alignment setting between the multi-element detector and a light source causing the scattered radiation.

公开(公告)号：US20220004112A1

公开(公告)日：2022-01-06

申请号：US17291302

申请日：2019-10-22

Applicant: ASML Holding N.V.

Inventor： James Hamilton WALSH ,  Richard John JOHNSON ,  Christopher Rossi VANN

IPC: G03F7/20

Abstract: An apparatus for and method of cleaning a surface of a support structure in a lithographic system in which a cleaning substrate has at least one motor which causes the cleaning substrate to move laterally across the surface. The cleaning substrate may be provided with a power supply mounted on the cleaning substrate and selectably electrically connectable to the motor.