公开(公告)号：US12158706B2

公开(公告)日：2024-12-03

申请号：US17624901

申请日：2020-06-04

Applicant: ASML NETHERLANDS B.V.

Inventor： Marcus Adrianus Van de Kerkhof ,  Manish Ranjan

IPC: G03F7/00

Abstract: A lithographic apparatus including a substrate stage for supporting a structure in a compartment, the compartment having a compartment surface facing a top surface of the substrate in at least one operational configuration; and a soft coating on the compartment surface for capturing particles. A heat shield or component thereof for a lithographic apparatus, the heat shield or component thereof including a soft coating on at least one surface for capturing particles and a lithographic apparatus including such a heat shield.

公开(公告)号：US11906907B2

公开(公告)日：2024-02-20

申请号：US16765339

申请日：2018-11-27

Applicant: ASML NETHERLANDS B.V. ,  ASML HOLDING N.V.

Inventor： Derk Servatius Gertruda Brouns ,  Joshua Adams ,  Aage Bendiksen ,  Richard Jacobs ,  Andrew Judge ,  Veera Venkata Narasimha Narendra Phani Kottapalli ,  Joseph Harry Lyons ,  Theodorus Marinus Modderman ,  Manish Ranjan ,  Marcus Adrianus Van De Kerkhof ,  Xugang Xiong

IPC: G03F7/20 ,  G03F7/00 ,  G03F1/62 ,  G03F1/64

CPC classification number: G03F7/7085 ,  G03F1/62 ,  G03F1/64 ,  G03F7/70033 ,  G03F7/70891 ,  G03F7/70983

Abstract: An apparatus for determining a condition associated with a pellicle for use in a lithographic apparatus, the apparatus including a sensor, wherein the sensor is configured to measure a property associated with the pellicle, the property being indicative of the pellicle condition.

公开(公告)号：US09823590B2

公开(公告)日：2017-11-21

申请号：US15451358

申请日：2017-03-06

Applicant: ASML NETHERLANDS B.V.

Inventor： Manish Ranjan ,  Carlo Cornelis Maria Luijten ,  Franciscus Johannes Joseph Janssen ,  Maksym Chernyshov

IPC: B60R1/06 ,  G03B27/52 ,  G03F7/20

CPC classification number: G03F7/70875 ,  G03F7/70633 ,  G03F7/70716 ,  G03F7/70933

Abstract: A lithographic apparatus includes a substrate table constructed to hold a substrate, a projection system configured to project a patterned radiation beam through an opening and onto a target portion of the substrate, and a conduit having an outlet in the opening. The conduit is configured to deliver gas to the opening. The lithographic apparatus includes a temperature control apparatus disposed in a space between the projection system and the substrate table. The temperature control device is configured to control the temperature of the gas in the space after the gas passes through the opening.

公开(公告)号：US09625835B2

公开(公告)日：2017-04-18

申请号：US14356358

申请日：2012-10-12

Applicant: ASML NETHERLANDS B.V.

Inventor： Manish Ranjan ,  Carlo Cornelis Maria Luijten ,  Franciscus Johannes Joseph Janssen ,  Maksym Chernyshov

IPC: B60R1/06 ,  G03B27/52 ,  G03F7/20

CPC classification number: G03F7/70875 ,  G03F7/70633 ,  G03F7/70716 ,  G03F7/70933

Abstract: A lithographic apparatus includes a substrate table constructed to hold a substrate, a projection system configured to project a patterned radiation beam through an opening and onto a target portion of the substrate, and a conduit having an outlet in the opening. The conduit is configured to deliver gas to the opening. The lithographic apparatus includes a temperature control apparatus disposed in a space between the projection system and the substrate table. The temperature control device is configured to control the temperature of the gas in the space after the gas passes through the opening.

公开(公告)号：US20150015856A1

公开(公告)日：2015-01-15

申请号：US14356358

申请日：2012-10-12

Applicant: ASML Netherlands B.V.

Inventor： Manish Ranjan ,  Carlo Cornelis Maria Luijten ,  Franciscus Johannes Joseph Janssen ,  Maksym Chernyshov

IPC: G03F7/20

CPC classification number: G03F7/70875 ,  G03F7/70633 ,  G03F7/70716 ,  G03F7/70933

Abstract: A lithographic apparatus includes a substrate table constructed to hold a substrate, a projection system configured to project a patterned radiation beam through an opening and onto a target portion of the substrate, and a conduit having an outlet in the opening. The conduit is configured to deliver gas to the opening. The lithographic apparatus includes a temperature control apparatus disposed in a space between the projection system and the substrate table. The temperature control device is configured to control the temperature of the gas in the space after the gas passes through the opening.

Abstract translation: 光刻设备包括被构造成保持基板的基板台，配置成将图案化的辐射束投射通过开口并到达基板的目标部分的投影系统，以及在开口中具有出口的导管。 导管构造成将气体输送到开口。 光刻设备包括设置在投影系统和基板台之间的空间中的温度控制装置。 温度控制装置被配置为在气体通过开口之后控制空间中的气体的温度。