公开(公告)号：US10816893B2

公开(公告)日：2020-10-27

申请号：US16305308

申请日：2017-05-26

Applicant: CSMC TECHNOLOGIES FAB2 CO., LTD.

Inventor： Jinyin Wan

IPC: G06F30/00 ,  G06F30/20 ,  G06F30/398 ,  G03F1/36

Abstract: A method for correction of an optical proximity effect, comprising: parsing and dividing the periphery of a design pattern to obtain segments to process; for a segment having a corner comprising a segment side (101) and an adjacent side (102) forming a corner relation with the segment side, setting a target point according to the following principle: when the length of the adjacent side (102) is greater than a preset length, the target point is set at the location of the outer end point (104) of the segment side; when the length of the adjacent side (102) is less than or equal to the preset length, the target point is set between the vertex (103) of the corner and the outer end point (104) of the segment side, and the less the length of the adjacent side (102), the further the target point from the location of the outer end point (104); and adjusting, according to a simulation difference of the target point, the design pattern until it conforms to a design target.

公开(公告)号：US10521546B2

公开(公告)日：2019-12-31

申请号：US15756799

申请日：2016-05-11

Applicant: CSMC TECHNOLOGIES FAB2 CO., LTD.

Inventor： Jinyin Wan ,  Jinheng Wang ,  Lei Zhang ,  Jie Chen

IPC: G06F17/50 ,  G03F1/00 ,  G03F7/00 ,  G03F7/20 ,  G03F1/36

Abstract: An optical proximity correction method, comprising: dissecting an edge of a design pattern (120/220) to form a segment (Seg1/Seg2); setting target points of the segments (Seg1/Seg2), and if the segments (Seg1/Seg2) translate in a direction vertical to the segments (Seg1/Seg2), controlling tangent points (P1/P2) of the segments (Seg1/Seg2) tangent to a simulated pattern (110/210) to coincide with the target points; computing edge position differences of the target points; and correcting the design pattern (120/220) according to the edge position differences.

公开(公告)号：US20180252996A1

公开(公告)日：2018-09-06

申请号：US15756799

申请日：2016-05-11

Applicant: CSMC TECHNOLOGIES FAB2 CO., LTD.

Inventor： Jinyin Wan ,  Jinheng Wang ,  Lei Zhang ,  Jie Chen

IPC: G03F1/36 ,  H01L21/027

Abstract: An optical proximity correction method, comprising: dissecting an edge of a design pattern (120/220) to form a segment (Seg1/Seg2); setting target points of the segments (Seg1/Seg2), and if the segments (Seg1/Seg2) translate in a direction vertical to the segments (Seg1/Seg2), controlling tangent points (P1/P2) of the segments (Seg1/Seg2) tangent to a simulated pattern (110/210) to coincide with the target points; computing edge position differences of the target points; and correcting the design pattern (120/220) according to the edge position differences.