公开(公告)号：US20190144998A1

公开(公告)日：2019-05-16

申请号：US15779570

申请日：2016-11-29

申请人： BASF SE

发明人： Falko ABELS ,  David Dominique SCHWEINFURTH ,  Karl MATOS ,  Daniel LOEFFLER ,  Maraike AHLF ,  Florian BLASBERG ,  Thomas SCHAUB ,  Jan SPIELMANN ,  Axel KIRSTE ,  Boris GASPAR

IPC分类号： C23C16/455 ,  C07F9/50 ,  C07F9/6584 ,  C23C16/06

摘要： The present invention is in the field of processes for the generation of thin inorganic films on substrates, in particular atomic layer deposition processes. It relates to a process for preparing metal films comprising (a) depositing a metal-containing compound from the gaseous state onto a solid substrate and (b) bringing the solid substrate with the deposited metal-containing compound in contact with a reducing agent in the gaseous state, wherein the reducing agent is or at least partially forms at the surface of the solid substrate a carbene, a silylene or a phosphor radical.

公开(公告)号：US20170233865A1

公开(公告)日：2017-08-17

申请号：US15501631

申请日：2015-07-24

申请人： BASF SE

发明人： Julia STRAUTMANN ,  Rocco PACIELLO ,  Thomas SCHAUB ,  Kerstin SCHIERLE-ARNDT ,  Daniel LOEFFLER ,  Hagen WILMER ,  Felix EICKEMEYER ,  Florian BLASBERG ,  Carolin LIMBURG

IPC分类号： C23C16/18 ,  C23C16/455

CPC分类号： C23C16/18 ,  C23C16/45553

摘要： The present invention is in the field of processes for the generation of thin inorganic films on substrates. More specifically, the present invention relates to a process comprising bringing a compound of general formula (I) into the gaseous or aerosol state and depositing the compound of general formula (I) from the gaseous or aerosol state onto a solid substrate, wherein R11, R12, R13, R14, R15, R16, R17, R18 are independent of each other hydrogen, an alkyl group, an aryl group, or a trialkylsilyl group, R21, R22, R23, R24 are independent of each other an alkyl group, an aryl group, or a trialkylsilyl group, n is 1 or 2, M is a metal or semimetal, X is a ligand which coordinates M, and m is an integer from 0 to 3.

公开(公告)号：US20160348243A1

公开(公告)日：2016-12-01

申请号：US15114666

申请日：2015-01-22

申请人： BASF SE

发明人： Ke XU ,  Christian SCHILDKNECHT ,  Jan SPIELMANN ,  Juergen FRANK ,  Florian BLASBERG ,  Daniel LOEFFLER ,  Martin GAERTNER ,  Sabine WEIGUNY ,  Kerstin SCHIERLE-ARNDT ,  Katharina FEDERSEL ,  Falko ABELS

IPC分类号： C23C16/455 ,  C07F15/06 ,  C07F15/04 ,  B01J13/00 ,  C07F3/00

CPC分类号： C23C16/45553 ,  C07F3/00 ,  C07F3/003 ,  C07F15/045 ,  C07F15/065

摘要： The present invention relates to a process for the generation of thin inorganic films on substrates, in particular an atomic layer deposition process. This process comprises bringing a compound of general formula (I) into the gaseous or aerosol state and depositing the compound of general formula (I) from the gaseous or aerosol state onto a solid substrate, wherein R1, R2, R3, R4, R5, and R6 are independent of each other hydrogen, an alkyl group, or a trialkylsilyl group, n is an integer from 1 to 3, M is a metal or semimetal, 1 X is a ligand which coordinates M, and m is an integer from 0 to 4.

公开(公告)号：US20180044357A1

公开(公告)日：2018-02-15

申请号：US15557178

申请日：2016-03-02

申请人： BASF SE

发明人： Jan SPIELMANN ,  Falko ABELS ,  Florian BLASBERG ,  Katharina FEDERSEL ,  Christian SCHILDKNECHT ,  Daniel LOEFFLER ,  Torben ADERMANN ,  Juergen FRANK ,  Kerstin SCHIERLE-ARNDT ,  Sabine WEIGUNY

IPC分类号： C07F7/08 ,  C23C16/455 ,  C23C16/18 ,  C09D1/00

CPC分类号： C07F7/0814 ,  C07D207/08 ,  C09D1/00 ,  C23C16/18 ,  C23C16/409 ,  C23C16/45553

摘要： The present invention is in the field of processes for the generation of thin inorganic films on substrates. In particular the present invention relates to a process comprising bringing a com-pound of general formula (I) into the gaseous or aerosol state Ln-M-XmL=formula and depositing the compound of general formula (I) from the gaseous or aerosol state onto a solid substrate, wherein R1, R2, R3, R4, are independent of each other hydrogen, an alkyl group, an aryl group, or a SiA3 group with A being an alkyl or aryl group, and at least two of R1, R2, R3, R4 are a SiA3 group, n is an integer from 1 to 4, M is a metal or semimetal, X is a ligand which coordinates M, and m is an integer from 0 to 4.

公开(公告)号：US20160339446A1

公开(公告)日：2016-11-24

申请号：US15112788

申请日：2015-01-22

申请人： BASF SE ,  BASF CORPORATION

发明人： Florian BLASBERG ,  Andreas LUZ ,  Igor SHISHKOV ,  David J. GILBERT ,  Wolfgang ROHDE

IPC分类号： B03C1/01 ,  C02F1/56 ,  C02F1/54 ,  H01F1/03 ,  B22F1/02 ,  B22F1/00 ,  G01N1/40 ,  C09C1/24 ,  C02F1/48 ,  C02F1/52

CPC分类号： B03C1/01 ,  B01D15/3885 ,  B01J20/10 ,  B01J20/28009 ,  B01J20/3204 ,  B01J20/3272 ,  B01J20/3293 ,  B22F1/0018 ,  B22F1/0062 ,  B22F1/0096 ,  B22F1/02 ,  C01P2004/51 ,  C01P2004/61 ,  C01P2004/62 ,  C01P2004/64 ,  C01P2006/12 ,  C01P2006/42 ,  C02F1/281 ,  C02F1/285 ,  C02F1/288 ,  C02F1/488 ,  C02F1/5236 ,  C02F1/545 ,  C02F1/56 ,  C02F2305/04 ,  C09C1/24 ,  C09C1/62 ,  C09C3/12 ,  G01N1/405 ,  H01F1/0313 ,  H01F1/33

摘要： The present invention relates to core-shell-particles, wherein the core comprises at least one metal, or a compound thereof, or a mixture of at least one metal or a compound thereof and at least one semimetal or a compound thereof, and the shell comprises at least one silicon comprising polymer, to a process for the preparation of these core-shell-particles, to the use of these core-shell-particles in an agglomeration-deagglomeration process, in particular in chemical, physical or biological test methods or separation processes, decontamination processes, water purification, recycling of electrical/electronic scrap or gravity separation, and to a process for separating at least one first material from a mixture comprising this at least one first material and at least one second material.

摘要翻译： 本发明涉及核 - 壳 - 颗粒，其中芯包含至少一种金属或其化合物，或其至少一种金属或其化合物与至少一种半金属或其化合物的混合物，壳体 包括至少一种含硅聚合物，以制备这些核 - 壳 - 颗粒的方法，使用这些核 - 壳 - 颗粒在聚集 - 解聚工艺中，特别是在化学，物理或生物测试方法中，或者 分离过程，净化过程，水净化，电/电子废料的再循环或重力分离，以及用于从包含该至少一种第一材料和至少一种第二材料的混合物分离至少一种第一材料的方法。