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    Apparatus for and method of source material delivery in a laser produced plasma EUV light source
    3.
    发明授权
    Apparatus for and method of source material delivery in a laser produced plasma EUV light source 有权

    公开(公告)号：US09795023B2

    公开(公告)日：2017-10-17

    申请号：US15048708

    申请日：2016-02-19

    Applicant: ASML NETHERLANDS B.V.

    Inventor： Alexander I. Ershov ,  David Evans ,  Matthew Graham

    IPC: H05G2/00 ,  G03F7/20

    CPC classification number: H05G2/006 ,  G03F7/2008 ,  H05G2/005 ,  H05G2/008

    Abstract: A device and method are disclosed in which gas is caused to flow parallel to a flow of source material to form a gas shroud. The gas shroud may protect flow of source material from being disrupted by a cross flow of gas. The gas shroud may also limit heating of a physical shroud through which the source material passes and limit accumulation of source material on the physical shroud by deforming a plasma bubble formed during irradiation of the source material so that the plasma bubble does not come too near the physical shroud. A device and method are also disclosed for establishing an additional transverse flow of gas so that the gas shroud does not cause source material contamination of an optic used to collect light generated during irradiation of the source material.

    System and method to reduce oscillations in extreme ultraviolet light generation
    4.
    发明授权
    System and method to reduce oscillations in extreme ultraviolet light generation 有权
    减少极紫外光发生振荡的系统和方法

    公开(公告)号：US09363877B2

    公开(公告)日：2016-06-07

    申请号：US14454565

    申请日：2014-08-07

    Applicant: ASML Netherlands B.V.

    Inventor： Matthew Graham

    IPC: H05G2/00

    CPC classification number: H05G2/006 ,  H05G2/008

    Abstract: A droplet generation system for use with a laser produced plasma (LPP) extreme ultraviolet (EUV) source plasma chamber is described. During EUV generation, oscillations can occur as a function of droplet time-of-flight within the plasma chamber. To reduce these oscillations, a droplet controller adjusts the rate at which droplets are generated which, in turn, dictates the droplet time-of-flight. The droplets are a result of coalescence of generated microdroplets such that the rate at which the droplets are generated is dictated by a frequency of a signal used to generate the microdroplets. This adjustment can be a modulation of a baseline droplet frequency. In some instances, the modulation function may be a sinusoid or implemented as a pseudo-random switch.

    Abstract translation: 描述了与激光产生的等离子体（LPP）极紫外（EUV）源等离子体室一起使用的液滴产生系统。 在EUV生成期间，可以发生作为等离子体室内的液滴飞行时间的函数的振荡。 为了减少这些振荡，液滴控制器调节产生液滴的速率，这又决定了液滴飞行时间。 液滴是产生的微滴聚结的结果，使得产生液滴的速率由用于产生微滴的信号的频率决定。 该调整可以是基线液滴频率的调制。 在一些情况下，调制功能可以是正弦曲线或被实现为伪随机开关。

    APPARATUS FOR AND METHOD OF SOURCE MATERIAL DELIVERY IN A LASER PRODUCED PLASMA EUV LIGHT SOURCE
    6.
    发明申请
    APPARATUS FOR AND METHOD OF SOURCE MATERIAL DELIVERY IN A LASER PRODUCED PLASMA EUV LIGHT SOURCE 有权

    公开(公告)号：US20160174352A1

    公开(公告)日：2016-06-16

    申请号：US15048708

    申请日：2016-02-19

    Applicant: ASML NETHERLANDS B.V.

    Inventor： Alexander I. Ershov ,  David Evans ,  Matthew Graham

    IPC: H05G2/00

    CPC classification number: H05G2/006 ,  G03F7/2008 ,  H05G2/005 ,  H05G2/008

    Abstract: A device and method are disclosed in which gas is caused to flow parallel to a flow of source material to form a gas shroud. The gas shroud may protect flow of source material from being disrupted by a cross flow of gas. The gas shroud may also limit heating of a physical shroud through which the source material passes and limit accumulation of source material on the physical shroud by deforming a plasma bubble formed during irradiation of the source material so that the plasma bubble does not come too near the physical shroud. A device and method are also disclosed for establishing an additional transverse flow of gas so that the gas shroud does not cause source material contamination of an optic used to collect light generated during irradiation of the source material.

    SYSTEM AND METHOD TO REDUCE OSCILLATIONS IN EXTREME ULTRAVIOLET LIGHT GENERATION
    7.
    发明申请
    SYSTEM AND METHOD TO REDUCE OSCILLATIONS IN EXTREME ULTRAVIOLET LIGHT GENERATION 有权
    减少极光紫外线光产生振荡的系统和方法

    公开(公告)号：US20160044772A1

    公开(公告)日：2016-02-11

    申请号：US14454565

    申请日：2014-08-07

    Applicant: ASML Netherlands B.V.

    Inventor： Matthew Graham

    IPC: H05G2/00

    CPC classification number: H05G2/006 ,  H05G2/008

    Abstract: A droplet generation system for use with a laser produced plasma (LPP) extreme ultraviolet (EUV) source plasma chamber is described. During EUV generation, oscillations can occur as a function of droplet time-of-flight within the plasma chamber. To reduce these oscillations, a droplet controller adjusts the rate at which droplets are generated which, in turn, dictates the droplet time-of-flight. The droplets are a result of coalescence of generated microdroplets such that the rate at which the droplets are generated is dictated by a frequency of a signal used to generate the microdroplets. This adjustment can be a modulation of a baseline droplet frequency. In some instances, the modulation function may be a sinusoid or implemented as a pseudo-random switch.

    Abstract translation: 描述了与激光产生的等离子体（LPP）极紫外（EUV）源等离子体室一起使用的液滴产生系统。 在EUV生成期间，可以发生作为等离子体室内的液滴飞行时间的函数的振荡。 为了减少这些振荡，液滴控制器调节产生液滴的速率，这又决定了液滴飞行时间。 液滴是产生的微滴聚结的结果，使得产生液滴的速率由用于产生微滴的信号的频率决定。 该调整可以是基线液滴频率的调制。 在一些情况下，调制功能可以是正弦曲线或被实现为伪随机开关。

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