SWITCHING ELEMENTS AND DEVICES, MEMORY DEVICES AND METHODS OF MANUFACTURING THE SAME
    1.
    发明申请
    SWITCHING ELEMENTS AND DEVICES, MEMORY DEVICES AND METHODS OF MANUFACTURING THE SAME 审中-公开
    切换元件和设备,存储器件及其制造方法

    公开(公告)号:US20130320286A1

    公开(公告)日:2013-12-05

    申请号:US13905822

    申请日:2013-05-30

    Abstract: A switching element includes: a first electrode; a second electrode; and a silicon-containing chalconitride layer between the first electrode and the second electrode. A switching device includes: a threshold switch material layer between a first electrode and a second electrode. The threshold switch material layer includes a cationic metal element, a chalcogen element, a silicon element and a nitrogen element. A memory device include: a plurality of first wirings arranged in parallel with each other; a plurality of second wirings crossing the first wirings, and arranged in parallel with each other; and a memory cell formed at each intersection of the plurality of first wirings and the plurality of second wirings. The memory cell includes a laminate having a silicon-containing chalconitride layer, an intermediate electrode, and a memory layer.

    Abstract translation: 开关元件包括:第一电极; 第二电极; 以及在所述第一电极和所述第二电极之间的含硅的仲氮化物层。 开关装置包括:第一电极和第二电极之间的阈值开关材料层。 阈值开关材料层包括阳离子金属元素,硫属元素,硅元素和氮元素。 存储器件包括:彼此平行布置的多个第一布线; 多个第二布线,穿过第一配线,彼此平行布置; 以及形成在所述多个第一布线和所述多个第二布线的每个交叉点处的存储单元。 存储单元包括具有含硅的恰氮氮化物层,中间电极和存储层的层压体。

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