公开(公告)号：US12187914B2

公开(公告)日：2025-01-07

申请号：US17293665

申请日：2019-11-11

Applicant: BASF SE

Inventor： Mi Zhou ,  Neil Gregory Pschirer ,  Hsin Tsao Tang ,  Ying Jung Chen ,  Sami Pirinen ,  Ari Karkkainen ,  Milja Hannu-Kuure ,  Oskari Maekimartti

IPC: C09D183/08 ,  C08G65/336 ,  C08G77/24 ,  C09D5/00

Abstract: The present invention relates to a process for preparing a thin film on a substrate in which a first precursor composition (FPC) and a second precursor composition (SPC) are combined, a thin layer of the combined first precursor composition (FPC) and second precursor composition (SPC) is formed on a substrate and the thin layer is cured, an article comprising said thin layer, a composition comprising said first precursor composition (FPC) and said second precursor composition (SPC), a kit-of-parts comprising said first precursor composition (FPC) and said second precursor composition (SPC) in two vessels and the use of said composition or kit-of-parts for preparing a thin film on a substrate and for preparing an optical or electrical coating.

公开(公告)号：US12240989B2

公开(公告)日：2025-03-04

申请号：US16971877

申请日：2019-02-21

Applicant: BASF SE

Inventor： Admir Hadzic ,  Ari Karkkainen ,  Sami Pirinen ,  Milja Hannu-Kuure ,  Jarkko Leivo ,  Rauna-Leena Kuvaja ,  Graeme Gordon ,  Toshikage Asakura ,  Neil Gregory Pschirer ,  Hiroshi Yamamoto

IPC: C09D133/14 ,  C03C17/25 ,  C08F20/28 ,  C09D4/00

Abstract: The present invention relates to a process for preparing a thin film on a substrate comprising the steps of preparing two precursor compositions comprising metalloid compounds and combining them thereafter whereby one precursor composition is hydrolyzed prior to combination. The present invention is further related to a multilayer structure and an article comprising the thin film obtainable by the process, a composition comprising the precursor compositions, a kit-of-parts comprising the precursor compositions and the use of the composition and the kit-of-parts for preparing a thin film on a substrate.