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1.发明授权公开(公告)号：US10237960B2
公开(公告)日：2019-03-19
申请号：US15696508
申请日：2017-09-06
Applicant: ASML Netherlands B.V.
Inventor： Alexander I. Ershov , David Evans , Matthew Graham
Abstract: A device and method are disclosed in which a source material delivery system can be reoriented so that the path of the source material is not directly towards an irradiation region in operating conditions in which the path is expected to be unpredictable. A shroud provided to protect the flow of source material from being disrupted is segmented so with one part of the shroud being movable with respect to another part of the shroud so that the movable part can avoid interfering with the path of the source material when it is not directly towards the irradiation region.
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Patent Agency Ranking
2.发明申请公开(公告)号：US20180027642A1
公开(公告)日：2018-01-25
申请号：US15696508
申请日：2017-09-06
Applicant: ASML Netherlands B.V.
Inventor： Alexander I Ershov , David Evans , Matthew Graham
CPC classification number: H05G2/006 , G03F7/2008 , G03F7/70 , G03F7/70033 , H05G2/005 , H05G2/008
Abstract: A device and method are disclosed in which a source material delivery system can be reoriented so that the path of the source material is not directly towards an irradiation region in operating conditions in which the path is expected to be unpredictable. A shroud provided to protect the flow of source material from being disrupted is segmented so with one part of the shroud being movable with respect to another part of the shroud so that the movable part can avoid interfering with the path of the source material when it is not directly towards the irradiation region.
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3.发明授权公开(公告)号：US09795023B2
公开(公告)日：2017-10-17
申请号：US15048708
申请日：2016-02-19
Applicant: ASML NETHERLANDS B.V.
Inventor： Alexander I. Ershov , David Evans , Matthew Graham
CPC classification number: H05G2/006 , G03F7/2008 , H05G2/005 , H05G2/008
Abstract: A device and method are disclosed in which gas is caused to flow parallel to a flow of source material to form a gas shroud. The gas shroud may protect flow of source material from being disrupted by a cross flow of gas. The gas shroud may also limit heating of a physical shroud through which the source material passes and limit accumulation of source material on the physical shroud by deforming a plasma bubble formed during irradiation of the source material so that the plasma bubble does not come too near the physical shroud. A device and method are also disclosed for establishing an additional transverse flow of gas so that the gas shroud does not cause source material contamination of an optic used to collect light generated during irradiation of the source material.
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4.发明申请公开(公告)号：US20190200442A1
公开(公告)日：2019-06-27
申请号：US16274378
申请日：2019-02-13
Applicant: ASML Netherlands B.V.
Inventor： Alexander Igorevich ERSHOV , David Evans , Matthew Graham
CPC classification number: H05G2/006 , G03F7/2008 , G03F7/70 , G03F7/70033 , H05G2/005 , H05G2/008
Abstract: A device and method are disclosed in which a source material delivery system can be reoriented so that the path of the source material is not directly towards an irradiation region in operating conditions in which the path is expected to be unpredictable. A shroud provided to protect the flow of source material from being disrupted is segmented so with one part of the shroud being movable with respect to another part of the shroud so that the movable part can avoid interfering with the path of the source material when it is not directly towards the irradiation region.
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5.发明授权公开(公告)号：US10681795B2
公开(公告)日：2020-06-09
申请号：US16274378
申请日：2019-02-13
Applicant: ASML Netherlands B.V.
Inventor： Alexander Igorevich Ershov , David Evans , Matthew Graham
Abstract: A device and method are disclosed in which a source material delivery system can be reoriented so that the path of the source material is not directly towards an irradiation region in operating conditions in which the path is expected to be unpredictable. A shroud provided to protect the flow of source material from being disrupted is segmented so with one part of the shroud being movable with respect to another part of the shroud so that the movable part can avoid interfering with the path of the source material when it is not directly towards the irradiation region.
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6.发明申请公开(公告)号：US20160174352A1
公开(公告)日：2016-06-16
申请号：US15048708
申请日：2016-02-19
Applicant: ASML NETHERLANDS B.V.
Inventor： Alexander I. Ershov , David Evans , Matthew Graham
IPC: H05G2/00
CPC classification number: H05G2/006 , G03F7/2008 , H05G2/005 , H05G2/008
Abstract: A device and method are disclosed in which gas is caused to flow parallel to a flow of source material to form a gas shroud. The gas shroud may protect flow of source material from being disrupted by a cross flow of gas. The gas shroud may also limit heating of a physical shroud through which the source material passes and limit accumulation of source material on the physical shroud by deforming a plasma bubble formed during irradiation of the source material so that the plasma bubble does not come too near the physical shroud. A device and method are also disclosed for establishing an additional transverse flow of gas so that the gas shroud does not cause source material contamination of an optic used to collect light generated during irradiation of the source material.
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