公开(公告)号：US20170192359A1

公开(公告)日：2017-07-06

申请号：US15308598

申请日：2015-04-23

申请人： ASML Netherlands B.V. ,  ASML HOLDING N.V.

发明人： Martinus Hendrikus Antonius LEENDERS ,  Niek Elout DE KRUIJF ,  Mircea DUSA ,  Martijn HOUBEN ,  Johannes Gerardus Maria MULDER ,  Thomas POIESZ ,  Marco Adrianus Peter VAN DEN HEUVEL ,  Paul VAN DONGEN ,  Justin Johannes Hermanus GERRITZEN ,  Antonie Hendrik VER WEIJ ,  Abraham Alexander SOETHOUDT

IPC分类号： G03F7/20 ,  H01L21/683

CPC分类号： G03F7/707 ,  G03F7/70716 ,  G03F7/70783 ,  H01L21/6835 ,  H01L21/6838

摘要： A substrate support, includes: a substrate support location configured to support a substrate, and a vacuum clamping device configured to clamp the substrate on the substrate support location, wherein the vacuum clamping device includes at least one reduced pressure source to create a reduced pressure, at least one vacuum section connected to the at least one reduced pressure source, wherein the at least one vacuum section is configured to attract the substrate towards the substrate support location, and a control device configured to control a spatial pressure profile along the at least one vacuum section with which the substrate is attracted by the vacuum clamping device, wherein the control device includes a substrate shape data input to receive substrate shape data representing shape data of the substrate to be clamped, and wherein the control device is configured to adapt the spatial pressure profile in dependency of the substrate shape data.

公开(公告)号：US20210053177A1

公开(公告)日：2021-02-25

申请号：US16963576

申请日：2019-01-24

申请人： ASML NETHERLANDS B.V. ,  ASML HOLDING N.V.

发明人： Bert Dirk SCHOLTEN ,  Satish ACHANTA ,  Aydar AKCHURIN ,  Pavlo ANTONOV ,  Coen Hubertus Matheus BALTIS ,  Jeroen BOUWKNEGT ,  Ann-Sophie m. FARLE ,  Christopher John MASON ,  Ralph Nicholas PALERMO ,  Thomas POIESZ ,  Yuri Johannes Gabriel VAN DE VIJVER ,  Jimmy Matheus Wilhelmus VAN DE WINKEL

IPC分类号： B24B27/033 ,  B24B1/04 ,  B24B7/07 ,  B24B7/22 ,  G03F7/20 ,  H01L21/304

摘要： A treatment tool for reconditioning the top surfaces of a plurality of projections of a substrate support in a lithographic tool. The treatment tool includes a reconditioning surface which is rough relative to smoothed top surfaces of the projections and which reconditioning surface has material harder than that of the material of the top surfaces of the projections. A reconditioning method involves causing an interaction between the reconditioning surface of the treatment tool and the top surfaces of the projections of the substrate support, so as to leave these top surfaces rougher than they were prior to the interaction.

公开(公告)号：US20230384694A1

公开(公告)日：2023-11-30

申请号：US18269387

申请日：2021-12-02

申请人： ASML Netherlands B.V. ,  ASML Holding N.V.

发明人： Abdullah ALIKHAN ,  Tammo UITTERDIJK ,  Johannes Bernardus Charles ENGELEN ,  Daniel KAMIENIECKI ,  Bastiaan Lambertus Wilhelmus Marinus VAN DE VEN ,  Thomas POIESZ ,  Leon Martin LEVASIER ,  Jim Vincent OVERKAMP ,  Johannes Adrianus Cornelis Maria PIJNENBURG ,  Koos VAN BERKEL ,  Gregory James DIGUIDO ,  Anthony C. SOCCI, JR. ,  Iliya SIGAL ,  Bram Antonius Gerardus LOMANS ,  Michel Ben Isel HABETS

IPC分类号： G03F7/00 ,  H01L21/683 ,  H01L21/687

CPC分类号： G03F7/70708 ,  G03F7/7095 ,  G03F7/70783 ,  H01L21/6838 ,  H01L21/68757

摘要： Systems, apparatuses, and methods are provided for manufacturing a substrate table. An example method can include forming a vacuum sheet including a plurality of vacuum connections and a plurality of recesses configured to receive a plurality of burls disposed on a core body for supporting an object such as a wafer. Optionally, at least one burl can be surrounded, partially or wholly, by a trench. The example method can further include using the vacuum sheet to mount the core body to an electrostatic sheet including a plurality of apertures configured to receive the plurality of burls. Optionally, the example method can include using the vacuum sheet to mount the core body to the electrostatic sheet such that the plurality of recesses of the vacuum sheet line up with the plurality of burls of the core body and the plurality of apertures of the electrostatic sheet.

公开(公告)号：US20210165334A1

公开(公告)日：2021-06-03

申请号：US16770464

申请日：2018-11-22

申请人： ASML NETHERLANDS B.V. ,  ASML HOLDING N.V.

