公开(公告)号：US07757870B2

公开(公告)日：2010-07-20

申请号：US11777148

申请日：2007-07-12

申请人： Chih-Pen Lin ,  Zheng-Gang Xie ,  Guo-You Xiong ,  Xian-Feng Luo ,  Hua-Jie Zheng ,  Zhi-Min Li

发明人： Chih-Pen Lin ,  Zheng-Gang Xie ,  Guo-You Xiong ,  Xian-Feng Luo ,  Hua-Jie Zheng ,  Zhi-Min Li

IPC分类号： A47F5/08

CPC分类号： C25D17/08

摘要： A rack apparatus (100) for facilitating workpiece treatment includes a frame member (20) and a plurality of rack members (30). The rack members are detachably mounted on the frame member, wherein each rack member, in turn, includes a plurality of rack poles (305) that are detachably mounted thereon. When workpieces of large dimension or complicated shape require hanging/mounting on the rack apparatus, some rack poles and rack members can be disassembled, and thus the rack apparatus can provide more space to contain/carry these workpieces.

摘要翻译： 用于促进工件处理的齿条装置（100）包括框架构件（20）和多个齿条构件（30）。 齿条构件可拆卸地安装在框架构件上，其中每个齿条构件又包括可拆卸地安装在其上的多个齿条（305）。 当大尺寸或复杂形状的工件需要悬挂/安装在机架装置上时，可以拆卸一些机架杆和机架构件，因此机架装置可以提供更多的空间来容纳/携带这些工件。

公开(公告)号：US20060286392A1

公开(公告)日：2006-12-21

申请号：US11396838

申请日：2006-04-03

申请人： Chih-Pen Lin ,  Yong-Ming Li ,  Yi-Lin Zhang ,  Cheng-Guo Zhang ,  Nai-Juan Ren ,  Xian-Feng Luo

发明人： Chih-Pen Lin ,  Yong-Ming Li ,  Yi-Lin Zhang ,  Cheng-Guo Zhang ,  Nai-Juan Ren ,  Xian-Feng Luo

IPC分类号： B32B15/04 ,  B32B9/00 ,  C23C14/00

CPC分类号： C23C14/165 ,  B32B15/01 ,  B32B15/013 ,  B32B15/017 ,  C23C14/0635 ,  C23C28/322 ,  C23C28/341 ,  G06F1/1613 ,  G06F1/1684 ,  G06F1/181 ,  H05K5/02 ,  Y10T428/12576 ,  Y10T428/31678

摘要： A housing (100) includes a housing base (10), a chromium film (12), and a chromium carbide film (14). The housing base is made of a material of metal or metal alloys. The chromium film is formed on a surface of the housing base, and the chromium carbide film is formed on a surface of the chromium film. The present invention also provides a method for making the housing.

摘要翻译： 壳体（100）包括壳体基座（10），铬膜（12）和碳化铬膜（14）。 外壳基座由金属或金属合金材料制成。 在壳体基体的表面上形成铬膜，在铬膜的表面上形成碳化铬膜。 本发明还提供一种制造该壳体的方法。

公开(公告)号：US07854335B2

公开(公告)日：2010-12-21

申请号：US11964867

申请日：2007-12-27

申请人： Chih-Pen Lin ,  Yu-Chuan Chen ,  Peng Qin ,  Xiao-Lin Wu

发明人： Chih-Pen Lin ,  Yu-Chuan Chen ,  Peng Qin ,  Xiao-Lin Wu

IPC分类号： A47H13/00

CPC分类号： A47B81/00

摘要： A hanging module (100) for holding workpieces (80) thereon includes a pole (30), a plurality of resilient members (20) attached on the pole, and a plurality of retaining members (10) attached on the pole. The resilient members are slidable relative to the pole. Each retaining member is provided apart from each other with at least one resilient member located in-between.

