公开(公告)号：US11378893B2

公开(公告)日：2022-07-05

申请号：US17098073

申请日：2020-11-13

Applicant: ASML NETHERLANDS B.V.

Inventor： Theodorus Petrus Maria Cadee ,  Johannes Henricus Wilhelmus Jacobs ,  Nicolaas Ten Kate ,  Erik Roelof Loopstra ,  Aschwin Lodewijk Hendricus Johannes Van Meer ,  Jeroen Johannes Sophia Maria Mertens ,  Christianus Gerardus Maria De Mol ,  Marcel Johannus Elisabeth Hubertus Muitjens ,  Antonius Johannus Van Der Net ,  Joost Jeroen Ottens ,  Johannes Anna Quaedackers ,  Maria Elisabeth Reuhman-Huisken ,  Marco Koert Stavenga ,  Patricius Aloysius Jacobus Tinnemans ,  Martinus Cornelis Maria Verhagen ,  Jacobus Johannus Leonardus Hendricus Verspay ,  Frederik Eduard De Jong ,  Koen Goorman ,  Boris Menchtchikov ,  Herman Boom ,  Stoyan Nihtianov ,  Richard Moerman ,  Martin Frans Pierre Smeets ,  Bart Leonard Peter Schoondermark ,  Franciscus Johannes Joseph Janssen ,  Michel Riepen

IPC: G03F7/20

Abstract: A lithographic apparatus is described having a liquid supply system configured to at least partly fill a space between a projection system of the lithographic apparatus and a substrate with liquid, a barrier member arranged to substantially contain the liquid within the space, and a heater.

公开(公告)号：US10254663B2

公开(公告)日：2019-04-09

申请号：US14882241

申请日：2015-10-13

Applicant: ASML NETHERLANDS B.V.

Inventor： Theodorus Petrus Maria Cadee ,  Johannes Henricus Wilhelmus Jacobs ,  Nicolaas Ten Kate ,  Erik Roelof Loopstra ,  Aschwin Lodewijk Hendricus Johannes Van Meer ,  Jeroen Johannes Sophia Maria Mertens ,  Christianus Gerardus Maria De Mol ,  Marcel Johannus Elisabeth Hubertus Muitjens ,  Antonius Johannus Van Der Net ,  Joost Jeroen Ottens ,  Johannes Anna Quaedackers ,  Maria Elisabeth Reuhman-Huisken ,  Marco Koert Stavenga ,  Patricius Aloysius Jacobus Tinnemans ,  Martinus Cornelis Maria Verhagen ,  Jacobus Johannus Leonardus Hendricus Verspay ,  Frederik Eduard De Jong ,  Koen Goorman ,  Boris Menchtchikov ,  Herman Boom ,  Stoyan Nihtianov ,  Richard Moerman ,  Martin Frans Pierre Smeets ,  Bart Leonard Peter Schoondermark ,  Franciscus Johannes Joseph Janssen ,  Michel Riepen

IPC: G03B27/42 ,  G03F7/20

Abstract: A lithographic apparatus is described having a liquid supply system configured to at least partly fill a space between a projection system of the lithographic apparatus and a substrate with liquid, a substrate temperature control system configured to provide a control signal to control a substrate temperature conditioning system based on a determined temperature; and a parameter control system configured to adjust a lithographic apparatus parameter, that is other than, or in addition to, the control signal, based on temperature information of the substrate and/or substrate table or on a measure derived from the temperature information.