发明人： Thomas POIESZ ,  Coen Hubertus Matheus BALTIS ,  Abraham Alexander SOETHOUDT ,  Mehmet Ali AKBAS ,  Dennis VAN DEN BERG ,  Wouter VANESCH ,  Marcel Maria Cornelius Franciscus TEUNISSEN

IPC分类号： G03F7/20 ,  H01L21/687

摘要： A substrate holder, for a lithographic apparatus, having a main body, a plurality of support elements to support a substrate and a seal unit. The seal unit may include a first seal positioned outward of and surrounding the plurality of support elements. A position of a substrate contact region of an upper surface of the first seal may be arranged at a distance from the plurality of support elements sufficient enough such that during the loading/unloading of the substrate, a force applied to the first seal by the substrate is greater than a force applied to the plurality of support elements by the substrate. A profile of the contact region, in a cross section through the seal, may have a shape which is configured such that during the loading/unloading of the substrate, the substrate contacts the seal via at least two different points of the profile.

公开(公告)号：US20190332015A1

公开(公告)日：2019-10-31

申请号：US16315125

申请日：2017-07-06

申请人： ASML Netherlands B.V. ,  ASML Holding N.V.

发明人： Thomas POIESZ ,  Satish ACHANTA ,  Mehmet Ali AKBAS ,  Pavlo ANTONOV ,  Jeroen BOUWKNEGT ,  Joost Wilhelmus Maria FRENKEN ,  Evelyn Wallis PACITTI ,  Nicolaas TEN KATE ,  Bruce TIRRI ,  Jan VERHOEVEN

IPC分类号： G03F7/20 ,  H01L21/687

摘要： There is disclosed a substrate holder, a method of manufacturing a substrate holder, a lithographic apparatus comprising the substrate holder, and a method of manufacturing devices using the lithographic apparatus. In one arrangement, there is provided a substrate holder for use in a lithographic apparatus. The substrate holder supports a substrate. The substrate holder comprises a main body. The main body has a main body surface. A plurality of burls are provided projecting from the main body surface. Each burl has a burl side surface and a distal end surface. The distal end surface of each burl engages with the substrate. The distal end surfaces of the burls substantially conform to a support plane and support the substrate. A layer of carbon based material is provided in a plurality of separated regions of carbon based material. The layer of carbon based material provides a surface with a lower coefficient of friction than a part of the main body surface outside the plurality of separated regions of carbon based material. The layer of carbon based material covers only part of the distal end surface of at least one of the burls. Alternatively, the layer of carbon based material covers the distal end surface and at least a portion of the burl side surface of at least one of the burls.

公开(公告)号：US20220357675A1

公开(公告)日：2022-11-10

申请号：US17870444

申请日：2022-07-21

申请人： ASML NETHERLANDS B.V. ,  ASML HOLDING N.V.

发明人： Thomas POIESZ ,  Coen Hubertus Matheus BALTIS ,  Abraham Alexander SOETHOUDT ,  Mehmet Ali AKBAS ,  Dennis VAN DEN BERG ,  Wouter VANESCH ,  Marcel Maria Cornelius Franciscus TEUNISSEN

IPC分类号： G03F7/20 ,  H01L21/687

摘要： A substrate holder, for a lithographic apparatus, having a main body, a plurality of support elements to support a substrate and a seal unit. The seal unit may include a first seal positioned outward of and surrounding the plurality of support elements. A position of a substrate contact region of an upper surface of the first seal may be arranged at a distance from the plurality of support elements sufficient enough such that during the loading/unloading of the substrate, a force applied to the first seal by the substrate is greater than a force applied to the plurality of support elements by the substrate. A profile of the contact region, in a cross section through the seal, may have a shape which is configured such that during the loading/unloading of the substrate, the substrate contacts the seal via at least two different points of the profile.

公开(公告)号：US20230260820A1

公开(公告)日：2023-08-17

申请号：US18305925

申请日：2023-04-24

申请人： ASML NETHERLANDS B.V.

发明人： Andre Bernardus JEUNINK ,  Robby Franciscus Josephus MARTENS ,  Youssef Karel Maria DE VOS ,  Ringo Petrus Cornelis VAN DORST ,  Gerhard Albert TEN BRINKE ,  Dirk Jerome Andre SENDEN ,  Coen Hubertus Matheus BALTIS ,  Justin Johannes Hermanus GERRITZEN ,  Jelmer Mattheüs KAMMINGA ,  Evelyn Wallis PACITTI ,  Thomas POIESZ ,  Arie Cornelis SCHEIBERLICH ,  Bert Dirk SCHOLTEN ,  André SCHREUDER ,  Abraham Alexander SOETHOUDT ,  Siegfried Alexander TROMP ,  Yuri Johannes Gabriël VAN DE VIJVER

IPC分类号： H01L21/683 ,  G03F7/00 ,  H01L21/687 ,  B25B11/00

CPC分类号： H01L21/6838 ,  G03F7/707 ,  G03F7/70733 ,  H01L21/68742 ,  B25B11/005

摘要： A method for unloading a substrate from a support table configured to support the substrate, the method including: supplying gas to a gap between a base surface of the support table and the substrate via a plurality of gas flow openings in the support table, wherein during an initial phase of unloading the gas is supplied through at least one gas flow opening in an outer region of the support table and not through any gas flow opening in a central region of the support table radially inward of the outer region, and during a subsequent phase of unloading the gas is supplied through at least one gas flow opening in the outer region and at least one gas flow opening in the central region.

