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1.发明公开公开(公告)号：US20230415403A1
公开(公告)日：2023-12-28
申请号：US18327138
申请日：2023-06-01
发明人： Hiroshi Sato
CPC分类号： B29C59/002 , B29C59/026 , B29C59/022
摘要： An imprint system transfers a pattern formed on a mold to an imprint material supplied onto a substrate and includes: a formation unit configured to form a desired substrate-side mark including a predetermined material by applying the predetermined material onto the surface of the substrate and then transferring the substrate-side mark on the predetermined material and processing the substrate-side mark, wherein a difference in a predetermined optical property between the predetermined material and the imprint material is larger than a difference in the predetermined optical property between the imprint material and the substrate; and an alignment unit configured to align the substrate-side mark including the predetermined material and a mold-side mark provided on the mold.
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公开(公告)号：US11822236B2
公开(公告)日：2023-11-21
申请号：US17742547
申请日：2022-05-12
发明人： Tomomi Funayoshi , Atsushi Kimura , Hiroshi Sato
IPC分类号： G03F7/00
CPC分类号： G03F7/0002
摘要： The present invention provides a mold including a pattern to be transferred to an imprint material on a substrate using an imprint apparatus, the mold including: a pattern region in which the pattern is arranged; and a peripheral region surrounding the pattern region and configured to shield light, wherein the pattern region includes a first portion, which is arranged with a mark used to measure a relative position with respect to a substrate mark provided on the substrate and through which an image of the substrate mark passes, and a second portion through which an image of a stage mark provided on a stage holding the substrate passes.
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公开(公告)号：US20220148300A1
公开(公告)日：2022-05-12
申请号：US17583706
申请日：2022-01-25
发明人： Takahisa Yamamoto , Hiroshi Sato
摘要： There is provided with an image identification apparatus. An extraction unit extracts a feature value of an image from image data using a Neural Network (NN). A processing unit identifies the image based on the feature value extracted by the extraction unit. The NN comprises a plurality of calculation layers connected hierarchically. The NN includes a plurality of sub-neural networks for performing processing of calculation layers after a specific calculation layer. Mutually different data from an output of the specific calculation layer are respectively inputted to the plurality of sub-neural networks.
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公开(公告)号：US20210173303A1
公开(公告)日：2021-06-10
申请号：US17114017
申请日：2020-12-07
发明人： Hiroshi Sato
摘要： The present invention provides a method of manufacturing a mold including performing a process of processing a surface of a base member so that a mark region where a mark is to be formed on the surface, which is to be a pattern surface of the mold, will be recessed lower than a pattern region, and performing a process of a second process of arranging, on the mark region which has been recessed, a mark member made of a material which has an optical physical property different from an optical physical property of the mold and a protection layer configured to cover the mark member so that a difference between a height of a surface of the mark and a height of a surface of the pattern will fall within a predetermined range.
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公开(公告)号：US10859929B2
公开(公告)日：2020-12-08
申请号：US16280974
申请日：2019-02-20
发明人： Satoshi Iino , Hiroshi Sato
摘要： A position detection device for adjusting positions of a mold and a substrate using a mold mark formed on the mold and a substrate mark formed on the substrate includes a detection unit configured to detect light from the mold mark and the substrate mark, and a processing unit configured to obtain a positional relationship between the substrate and the mold based on a detection result of the detection unit, wherein the processing unit obtains the positional relationship between the substrate and the mold based on a corrected signal obtained by removing a noise component based on the light from the mold mark from a detected signal based on the light from the mold mark and the substrate mark.
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公开(公告)号：US10751920B2
公开(公告)日：2020-08-25
申请号：US15360307
申请日：2016-11-23
发明人： Hiroshi Sato
摘要： An imprint apparatus for forming a pattern of an imprint material on a substrate using a mold includes a plurality of alignment scopes and a control unit. The control unit controls aligning of a shot region of the substrate and the mold based on outputs from the plurality of alignment scopes. Each of the plurality of alignment scopes outputs information indicating a relative position of a first mark selected from a plurality of first marks in the shot region and a second mark selected from a plurality of second marks on the mold. The control unit controls aligning of the shot region and the mold based on information excluding incorrect information from a plurality of pieces of information output from the plurality of alignment scopes.
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公开(公告)号：US10650225B2
公开(公告)日：2020-05-12
申请号：US15839675
申请日：2017-12-12
发明人： Shunsuke Nakano , Yoshinori Ito , Hiroshi Sato , Takahisa Yamamoto , Yuji Kaneda , Atsuo Nomoto , Satoshi Yashiro , Hideo Noro , Kiyotaka Takahashi
摘要： An image processing apparatus includes an imaging unit, a determination unit, and a discrimination unit. The imaging unit images a target object using signals in a predetermined wavelength band in which a spectral transmittance of a specific substance of a plurality of substances on a surface of the target object is different from a spectral transmittance of the other substances of the plurality of substances. The determination unit determines a distribution state of the specific substance on the surface of the target object based on an image captured by the imaging unit. The discrimination unit discriminates a class to which the target object belongs based on the distribution state of the specific substance.
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公开(公告)号：US20200004139A1
公开(公告)日：2020-01-02
申请号：US16450000
申请日：2019-06-24
发明人： Hiroshi Sato , Hiroshi Morohoshi
IPC分类号： G03F7/00
摘要： A method for forming a pattern of an imprint material on a shot region of a substrate by using a mold, includes determining a plurality of marks for alignment of the shot region and the mold, performing measurement for the alignment using the plurality of marks determined in the determining, setting an origin position of a coordinate system for acquisition of an alignment error between the shot region and the mold based on an arrangement of the plurality of marks determined in the determining, and acquiring the alignment error based on a measurement result in the measurement and the origin position determined in the setting.
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9.发明申请公开(公告)号：US20190285403A1
公开(公告)日：2019-09-19
申请号：US16427406
申请日：2019-05-31
发明人： Hiroshi Sato
摘要： The present invention provides a position detection apparatus including a detection unit configured to detect moire caused by overlap between a first diffraction grating including patterns arrayed in a first direction and a second diffraction grating including patterns arrayed in the first direction, and a processing unit configured to obtain a relative position of the first diffraction grating and the second diffraction grating based on the moire, wherein a width of an end pattern of patterns included in at least one of the first diffraction grating and the second diffraction grating in the first direction is smaller than widths of remaining patterns of the at least one diffraction grating in the first direction.
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公开(公告)号：US20190250506A1
公开(公告)日：2019-08-15
申请号：US16270851
申请日：2019-02-08
发明人： Atsushi Kusaka , Hiroshi Sato
CPC分类号： G03F7/0002 , B29C43/02
摘要： An imprint apparatus is operable to perform an imprint process, which is for forming a pattern on an imprint material on a substrate by using a mold, for each of shot regions of the substrate. The apparatus includes a controller configured to control alignment between the mold and the substrate. The controller determines a target position obtained by adding a predetermined additional amount to a movement amount of a substrate stage according to a positional deviation between the mold and the substrate, starts movement of the stage towards the determined target position, and starts curing of the imprint material by a curing device at a timing at which the detected positional deviation falls within an allowable range during the movement of the stage.
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