公开(公告)号：US20170233865A1

公开(公告)日：2017-08-17

申请号：US15501631

申请日：2015-07-24

Applicant: BASF SE

Inventor： Julia STRAUTMANN ,  Rocco PACIELLO ,  Thomas SCHAUB ,  Kerstin SCHIERLE-ARNDT ,  Daniel LOEFFLER ,  Hagen WILMER ,  Felix EICKEMEYER ,  Florian BLASBERG ,  Carolin LIMBURG

IPC: C23C16/18 ,  C23C16/455

CPC classification number: C23C16/18 ,  C23C16/45553

Abstract: The present invention is in the field of processes for the generation of thin inorganic films on substrates. More specifically, the present invention relates to a process comprising bringing a compound of general formula (I) into the gaseous or aerosol state and depositing the compound of general formula (I) from the gaseous or aerosol state onto a solid substrate, wherein R11, R12, R13, R14, R15, R16, R17, R18 are independent of each other hydrogen, an alkyl group, an aryl group, or a trialkylsilyl group, R21, R22, R23, R24 are independent of each other an alkyl group, an aryl group, or a trialkylsilyl group, n is 1 or 2, M is a metal or semimetal, X is a ligand which coordinates M, and m is an integer from 0 to 3.

公开(公告)号：US20170175267A1

公开(公告)日：2017-06-22

申请号：US15325840

申请日：2015-07-22

Applicant: BASF SE

Inventor： Julia STRAUTMANN ,  Rocco PACIELLO ,  Thomas SCHAUB ,  Felix EICKEMEYER ,  Daniel LOEFFLER ,  Hagen WILMER ,  Udo RADIUS ,  Johannes BERTHEL ,  Florian HERING

IPC: C23C16/455 ,  C07F15/04 ,  C07F15/06

CPC classification number: C23C16/45553 ,  C07F15/04 ,  C07F15/06 ,  C23C16/18 ,  C30B25/08 ,  C30B25/10

Abstract: The present invention is in the field of processes for the generation of thin inorganic films on substrates, in particular atomic layer deposition processes. In detail the present invention relates a process comprising bringing a compound of general formula (I) into the gaseous or aerosol state (Fig.) and depositing the compound of general formula (I) from the gaseous or aerosol state onto a solid substrate, wherein R1 and R4 are independent of each other an alkyl group, an aryl group or a trialkylsilyl group, R2, R3, R5 and R6 are independent of each other hydrogen, an alkyl group, an aryl group or a trialkylsilyl group, n is an integer from 1 to 3, M is Ni or Co, X is a ligand which coordinates M, and m is an integer from 0 to 4.