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Patent Agency Ranking
公开(公告)号：US11428925B2
公开(公告)日：2022-08-30
申请号：US16731249
申请日：2019-12-31
Applicant: ASML Netherlands B.V.
Inventor： Arjan Johannes Anton Beukman , Alessandro Polo , Henricus Petrus Maria Pellemans , Nitish Kumar
Abstract: Disclosed is a metrology apparatus comprising an optical element configured to receive at or near a pupil plane of the metrology apparatus, at least first radiation comprising a first higher diffracted order and second radiation comprising a zeroth order resulting from illumination of a metrology target with radiation; and to direct said first radiation and second radiation together in a first direction. The metrology apparatus is further configured to form at least a first image of a first interference pattern, the first interference pattern resulting from interference of said first radiation and second radiation at an image plane.
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公开(公告)号：US20240241452A1
公开(公告)日：2024-07-18
申请号：US18558910
申请日：2022-04-05
Applicant: ASML Netherlands B.V.
Inventor： Arjan Johannes Anton Beukman , Duygu Akbulut
CPC classification number: G03F7/70633 , G03F7/70775 , G03F7/7085 , G03F9/7088
Abstract: Disclosed is a parallel metrology sensor system comprising a reference frame and a plurality of integrated optics sensor heads, each integrated optics sensor head configured to perform an independent measurement. Each of the integrated optics sensor heads is operable to measure its position with respect to the reference frame.
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公开(公告)号：US11906906B2
公开(公告)日：2024-02-20
申请号：US17565422
申请日：2021-12-29
Applicant: ASML NETHERLANDS B.V.
IPC: G03F7/00
CPC classification number: G03F7/70625 , G03F7/70633 , G03F7/70641
Abstract: Disclosed is a method of metrology comprising using measurement illumination to measure a target, said measurement illumination comprising a plurality of illumination conditions. The method comprises performing a first measurement capture with a first subset of said plurality of illumination conditions, e.g., each comprising a positive weighting, to obtain a first parameter value and performing a second measurement capture with a second subset of said plurality of illumination conditions, e.g., each comprising a negative weighting, to obtain a second parameter value. An optimized parameter value is determined as a weighted combination of at least the first parameter value and the second parameter value.
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公开(公告)号：US12287591B2
公开(公告)日：2025-04-29
申请号：US18269191
申请日：2021-12-02
Applicant: ASML Netherlands B.V. , ASML Holding N.V.
Inventor： Arjan Johannes Anton Beukman , Sebastianus Adrianus Goorden , Stephen Roux , Sergei Sokolov , Filippo Alpeggiani
Abstract: A method includes irradiating a target structure with sequential illumination shots, directing scattered beams from the target structure towards an imaging detector, generating a detection signal using the imaging detector, and determining a property of the target structure based on at least the detection signal. An integration time for each illumination shot of the sequential illumination shots is selected so to reduce a low frequency error.
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公开(公告)号：US20200209608A1
公开(公告)日：2020-07-02
申请号：US16731249
申请日：2019-12-31
Applicant: ASML Netherlands B.V.
Inventor： Arjan Johannes Anton Beukman , Alessandro Polo , Henricus Petrus Maria Pellemans , Nitish Kumar
IPC: G02B26/00
Abstract: Disclosed is a metrology apparatus comprising an optical element configured to receive at or near a pupil plane of the metrology apparatus, at least first radiation comprising a first higher diffracted order and second radiation comprising a zeroth order resulting from illumination of a metrology target with radiation; and to direct said first radiation and second radiation together in a first direction. The metrology apparatus is further configured to form at least a first image of a first interference pattern, the first interference pattern resulting from interference of said first radiation and second radiation at an image plane.
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