Patent search ap:("ASML NETHERLANDS B.V.") AND inv:"Johannes Anna Quaedackers" Page 1

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发明授权
Lithographic focus and dose measurement using a 2-D target 有权
Title translation: 使用2-D目标的平版照相重点和剂量测量

公开(公告)号：US09436099B2

公开(公告)日：2016-09-06

申请号：US14273707

申请日：2014-05-09

Applicant: ASML Netherlands B.V.

Inventor： Christian Marinus Leewis , Hugo Augustinus Joseph Cramer , Marcus Adrianus Van De Kerkhof , Johannes Anna Quaedackers , Christine Corinne Mattheus

IPC: G03B27/32 , G03B27/52 , G03C5/00 , G03F7/00 , G03F7/20 , G03F1/38

CPC classification number: G03F7/70641 , G03F1/38 , G03F7/706 , G03F7/70608 , G03F7/70625 , G03F7/70675 , G03F7/70683

Abstract: In order to determine whether an exposure apparatus is outputting the correct dose of radiation and its projection system is focusing the radiation correctly, a test pattern is used on a mask for printing a specific marker onto a substrate. This marker is then measured by an inspection apparatus, such as a scatterometer, to determine whether there are errors in focus and dose and other related properties. The test pattern is configured such that changes in focus and dose may be easily determined by measuring the properties of a pattern that is exposed using the mask. The test pattern may be a 2D pattern where physical or geometric properties, e.g., pitch, are different in each of the two dimensions. The test pattern may also be a one-dimensional pattern made up of an array of structures in one dimension, the structures being made up of at least one substructure, the substructures reacting differently to focus and dose and giving rise to an exposed pattern from which focus and dose may be determined.

Abstract translation: 为了确定曝光装置是否正在输出正确剂量的辐射，并且其投影系统正确地对准辐射，在掩模上使用测试图案将特定标记物印刷到基底上。然后通过诸如散射仪的检查装置测量该标记，以确定焦点和剂量以及其它相关性质是否存在错误。测试图案被配置为使得可以通过测量使用掩模曝光的图案的特性容易地确定聚焦和剂量的变化。测试图案可以是二维图案，其中物理或几何性质（例如间距）在两个维度的每一个中是不同的。测试图案也可以是由一维结构阵列组成的一维图案，该结构由至少一个子结构组成，该子结构与焦点和剂量不同地反应并产生暴露图案，可以确定焦点和剂量。