公开(公告)号：US10339260B2

公开(公告)日：2019-07-02

申请号：US14913670

申请日：2014-08-08

Applicant: ASML Netherlands B.V.

Inventor： Bart Laenens ,  Sander Frederik Wuister

IPC: G06F17/50 ,  G03F7/00 ,  G03F1/36

Abstract: A method of determining a characteristic of a guiding template for guiding self-assembly of block copolymer to form an entirety of a design layout, or a portion thereof, including a plurality of design features, each design feature including one or more elemental features, the method including selecting a characteristic of a guiding template for each of the one or more elemental features of the plurality of design features from a database or a computer readable non-transitory medium, the database or the computer readable non-transitory medium storing a characteristic of a guiding template for each of the one or more elemental features, and determining the characteristic of the guiding template to form the entirety of the design layout, or the portion thereof, by combining the selected characteristic of the guiding template for the one or more elemental features for each of the plurality of design features.

公开(公告)号：US11415899B2

公开(公告)日：2022-08-16

申请号：US16499349

申请日：2018-04-05

Applicant: ASML NETHERLANDS B.V.

Inventor： Wim Tjibbo Tel ,  Bart Laenens

IPC: G03F7/20

Abstract: Methods and apparatus for determining a focus of a projection system are disclosed. In one arrangement, a method includes obtaining first data derived from a first measurement of one or more selected properties of a target pattern formed on a substrate by exposing the substrate using the projection system. The first measurement is performed before the substrate is etched based on the target pattern. The method further includes obtaining second data derived from a second measurement of the one or more selected properties of the target pattern. The second measurement is performed after the substrate is etched based on the target pattern. The method further includes determining the focus of the projection system using the first data and the second data.

公开(公告)号：US10884333B2

公开(公告)日：2021-01-05

申请号：US14909057

申请日：2014-07-09

Applicant: ASML Netherlands B.V.

Inventor： Sander Frederik Wuister ,  Bart Laenens ,  Davide Ambesi

IPC: G03F1/70 ,  G03F7/00 ,  B81C1/00 ,  G06F30/392 ,  G06F30/398

Abstract: A method of design or verification for a self-assemblable block copolymer feature, the block copolymer feature including a first domain having a first polymer type and a second domain having a second polymer type, the method including, based on the length of the second polymer type or on an uncertainty in position of the first domain within the block copolymer feature calculated based on the length of the second polymer type, adjusting a parameter of the self-assembly process of a block copolymer feature or verifying a placement of a block copolymer feature.

公开(公告)号：US10663870B2

公开(公告)日：2020-05-26

申请号：US16061016

申请日：2016-11-30

Applicant: ASML NETHERLANDS B.V.

Inventor： Jun Chen ,  Thomas I. Wallow ,  Bart Laenens ,  Yi-Hsing Peng

IPC: G03F7/20

Abstract: A method including obtaining a plurality of gauges of a plurality of gauge patterns for a patterning process, each gauge pattern configured for measurement of a parameter of the patterning process when created as part of the patterning process, and creating a selection of one or more gauges from the plurality of gauges, wherein a gauge is included in the selection provided the gauge and all the other gauges, if any, of the same gauge pattern, or all of the one or more gauges of the same gauge pattern linked to the gauge, pass a gauge printability check.