公开(公告)号：US12240989B2

公开(公告)日：2025-03-04

申请号：US16971877

申请日：2019-02-21

Applicant: BASF SE

Inventor： Admir Hadzic ,  Ari Karkkainen ,  Sami Pirinen ,  Milja Hannu-Kuure ,  Jarkko Leivo ,  Rauna-Leena Kuvaja ,  Graeme Gordon ,  Toshikage Asakura ,  Neil Gregory Pschirer ,  Hiroshi Yamamoto

IPC: C09D133/14 ,  C03C17/25 ,  C08F20/28 ,  C09D4/00

Abstract: The present invention relates to a process for preparing a thin film on a substrate comprising the steps of preparing two precursor compositions comprising metalloid compounds and combining them thereafter whereby one precursor composition is hydrolyzed prior to combination. The present invention is further related to a multilayer structure and an article comprising the thin film obtainable by the process, a composition comprising the precursor compositions, a kit-of-parts comprising the precursor compositions and the use of the composition and the kit-of-parts for preparing a thin film on a substrate.

公开(公告)号：US09957258B2

公开(公告)日：2018-05-01

申请号：US14917508

申请日：2014-09-08

Applicant: BASF SE

Inventor： Kazuhiko Kunimoto ,  Hisatoshi Kura ,  Hiroshi Yamamoto ,  Yumiko Nakagawa ,  Toshikage Asakura ,  Kaori Sameshima

IPC: G03F7/031 ,  C07D409/06 ,  C07D209/12 ,  C07D307/56 ,  C07D307/80 ,  C07D307/92 ,  C07D307/83 ,  C07D307/86 ,  C07D307/91 ,  C07D333/56 ,  C07D407/12 ,  G02B5/20 ,  G02B5/22 ,  G03F7/00 ,  G03F7/20 ,  G03F7/32

CPC classification number: C07D409/06 ,  C07D209/12 ,  C07D307/56 ,  C07D307/80 ,  C07D307/83 ,  C07D307/86 ,  C07D307/91 ,  C07D307/92 ,  C07D333/56 ,  C07D407/12 ,  G02B5/201 ,  G02B5/223 ,  G03F7/0007 ,  G03F7/031 ,  G03F7/20 ,  G03F7/32

Abstract: Disclosed are oxime ester compounds which have specific benzo (unsaturated 5-membered ring)-carbonyl group and their use as photoinitiators in photopolymerizable compositions, in particular in photoresist formulations for display applications, e.g. liquid crystal display (LCD), organic light emitting diode (OLED) and touch panel.

公开(公告)号：US20160214966A1

公开(公告)日：2016-07-28

申请号：US14917508

申请日：2014-09-08

Applicant: BASF SE

Inventor： Kazuhiko Kunimoto ,  Hisatoshi Kura ,  Hiroshi Yamamoto ,  Yumiko Nakagawa ,  Toshikage Asakura ,  Kaori Sameshima

IPC: C07D409/06 ,  C07D307/92 ,  C07D333/56 ,  C07D307/86 ,  C07D307/83 ,  C07D209/12 ,  C07D307/91 ,  C07D407/12 ,  G03F7/031 ,  G03F7/20 ,  G03F7/32 ,  G03F7/00 ,  G02B5/20 ,  G02B5/22 ,  C07D307/80

CPC classification number: C07D409/06 ,  C07D209/12 ,  C07D307/56 ,  C07D307/80 ,  C07D307/83 ,  C07D307/86 ,  C07D307/91 ,  C07D307/92 ,  C07D333/56 ,  C07D407/12 ,  G02B5/201 ,  G02B5/223 ,  G03F7/0007 ,  G03F7/031 ,  G03F7/20 ,  G03F7/32

Abstract: Disclosed are oxime ester compounds which have specific benzo (unsaturated 5-membered ring)-carbonyl group and their use as photoinitiators in photopolymerizable compositions, in particular in photoresist formulations for display applications, e.g. liquid crystal display (LCD), organic light emitting diode (OLED) and touch panel.

