PHOTOELECTRIC CONVERSION DEVICE
    1.
    发明申请
    PHOTOELECTRIC CONVERSION DEVICE 审中-公开
    光电转换器件

    公开(公告)号:US20120299142A1

    公开(公告)日:2012-11-29

    申请号:US13558790

    申请日:2012-07-26

    IPC分类号: H01L31/0236

    摘要: Disclosed is a photoelectric conversion device provided with transparent electrodes having high electric conductivity, low optical absorptance, and capable of obtaining a high light scattering effect. A first transparent electrode layer (22a), formed on the substrate (20) side, and a second transparent electrode layer (22b), formed at a position farther away from the substrate (20) than the first transparent electrode layer (22a) and having a density less than that of the first transparent electrode layer (22a), are formed as a transparent electrode layer (22), and a textured structure is provided.

    摘要翻译: 公开了一种具有导电性高,光吸收率低的透明电极的光电转换装置,能够得到高散射效果。 形成在基板(20)侧的第一透明电极层(22a)和形成在比第一透明电极层(22a)更远离基板(20)的位置处的第二透明电极层(22b),以及 形成密度小于第一透明电极层(22a)的密度的透明电极层(22),并且提供纹理结构。

    PHOTOVOLTAIC DEVICE AND MANUFACTURING METHOD THEREOF
    2.
    发明申请
    PHOTOVOLTAIC DEVICE AND MANUFACTURING METHOD THEREOF 有权
    光伏器件及其制造方法

    公开(公告)号:US20110104849A1

    公开(公告)日:2011-05-05

    申请号:US12987245

    申请日:2011-01-10

    申请人: Akira TERAKAWA

    发明人: Akira TERAKAWA

    IPC分类号: H01L31/18

    摘要: A photovoltaic device capable of improving an output characteristic is provided. The photovoltaic device includes an n-type single-crystal silicon substrate, a p-type amorphous silicon substrate, and a substantially intrinsic i-type amorphous silicon layer disposed between the n-type single-crystal silicon substrate and the p-type amorphous silicon layer. The i-type amorphous silicon layer includes: a first section which is located on the n-type single-crystal silicon substrate side, and which has an oxygen concentration equal to or below 1020 cm−3; and a second section which is located on the p-type amorphous silicon layer side, and which has an oxygen concentration equal to or above 1020 cm−3.

    摘要翻译: 提供能够提高输出特性的光电装置。 光电器件包括n型单晶硅衬底,p型非晶硅衬底和设置在n型单晶硅衬底和p型非晶硅之间的基本上本征的i型非晶硅层 层。 i型非晶硅层包括:第一部分,其位于n型单晶硅衬底侧,氧浓度等于或低于1020cm-3; 以及第二部分,其位于p型非晶硅层侧,氧浓度等于或大于1020cm-3。

    PHOTOVOLTAIC DEVICE AND MANUFACTURING METHOD THEREOF
    3.
    发明申请
    PHOTOVOLTAIC DEVICE AND MANUFACTURING METHOD THEREOF 有权
    光伏器件及其制造方法

    公开(公告)号:US20080230121A1

    公开(公告)日:2008-09-25

    申请号:US12045247

    申请日:2008-03-10

    申请人: Akira TERAKAWA

    发明人: Akira TERAKAWA

    IPC分类号: H01L31/0256 H01L31/18

    摘要: A photovoltaic device capable of improving an output characteristic is provided. The photovoltaic device includes an n-type single-crystal silicon substrate, a p-type amorphous silicon substrate, and a substantially intrinsic i-type amorphous silicon layer disposed between the n-type single-crystal silicon substrate and the p-type amorphous silicon layer. The i-type amorphous silicon layer includes: a first section which is located on the n-type single-crystal silicon substrate side, and which has an oxygen concentration equal to or below 1020 cm−3; and a second section which is located on the p-type amorphous silicon layer side, and which has an oxygen concentration equal to or above 1020 cm−3.

    摘要翻译: 提供能够提高输出特性的光电装置。 光电器件包括n型单晶硅衬底,p型非晶硅衬底和设置在n型单晶硅衬底和p型非晶硅之间的基本上本征的i型非晶硅层 层。 i型非晶硅层包括:位于n型单晶硅衬底侧的第一部分,其氧浓度等于或低于20℃, -3 ; 以及第二部分,其位于p型非晶硅层侧,并且其氧浓度等于或高于20℃至30℃。