摘要翻译： 用于在其上保持工件（80）的悬挂模块（100）包括杆（30），附接在杆上的多个弹性构件（20）和附接在杆上的多个保持构件（10）。 弹性构件可相对于杆滑动。 每个保持构件彼此分开设置有位于其间的至少一个弹性构件。

公开(公告)号：US20070039833A1

公开(公告)日：2007-02-22

申请号：US11453461

申请日：2006-06-14

申请人： Chih-Pen Lin ,  Min Tian ,  Da-Wei Gu ,  Gang-Sheng Zhang ,  Shih-Yi Hong

发明人： Chih-Pen Lin ,  Min Tian ,  Da-Wei Gu ,  Gang-Sheng Zhang ,  Shih-Yi Hong

IPC分类号： G01N27/26

CPC分类号： G01N27/48 ,  G01N17/02

摘要： A method for measuring metal ion concentration includes the following steps of: providing a measuring solution having a corrosion inhibitor; adding a specific quantity of metal ion solution into the measuring solution; providing a potential scan device (1); measuring a cyclic voltammetry curve of the measuring solution using the potential scan device at a constant scan rate in a specific potential range, the cyclic voltammetry curve has a peak current; obtaining a linear equation, which indicates a linear relationship of peak current versus a concentration of corrosion inhibitor in standard corrosion inhibitor solution in the specific potential range, the peak current is a peak current of cyclic voltammetry curve of the specific quantity of metal ion solution metal ion in the standard corrosion inhibitor solution in the specific potential range; and determining a concentration of the corrosion inhibitor of the measuring solution by computing the peak current of the cyclic voltammetry curve of the measuring solution in linear equation.

摘要翻译： 测量金属离子浓度的方法包括以下步骤：提供具有腐蚀抑制剂的测量溶液; 向测量溶液中加入特定量的金属离子溶液; 提供潜在扫描装置（1）; 使用电位扫描装置以特定电位范围内的恒定扫描速率测量测量溶液的循环伏安曲线，循环伏安曲线具有峰值电流; 获得线性方程，其表示在特定电位范围内峰值电流与腐蚀抑制剂在腐蚀抑制剂溶液中的浓度的线性关系，峰值电流是特定量的金属离子溶液金属的循环伏安曲线的峰值电流 离子在标准腐蚀抑制剂溶液中的比电位范围内; 并通过在线性方程式中计算测量溶液的循环伏安曲线的峰值电流来确定测量溶液的腐蚀抑制剂的浓度。

公开(公告)号：US07820940B2

公开(公告)日：2010-10-26

申请号：US11740853

申请日：2007-04-26

申请人： Chih-Pen Lin ,  Hung-Chang Lee ,  Yu-Chuan Chen ,  Chuang Liu ,  Kai Yin

发明人： Chih-Pen Lin ,  Hung-Chang Lee ,  Yu-Chuan Chen ,  Chuang Liu ,  Kai Yin

IPC分类号： B23K26/38 ,  B23K26/03

CPC分类号： B23K26/10 ,  B23K26/03 ,  B23K26/032 ,  B23K26/04 ,  B23K26/361

摘要： A laser engraving mechanism (100) for engraving a workpiece (16) includes an image receiver (12), an image processor (13), an engraving controller (14), and a laser emitting member (15). The image receiver screens the workpiece to form an image of the workpiece and transforms the image of the workpiece into electronic image signals. The image processor is connected to the image receiver. The image processor saves a group of datum coordinates, forms a group of engraving coordinates according to the electronic image signals, and compares the engraving coordinates with the datum coordinates. The engraving controller is connected to the image processor. The laser emitting member is connected to the engraving controller, and the engraving controller instructs the laser emitting member to engrave the workpiece based on a comparison of results between the engraving coordinates and the datum coordinates.

摘要翻译： 用于雕刻工件（16）的激光雕刻机构（100）包括图像接收器（12），图像处理器（13），雕刻控制器（14）和激光发射部件（15）。 图像接收器屏蔽工件以形成工件的图像，并将工件的图像转换为电子图像信号。 图像处理器连接到图像接收器。 图像处理器保存一组基准坐标，根据电子图像信号形成一组雕刻坐标，并将雕刻坐标与基准坐标进行比较。 雕刻控制器连接到图像处理器。 激光发射构件连接到雕刻控制器，并且雕刻控制器基于对雕刻坐标和基准坐标之间的结果进行比较，指示激光发射构件对工件进行雕刻。

公开(公告)号：US20070023095A1

公开(公告)日：2007-02-01

申请号：US11448568

申请日：2006-06-07

申请人： Chih-Pen Lin ,  Yong-Ming Li ,  Yi-Lin Zhang

发明人： Chih-Pen Lin ,  Yong-Ming Li ,  Yi-Lin Zhang

IPC分类号： F16K11/22

CPC分类号： F16K51/02 ,  H01L21/67017 ,  Y10T137/87877

摘要： A vacuum chamber inlet device includes a gas providing element (10), a plurality of flow control element (20), and a plurality of gas input elements (30). The gas providing element has an inlet (11) and a plurality of outlets (12). The flow control elements are connected to the outlets of the gas input element. Each of the gas input elements has a first end (31) and a second end (32). The first end is connected to the flow control elements, and the second end is disposed in the vacuum chamber. A gas vent (33) is formed on the second end.

