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公开(公告)号：US20240361531A1
公开(公告)日：2024-10-31
申请号：US18028936
申请日：2022-05-27
发明人： Duohui LI , Hong CHEN , Mengya SONG , Dongliang ZHANG , Xiao ZHANG , Zheng DUAN , Kang GUO , Xin GU
CPC分类号： G02B6/34 , B29C33/3842 , B29C33/405 , B29C59/022 , B29C59/026 , G02B27/0172 , B29K2821/00 , B29K2995/0094 , B29L2011/00
摘要： Provided in the present disclosure are a grating structure, a preparation method thereof and a display device. The preparation method of the grating structure includes: forming a plurality of first convex structures arranged in a first direction; and forming a first rubber material at least covering the plurality of first convex structures, and forming the grating structure including a plurality of second convex structures by using convex structures including the first convex structures and the first rubber material, wherein a surface of the first rubber material facing away from the first convex structures is a flat surface, and the convex structures including the first convex structures and the first rubber material are in one-to-one correspondence with the second convex structures, shapes of cross sections of the second convex structures in the first direction are triangles, and the second convex structures have at least one inclined flat surface.
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公开(公告)号：US20240308129A1
公开(公告)日：2024-09-19
申请号：US18601848
申请日：2024-03-11
发明人： YUSHI YAMAKAWA
IPC分类号： B29C59/00 , B29C59/02 , B32B43/00 , H01L21/027
CPC分类号： B29C59/002 , B32B43/006 , B29C59/026 , H01L21/027
摘要： A processing apparatus configured to separate a multilayer material in which a curable composition is sandwiched between a first member and a second member facing each other, includes a first holding unit configured to suction and hold a first surface of the multilayer material, a second holding unit configured to suction and hold a second surface facing the first surface of the multilayer material, and a deformation mechanism, wherein at least one of the first holding unit and the second holding unit is configured to suction and hold the multilayer material via a flexible member, and wherein the deformation mechanism is configured to deform at least a portion of the flexible member so as to form a start point of separation in the multilayer material.
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3.发明公开公开(公告)号：US20240255853A1
公开(公告)日：2024-08-01
申请号：US18415742
申请日：2024-01-18
CPC分类号： G03F7/168 , B29C59/026 , G03F7/0002
摘要： An information processing method for generating control information for controlling spread of a plurality of droplets of a photo-curing composition arranged between a substrate and a mold, includes generating, as a part of the control information, control data that controls an irradiation condition of light to be irradiated to each of the plurality of droplets such that a shape change of each of the plurality of droplets before droplets adjacent to each other among the plurality of droplets are connected to each other satisfies a target condition.
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公开(公告)号：US20240198578A1
公开(公告)日：2024-06-20
申请号：US18556865
申请日：2022-04-28
申请人： Magic Leap, Inc.
发明人： Vikramjit SINGH , Frank Y. XU
CPC分类号： B29C59/021 , B29C59/026 , G02B6/262 , G02B27/0172 , B29C33/58 , B29K2867/003 , B29K2869/00 , B29L2011/0075 , G02B2027/0123
摘要： Methods for creating a pattern on a curved surface and an optical structure (e.g., curved waveguide, a lens having an antireflective feature, an optical structure of a wearable head device) are disclosed. In some embodiments, the method comprises: depositing a patterning material on a curved surface; positioning a superstrate over the patterning material, the superstrate comprising a template for creating the pattern; applying, using the patterning material, a force between the curved surface and the superstrate; curing the patterning material, wherein the cured patterning material comprises the pattern; and removing the superstrate. In some embodiments, the method comprises forming the optical structure using the pattern.
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公开(公告)号：US20240066786A1
公开(公告)日：2024-02-29
申请号：US17823411
申请日：2022-08-30
发明人： Se-Hyuk Im , Anshuman Cherala
CPC分类号： B29C59/002 , B29C59/026 , B82Y40/00 , B29C2037/903
摘要： A nanofabrication method comprises receiving information regarding in-plane distortion of a substrate, modeling target out-of-plane displacement as a summation of a plurality of geometric modes represented by a linear combination of basis functions, generating a first drop pattern of formable material based on the modeled out-of-plane displacement, generating a second drop pattern by merging the first drop pattern with a drop pattern based on a topography of the template and the substrate; dispensing drops of formable material onto the substrate according to the second drop pattern, and contacting the dispensed drops with the template to form a film. The plurality of geometric modes are modified using a plurality of unique predetermined correction coefficients. Each unique predetermined correction coefficient represents a relationship between an analytically determined amount of in-plane distortion and an empirically determined amount of in-plane distortion.
