公开(公告)号：US11029614B2

公开(公告)日：2021-06-08

申请号：US16318388

申请日：2017-06-22

Applicant: ASML NETHERLANDS B.V.

Inventor： Wim Tjibbo Tel ,  Frank Staals ,  Martin Jules Marie-Emile De Nivelle ,  Tanbir Hasan

IPC: G05B19/4097 ,  G03F9/00

Abstract: A method of determining topographical variation across a substrate on which one or more patterns have been applied. The method includes obtaining measured topography data representing a topographical variation across a substrate on which one or more patterns have been applied by a lithographic process; and combining the measured topography data with knowledge relating to intra-die topology to obtain derived topography data having a resolution greater than the resolution of the measured topography data. Also disclosed is a corresponding level sensor apparatus and lithographic apparatus having such a level sensor apparatus, and a more general method of determining variation of a physical parameter from first measurement data of variation of the physical parameter across the substrate and intra-die measurement data of higher resolution than the first measurement data and combining these.

公开(公告)号：US11669020B2

公开(公告)日：2023-06-06

申请号：US17162017

申请日：2021-01-29

Applicant: ASML NETHERLANDS B.V.

Inventor： Tanbir Hasan ,  Vivek Kumar Jain ,  Stefan Hunsche ,  Bruno La Fontaine

IPC: G03F7/20 ,  G03F9/00

CPC classification number: G03F7/70641 ,  G03F7/705 ,  G03F7/7065 ,  G03F7/70508 ,  G03F7/70541 ,  G03F9/7026

Abstract: A method of topography determination, the method including: obtaining a first focus value derived from a computational lithography model modeling patterning of an unpatterned substrate or derived from measurements of a patterned layer on an unpatterned substrate; obtaining a second focus value derived from measurement of a substrate having a topography; and determining a value of the topography from the first and second focus values.

公开(公告)号：US10908515B2

公开(公告)日：2021-02-02

申请号：US16468063

申请日：2017-11-28

Applicant: ASML NETHERLANDS B.V.

Inventor： Tanbir Hasan ,  Vivek Kumar Jain ,  Stefan Hunsche ,  Bruno La Fontaine

IPC: G03F7/20 ,  G03F9/00

Abstract: A method of topography determination, the method including: obtaining a first focus value derived from a computational lithography model modeling patterning of an unpatterned substrate or derived from measurements of a patterned layer on an unpatterned substrate; obtaining a second focus value derived from measurement of a substrate having a topography; and determining a value of the topography from the first and second focus values.