公开(公告)号：US20240248411A1

公开(公告)日：2024-07-25

申请号：US18555192

申请日：2022-03-10

Applicant: ASML NETHERLANDS B.V.

Inventor： Cornelius Maria ROPS ,  Giovanni Luca GATTOBIGIO ,  Eric Henricus Egidius Catharina EUMMELEN ,  Dennis VAN DEN BERG

IPC: G03F7/00

CPC classification number: G03F7/70341 ,  G03F7/70808 ,  G03F7/70875

Abstract: A fluid handling system for a lithographic apparatus, the fluid handling system configured to confine immersion liquid to a liquid confinement space between a part of a projection system and a surface of a substrate in the lithographic apparatus wherein a radiation beam projected from the projection system can irradiate the surface of the substrate by passing through the immersion liquid, the fluid handling system including: a liquid extraction member, having an inlet side and an outlet side, that is arranged to extract the immersion liquid from the liquid confinement space by a fluid flow from the inlet side to the outlet side; and a further liquid supply to the outlet side of the liquid extraction member arranged so that the outlet side receives liquid from a different source than the liquid confinement space.

公开(公告)号：US20210165334A1

公开(公告)日：2021-06-03

申请号：US16770464

申请日：2018-11-22

Applicant: ASML NETHERLANDS B.V. ,  ASML HOLDING N.V.

Inventor： Thomas POIESZ ,  Coen Hubertus Matheus BALTIS ,  Abraham Alexander SOETHOUDT ,  Mehmet Ali AKBAS ,  Dennis VAN DEN BERG ,  Wouter VANESCH ,  Marcel Maria Cornelius Franciscus TEUNISSEN

IPC: G03F7/20 ,  H01L21/687

Abstract: A substrate holder, for a lithographic apparatus, having a main body, a plurality of support elements to support a substrate and a seal unit. The seal unit may include a first seal positioned outward of and surrounding the plurality of support elements. A position of a substrate contact region of an upper surface of the first seal may be arranged at a distance from the plurality of support elements sufficient enough such that during the loading/unloading of the substrate, a force applied to the first seal by the substrate is greater than a force applied to the plurality of support elements by the substrate. A profile of the contact region, in a cross section through the seal, may have a shape which is configured such that during the loading/unloading of the substrate, the substrate contacts the seal via at least two different points of the profile.

公开(公告)号：US20220357675A1

公开(公告)日：2022-11-10

申请号：US17870444

申请日：2022-07-21

Applicant: ASML NETHERLANDS B.V. ,  ASML HOLDING N.V.

Inventor： Thomas POIESZ ,  Coen Hubertus Matheus BALTIS ,  Abraham Alexander SOETHOUDT ,  Mehmet Ali AKBAS ,  Dennis VAN DEN BERG ,  Wouter VANESCH ,  Marcel Maria Cornelius Franciscus TEUNISSEN

IPC: G03F7/20 ,  H01L21/687

Abstract: A substrate holder, for a lithographic apparatus, having a main body, a plurality of support elements to support a substrate and a seal unit. The seal unit may include a first seal positioned outward of and surrounding the plurality of support elements. A position of a substrate contact region of an upper surface of the first seal may be arranged at a distance from the plurality of support elements sufficient enough such that during the loading/unloading of the substrate, a force applied to the first seal by the substrate is greater than a force applied to the plurality of support elements by the substrate. A profile of the contact region, in a cross section through the seal, may have a shape which is configured such that during the loading/unloading of the substrate, the substrate contacts the seal via at least two different points of the profile.