公开(公告)号：US20230244152A1

公开(公告)日：2023-08-03

申请号：US18008075

申请日：2021-06-17

Applicant: ASML NETHERLANDS B.V.

Inventor： Jen-Shiang WANG ,  Pengcheng YANG ,  Jiao HUANG ,  Yen-Wen LU ,  Liang LIU ,  Chen ZHANG

IPC: G03F7/00 ,  G03F1/70 ,  G03F7/105

CPC classification number: G03F7/706843 ,  G03F1/70 ,  G03F7/705 ,  G03F7/105

Abstract: A method for determining a likelihood that an assist feature of a mask pattern will print on a substrate. The method includes obtaining (i) a plurality of images of a pattern printed on a substrate and (ii) variance data the plurality of images of the pattern; determining, based on the variance data, a model configured to generate variance data associated with the mask pattern; and determining, based on model-generated variance data for a given mask pattern and a resist image or etch image associated with the given mask pattern, the likelihood that an assist feature of the given mask pattern will be printed on the substrate. The likelihood can be applied to adjust one or more parameters related to a patterning process or a patterning apparatus to reduce the likelihood that the assist feature will print on the substrate.

公开(公告)号：US20210263426A1

公开(公告)日：2021-08-26

申请号：US17256332

申请日：2019-06-21

Applicant: ASML NETHERLANDS B.V.

Inventor： Jiao LIANG ,  Chen ZHANG ,  Qiang ZHANG ,  Yunbo GUO

IPC: G03F7/20

Abstract: A method for improving a process model by measuring a feature on a printed design that was constructed based in part on a target design is disclosed. The method includes obtaining a) an image of the printed design from an image capture device and b) contours based on shapes in the image. The method also includes identifying, by a pattern recognition program, patterns on the target design that include the feature and determining coordinates, on the contours, that correspond to the feature. The method further includes improving the process model by at least a) providing a measurement of the feature based on the coordinates and b) calibrating the process model based on a comparison of the measurement with a corresponding feature in the target design.

公开(公告)号：US20250078244A1

公开(公告)日：2025-03-06

申请号：US18952713

申请日：2024-11-19

Applicant: ASML NETHERLANDS B.V.

Inventor： Chen ZHANG ,  Qiang ZHANG ,  Jen-Shiang WANG ,  Jiao LIANG

IPC: G06T7/00 ,  G01N23/2251 ,  G03F7/00

Abstract: A method for evaluating images of a printed pattern. The method includes obtaining a first averaged image of the printed pattern, where the first averaged image is generated by averaging raw images of the printed pattern. The method also includes identifying one or more features of the first averaged image. The method further includes evaluating the first averaged image, using an image quality classification model and based at least on the one or more features. The evaluating includes determining, by the image quality classification model, whether the first averaged image satisfies a metric.

公开(公告)号：US20220351359A1

公开(公告)日：2022-11-03

申请号：US17268128

申请日：2019-07-26

Applicant: ASML NETHERLANDS B.V.

Inventor： Chen ZHANG ,  Qiang ZHANG ,  Jen-Shiang WANG ,  Jiao LIANG

IPC: G06T7/00 ,  G03F7/20 ,  G01N23/2251

Abstract: A method for evaluating images of a printed pattern. The method includes obtaining a first averaged image of the printed pattern, where the first averaged image is generated by averaging raw images of the printed pattern. The method also includes identifying one or more features of the first averaged image. The method further includes evaluating the first averaged image, using an image quality classification model and based at least on the one or more features. The evaluating includes determining, by the image quality classification model, whether the first averaged image satisfies a metric.