公开(公告)号：US20170123323A1

公开(公告)日：2017-05-04

申请号：US15405009

申请日：2017-01-12

Applicant: ASML NETHERLANDS B.V.

Inventor： Vitaliy PROSYENTSOV ,  Willem Jurrianus VENEMA ,  Kars Zeger TROOST ,  Adrianus Martinus VAN DER WIELEN

IPC: G03F7/20 ,  G03F1/44

CPC classification number: G03F7/705 ,  G03F1/44 ,  G03F7/70133 ,  G03F7/70783 ,  G03F7/70875

Abstract: A lithographic reticle is illuminated to transfer a pattern to a substrate, inducing distortions due to heating. The distortions are calculated using reference marks in a peripheral portion of the reticle and measuring changes in their relative positions over time. A plurality of cells are defined for which a system of equations can be solved to calculate a dilation of each cell. In an embodiment, each equation relates positions of pairs of marks to dilations of the cells along a fine (s, s1, s2) connecting each pair. Local positional deviations can be calculated for a position by combining calculated dilations for cells between at least one measured peripheral mark and the position. Corrections can be applied in accordance with the result of the calculation. Energy may be applied to the patterning device (for example by thermal input or mechanical actuators) to modify a distribution of the local positional deviations.

公开(公告)号：US20140313500A1

公开(公告)日：2014-10-23

申请号：US14322625

申请日：2014-07-02

Applicant: ASML NETHERLANDS B.V.

Inventor： Marcus Adrianus VAN DE KERKHOF ,  Willem Jurrianus VENEMA ,  Bearrach MOEST ,  Vasco Miguel Miguel MATIAS SERRAO ,  Cedran BOMHOF

IPC: G03F7/20

CPC classification number: G03F7/70775 ,  B21B38/00 ,  G03F9/7011 ,  G03F9/7019 ,  G03F9/7026 ,  G03F9/7088 ,  G03F9/7092 ,  H01J2235/062

Abstract: A lithographic apparatus includes at least one image alignment sensor for receiving radiation projected from an alignment mark on a reticle. Processor processes signals from the sensor(s) to resolve spatial information in the projected alignment mark to establish a reference for measuring positional relationships between a substrate support and the patterning location. Examples of the sensor include line arrays of photodetectors. A single array can resolve spatial information in a plane of the sensor (X, Y direction) and in a perpendicular (Z) direction. At least a final step in establishing the reference position is performed while holding the substrate support stationary. Errors and delays induced by mechanical scanning of prior art sensors are avoided. Alternatively (not illustrated) the sensor is moved for mechanical scanning relative to the substrate support, independently of the main positioning systems.

Abstract translation: 光刻设备包括至少一个图像对准传感器，用于接收从掩模版上的对准标记投射的辐射。 处理器处理来自传感器的信号以解决投影对准标记中的空间信息，以建立用于测量基板支撑件和图案化位置之间的位置关系的参考。 传感器的示例包括光电检测器的线阵列。 单个阵列可以解析传感器（X，Y方向）和垂直（Z）方向的平面内的空间信息。 在保持基板支撑固定的同时执行建立基准位置的至少最后一步。 避免了现有技术传感器的机械扫描引起的错误和延迟。 或者（未示出），传感器相对于基板支撑件移动以进行机械扫描，而与主定位系统无关。