Abstract translation: 公开了具有特异性苯并（不饱和5元环） - 羰基的肟酯化合物及其在光聚合组合物中的光引发剂的用途，特别是用于显示应用的光致抗蚀剂制剂。 液晶显示器（LCD），有机发光二极管（OLED）和触摸屏。

公开(公告)号：US10793555B2

公开(公告)日：2020-10-06

申请号：US15918512

申请日：2018-03-12

Applicant: BASF SE

Inventor： Kazuhiko Kunimoto ,  Hisatoshi Kura ,  Hiroshi Yamamoto ,  Yumiko Nakagawa ,  Toshikage Asakura ,  Kaori Sameshima

IPC: C07D209/12 ,  C07D307/80 ,  C07D333/56 ,  G02B5/20 ,  G03F7/031 ,  C07D409/06 ,  C07D307/86 ,  G02B5/22 ,  G03F7/00 ,  G03F7/20 ,  C07D307/83 ,  G03F7/32 ,  C07D307/91 ,  C07D407/12 ,  C07D307/92 ,  C07D307/56 ,  G03F7/038 ,  G03F7/033

Abstract: Compounds of the formulae (I) or (II) wherein X is A is O, S, NR5 or CR16R17; R1 is for example hydrogen or C1-C20alkyl R2 is for example hydrogen, C1-C20alkyl or C6-C20aryl R5 for example is C1-C20alkyl; R7, R8, R9, R10 and R11 for example independently of each other are hydrogen. C1-C20alkyl, halogen, CN or NO2; Ar1 is for example unsubstituted or substituted C6-C20aryl, C3-C20heteroaryl, C6-C20aroyl, C3-C20heteroarylcarbonyl or or Ar1 is Ar2 is for example phenylene, all of which are unsubstituted or substituted M is for example unsubstituted or substituted C1-C20alkylene Y is a direct bond, O, S, NR5 or CO; Z1 is for example O or S; Z2 is a direct bond, O, S or NR5; and Q is CO or a direct bond.

公开(公告)号：US20180208583A1

公开(公告)日：2018-07-26

申请号：US15918512

申请日：2018-03-12

Applicant: BASF SE

Inventor： Kazuhiko Kunimoto ,  Hisatoshi Kura ,  Hiroshi Yamamoto ,  Yumiko Nakagawa ,  Toshikage Asakura ,  Kaori Sameshima

IPC: C07D409/06 ,  G03F7/32 ,  C07D209/12 ,  G03F7/031 ,  G03F7/00 ,  G02B5/22 ,  G02B5/20 ,  C07D407/12 ,  C07D333/56 ,  C07D307/92 ,  C07D307/91 ,  C07D307/86 ,  C07D307/83 ,  C07D307/80 ,  C07D307/56 ,  G03F7/20

Abstract: Compounds of the formulae (I) or (II) wherein X is A is O, S, NR5 or CR16R17; R1 is for example hydrogen or C1-C20alkyl R2 is for example hydrogen, C1-C20alkyl or C6-C20aryl R5 for example is C1-C20alkyl; R7, R8, R9, R10 and R11 for example independently of each other are hydrogen. C1-C20alkyl, halogen, CN or NO2; Ar1 is for example unsubstituted or substituted C6-C20aryl, C3-C20heteroaryl, C6-C20aroyl, C3-C20heteroarylcarbonyl or or Ar1 is Ar2 is for example phenylene, all of which are unsubstituted or substituted M is for example unsubstituted or substituted C1-C20alkylene Y is a direct bond, O, S, NR5 or CO; Z1 is for example O or S; Z2 is a direct bond, O, S or NR5; and Q is CO or a direct bond.

公开(公告)号：US09994538B2

公开(公告)日：2018-06-12

申请号：US15546699

申请日：2016-01-29

Applicant: BASF SE

Inventor： Keita Tanaka ,  Yuki Matsuoka ,  Kazuhiko Kunimoto ,  Toshikage Asakura ,  Hisatoshi Kura

IPC: C07D307/52 ,  C07D311/16 ,  G03F7/039 ,  G03F7/004 ,  G03F7/038

CPC classification number: C07D307/52 ,  C07D311/16 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/038 ,  G03F7/039

Abstract: Compounds of the formula (I) and (IA) wherein X is —O(CO)—; R1 is C1-C12haloalkyl or C6-C10haloaryl; R2 is located in position 7 of the coumarinyl ring and is OR8; R2a, R2b and R2C independently of each other are hydrogen; R3 is C1-C8haloalkyl or C1-C8haloalkyl; R4 is hydrogen; and R8 is C1-C6alkyI; are suitable as photosensitive acid donors in the preparation of photoresist compositions such as used for example in the preparation of spacers, insulating layers, interlayer dielectric films, insulation layers, planarization layers, protecting layers, overcoat layers, banks for electroluminescence displays and liquid crystal displays (LCD).