公开(公告)号：US20240319608A1

公开(公告)日：2024-09-26

申请号：US18262467

申请日：2022-01-16

Applicant: ASML Holding N.V.

Inventor： Roberto B. WIENER ,  Kalyan Kumar MANKALA ,  Todd R. DOWNEY

IPC: G03F7/00

CPC classification number: G03F7/70141 ,  G03F7/70075 ,  G03F7/70133 ,  G03F7/7015 ,  G03F7/70191 ,  G03F7/7085

Abstract: Systems, apparatuses, and methods are provided for adjusting illumination slit uniformity in a lithographic apparatus. An example method can include irradiating, by a radiation source, a portion of a finger assembly with radiation. The example method can further include receiving, by a radiation detector, at least a portion of the radiation in response to the irradiating of the portion of the finger assembly. The example method can further include determining, by a processor, a change in a shape of the finger assembly based on the received radiation. The example method can further include generating, by the processor, a control signal configured to modify a position of the finger assembly based on the determined change in the shape of the finger assembly. Subsequently, the example method can include transmitting, by the processor, the control signal to a motion control system coupled to the finger assembly.

公开(公告)号：US20220214622A1

公开(公告)日：2022-07-07

申请号：US17605601

申请日：2020-04-14

Applicant: ASML HOLDING N.V. ,  ASML NETHERLANDS B.V.

Inventor： Janardan NATH ,  Kalyan Kumar MANKALA ,  Todd R. DOWNEY ,  Joseph Harry LYONS ,  Ozer UNLUHISARCIKLI ,  Alexander Harris LEDBETTER ,  Nicholas Stephen APONE ,  Tian GANG

IPC: G03F7/20

Abstract: An illumination adjustment apparatus, to adjust a cross slot illumination of a beam in a lithographic apparatus, includes a plurality of fingers to adjust the cross slot illumination to conform to a selected intensity profile. Each finger has a distal edge that includes at least two segments. The two segments form an indentation of the distal edge.