摘要翻译： 真空室入口装置包括气体提供元件（10），多个流量控制元件（20）和多个气体输入元件（30）。 气体提供元件具有入口（11）和多个出口（12）。 流量控制元件连接到气体输入元件的出口。 每个气体输入元件具有第一端（31）和第二端（32）。 第一端连接流量控制元件，第二端设置在真空室中。 在第二端形成有排气口（33）。

公开(公告)号：US07798340B2

公开(公告)日：2010-09-21

申请号：US11777139

申请日：2007-07-12

申请人： Chih-Pen Lin ,  Hung-Chang Lee ,  Yu-Chuan Chen ,  Yong Zhang ,  Xiao-Lin Wu ,  Zhan-Gang Zhu

发明人： Chih-Pen Lin ,  Hung-Chang Lee ,  Yu-Chuan Chen ,  Yong Zhang ,  Xiao-Lin Wu ,  Zhan-Gang Zhu

IPC分类号： A47F5/08

CPC分类号： C25D17/08

摘要： A rack apparatus (100) includes a frame (10), a plurality of supporting members (106), and a plurality of retaining members (12). The supporting members are arranged/mounted on/to the frame. The retaining members are mounted on the supporting members. Each retaining member includes a fixing piece (120) and two supporting pieces (122, 124). The fixing piece has a notched mounting portion. The two supporting pieces are respectively positioned at an opposite side of the fixing piece. Each supporting piece forms a retaining portion (i.e., a through hole therein). The notched mounting portion and the retaining portions together help retain a workpiece within a given retaining member.

摘要翻译： 机架设备（100）包括框架（10），多个支撑构件（106）和多个保持构件（12）。 支撑构件布置/安装在框架上。 保持构件安装在支撑构件上。 每个保持构件包括固定件（120）和两个支撑件（122,124）。 固定件具有凹口安装部分。 两个支撑件分别位于固定件的相对侧。 每个支撑件形成保持部分（即其中的通孔）。 缺口安装部分和保持部分一起有助于将工件保持在给定的保持构件内。

公开(公告)号：US20070034530A1

公开(公告)日：2007-02-15

申请号：US11453462

申请日：2006-06-14

申请人： Chih-Pen Lin ,  Min Tian ,  Da-Wei Gu ,  Gang-Sheng Zhang ,  Shih-Yi Hong

发明人： Chih-Pen Lin ,  Min Tian ,  Da-Wei Gu ,  Gang-Sheng Zhang ,  Shih-Yi Hong

IPC分类号： G01N27/26

CPC分类号： G01N27/48

摘要： A method for measuring metal ion concentration includes the following steps of: providing a measuring solution having metal ion; providing a potential scan device (1); measuring a cyclic voltammetry curve of the measuring solution using the potential scan device 1 at a constant scan rate in a specific potential range, the cyclic voltammetry curve has a peak current; obtaining a linear equation, which indicates a linear relationship of peak current versus a concentration of metal ion in standard metal ion solution in the specific potential range; and determining a concentration of the metal ion of the measuring solution by computing the peak current of the cyclic voltammetry curve of the measuring solution into the linear equation.

摘要翻译： 测定金属离子浓度的方法包括以下步骤：提供具有金属离子的测定溶液; 提供潜在扫描装置（1）; 使用电位扫描装置1以特定电位范围内的恒定扫描速率测量测量溶液的循环伏安曲线，循环伏安曲线具有峰值电流; 获得线性方程，其表示在特定电位范围内峰值电流与标准金属离子溶液中金属离子浓度的线性关系; 并通过将测量溶液的循环伏安曲线的峰值电流计算到线性方程式中来确定测量溶液的金属离子浓度。