公开(公告)号：US20200183289A1

公开(公告)日：2020-06-11

申请号：US16690198

申请日：2019-11-21

申请人： ASML NETHERLANDS B.V.

发明人： Thomas POIESZ ,  Bert Dirk SCHOLTEN ,  Dirk Willem HARBERTS ,  Lucas Henricus Johannes STEVENS ,  Laura Maria FERNANDEZ DIAZ ,  Johannes Adrianus Cornelis Maria PIJNENBURG ,  Abraham Alexander SOETHOUDT ,  Wilhelmus Jacobus Johannes WELTERS ,  Jimmy Matheus Wilhelmus VAN DE WINKEL

IPC分类号： G03F7/20

摘要： A substrate table for an immersion system having a projection system arranged to project an image onto a substrate and a liquid confinement system configured to confine an immersion liquid to a space between the projection system and the substrate, the substrate table including: a substrate holder configured to hold a substrate; and a current control device arranged to reduce an electric current flowing between the substrate and the substrate holder while the immersion liquid is confined to the space.

公开(公告)号：US20190339627A1

公开(公告)日：2019-11-07

申请号：US16511867

申请日：2019-07-15

申请人： ASML NETHERLANDS B.V.

发明人： Abraham Alexander SOETHOUDT ,  Thomas POIESZ

IPC分类号： G03F7/20 ,  B05B15/68 ,  B05B15/656 ,  B01D53/34 ,  B01D53/56 ,  B01D53/79 ,  B05B13/02 ,  B05B13/04 ,  F23J15/00

摘要： A lithographic apparatus includes a support table and a gas extraction system. The gas extraction system is configured to extract gas from a gap between the base surface of the support table and a substrate through at least one gas extraction opening when the substrate is being lowered onto the support table. The lithographic apparatus is configured such that gas is extracted from the gap at a first loading flow rate when the distance between the substrate and the support plane is greater than a threshold distance and gas is extracted from the gap at a second loading flow rate when the distance between the substrate and the support plane is less than the threshold distance, wherein the second loading flow rate is lower than the first loading flow rate.

公开(公告)号：US20170045828A1

公开(公告)日：2017-02-16

申请号：US15306676

申请日：2015-03-25

申请人： ASML Netherlands B.V.

发明人： Daan Daniel Johannes Antonius VAN SOMMEREN ,  Thomas POIESZ

IPC分类号： G03F7/20

CPC分类号： G03F7/70875 ,  G03F7/70341 ,  G03F7/707 ,  G03F7/70716 ,  G03F7/70866 ,  H01L21/67028 ,  H01L21/67051 ,  H01L21/6875

摘要： A support table (WT) for a lithographic apparatus, the support table is configured to support a lower surface of a substrate (W). The support table comprises: a base surface (22) configured to be substantially parallel to the lower surface of the substrate supported on the support table, a plurality of burls (20) protruding above the base surface, each of the plurality of burls having a respective distal end and a first height above the base surface, the plurality of burls arranged such that, when the substrate is supported by the support table, the substrate is supported by the respective distal end of each of the plurality of the burls, and a plurality of elongate raised protrusions (45) protruding above the base surface, each of the elongate raised protrusions having a second height above the base surface, wherein the second height is less than the first height. The base surface comprises a plurality of regions within each of which some of the elongate raised protrusions are located. All of the elongate raised protrusions located within each region have substantially the same direction of elongation such that they are substantially parallel to each other so as to form between the elongate raised protrusions at least one gas flow path substantially parallel to the elongate raised protrusions.

摘要翻译： 一种用于光刻设备的支撑台（WT），所述支撑台被配置为支撑衬底（W）的下表面。 所述支撑台包括：基部表面（22），其被构造成基本上平行于支撑在所述支撑台上的所述基板的下表面;多个凸起（20），突出在所述基座表面上方，所述多个毛刺中的每一个具有 相应的远端和在基底表面上方的第一高度，所述多个毛刺被布置成使得当基底被支撑台支撑时，基底由多个毛刺中的每一个的相应远端支撑，并且 多个在基座表面上突出的细长凸起突起（45），每个细长凸起突起在基面上方具有第二高度，其中第二高度小于第一高度。 基部表面包括多个区域，每个区域中的一些细长凸起突起位于其中。 位于每个区域内的所有细长凸起突起具有基本上相同的伸长方向，使得它们彼此基本平行，从而在细长凸起之间形成基本上平行于细长凸起突起的至少一个气流路径。