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公开(公告)号：US11904521B2
公开(公告)日：2024-02-20
申请号：US15715442
申请日：2017-09-26
发明人： Daiyu Okafuji , Hiroyuki Yamazaki , Masao Ando , Masaki Takeuchi
CPC分类号： B29C59/026 , B24B9/065 , B29C33/3842 , G03F7/0002 , B29K2909/08
摘要： A rectangular substrate is prepared by providing a starting rectangular substrate having front and back surfaces and four side surfaces as ground, and pressing a rotary polishing pad perpendicularly against one side surface under a constant pressure, and relatively moving the rotary polishing pad and the substrate parallel to the side surface, for thereby polishing the side surface of the substrate. In the imprint lithography, the rectangular substrate is capable of controlling compression and pattern shape at a high accuracy and thus transferring a complex pattern of fine feature size to a recipient.
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公开(公告)号：US11884048B2
公开(公告)日：2024-01-30
申请号：US16969244
申请日：2019-01-22
申请人： SEIREN CO., LTD.
发明人： Shigeru Nakajima
CPC分类号： B32B3/30 , B29C59/026 , B32B5/024 , B32B5/026 , B32B5/18 , B32B5/245 , B32B38/06 , B29K2713/00 , B29K2715/003 , B29L2031/3005
摘要： A decorative sheet includes a base material and a concave portion. The concave portion is provided on a front face of the base material. In the concave portion, a depth direction coincides with a thickness direction of the base material. The concave portion includes a first concavo-convex pattern and a second concavo-convex pattern. The first concavo-convex pattern is provided in a first region of an inner surface of the concave portion. The second concavo-convex pattern is a concavo-convex pattern different from the first concavo-convex pattern. The second concavo-convex pattern is provided in a second region of the inner surface of the concave portion which is different from the first region.
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公开(公告)号：US20230418155A1
公开(公告)日：2023-12-28
申请号：US18172540
申请日：2023-02-22
申请人： Kioxia Corporation
发明人： Hirotaka TSUDA
CPC分类号： G03F7/0002 , B29C59/022 , B29C59/026
摘要： A template includes a first region having a first face on a side opposite to a main face and a first pattern including a convex-concave portion provided on the first face, and a second region, provided around the first region, having a second face on the side opposite to the main face, a second pattern including a protruding portion protruding from the second face, and an optical layer provided on the second face and the second pattern, wherein the second face is positioned farther to the main surface side than a bottommost face of the irregular portion.
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公开(公告)号：US20230321895A1
公开(公告)日：2023-10-12
申请号：US18194942
申请日：2023-04-03
发明人： Takehiko UENO
CPC分类号： B29C59/002 , B29C59/022 , B29C59/026
摘要： An imprint apparatus including a mold deformation mechanism configured to deform a mold by applying a pressure to the mold, a substrate deformation mechanism configured to deform the substrate by applying a pressure to the substrate, a measurement unit configured to measure a deformation amount of the mold and a deformation amount of the substrate during separating the mold from the cured imprint material on the substrate, and a control unit configured to control, during the separating, a pressure to be applied to the mold by the mold deformation mechanism and a pressure to be applied to the substrate by the substrate deformation mechanism based on the deformation amounts measured by the measurement unit such that a difference between the deformation amount of the mold and the deformation amount of the substrate falls within an allowable range.
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10.发明公开公开(公告)号：US20230294351A1
公开(公告)日：2023-09-21
申请号：US18180610
申请日：2023-03-08
发明人： KENJI YAEGASHI
CPC分类号： B29C59/022 , G03F7/0002 , B29C59/026 , B29C59/002
摘要： An alignment method of aligning a first object and a second object includes detecting a moire fringe formed by a mark of the first object and a mark of the second object by using a detection unit, detecting an evaluation mark for correcting a detection result of the moire fringe, by the detection unit, and acquiring a detection result of the evaluation mark, determining a relative position of the mark of the first object and the mark of the second object by correcting a detection result of the moire fringe by use of the detection result of the evaluation mark, and aligning the first object and the second object based on the relative position. The evaluation mark is provided in at least one of the first object and the second object.
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